Lithographic apparatus and a method of manufacturing a lithographic apparatus

Patent metadata

Field	Value
Publication number	US-10324384-B2
Application number	US-201515320300-A
Country	US
Kind code	B2
Filing date	Jun 4, 2015
Priority date	Jul 1, 2014
Publication date	Jun 18, 2019
Grant date	Jun 18, 2019

Abstract

An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

First claim

The invention claimed is:

1. An immersion lithographic apparatus comprising:
a projection system configured to project a patterned radiation beam through an optically active part of a final lens element of the projection system towards a substrate supported by a substrate table;
a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between the final lens element of the projection system and a surface of the substrate and/or the substrate table;
a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and the optically active part of the final lens element, the passageway being in liquid communication via a first opening with the immersion space to allow a liquid flow through the passageway to or from the immersion space; and
a second opening of the passageway at an end of the passageway opposite to the first opening, wherein the end of the passageway is sealed off except for the second opening, wherein the second opening is configured to provide liquid to and/or receive liquid from the passageway and wherein the second opening is mated to tubing or sealed onto a support of the passageway-former.

2. The immersion lithographic apparatus of claim 1 , wherein the passageway extends radially outwardly, with respect to an optical axis of the projection system, of an edge of an exposed bottom surface of the final lens element.

3. The immersion lithographic apparatus of claim 1 , wherein the passageway-former is integral with the final lens element of the projection system.

4. The immersion lithographic apparatus of claim 1 , wherein the passageway is between the passageway-former and a non-optically active part of the final lens element through which the patterned beam of radiation does not pass.

5. The immersion lithographic apparatus of claim 1 , wherein the passageway-former is supported by the projection system.

6. The immersion lithographic apparatus of claim 5 , wherein the passageway-former is attached to the final lens element.

7. The immersion lithographic apparatus of claim 1 , wherein the passageway-former is supported independently of the projection system and the liquid confinement structure.

8. The immersion lithographic apparatus of claim 1 , further comprising an under pressure source configured to apply an under pressure on one side of the passageway-former compared to an ambient pressure on the opposite side of the passageway-former thereby to apply an attractive force to the passageway-former towards the projection system.

9. The immersion lithographic apparatus of claim 1 , wherein the passageway-former at its radially inner most position, relative to an optical axis of the projection system, extends lower than the optically active part of the final lens element.

10. The immersion lithographic apparatus of claim 1 , wherein liquid in the immersion space has a contact angle of greater than 90° on a facing surface of the passage-way former which faces the liquid confinement structure.

11. The immersion lithographic apparatus of claim 1 , wherein liquid in the immersion space has a contact angle of less than 90° on at least a part of a surface forming the passageway.

12. An immersion lithographic apparatus comprising:
a projection system configured to project a patterned radiation beam through an optically active part of a final lens element of the projection system towards a substrate supported by a substrate table, the final lens element having an exposed bottom surface;
a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between the final lens element of the projection system and a surface of the substrate and/or the substrate table;
a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and the optically active part of the final lens element, the passageway being in liquid communication via a first opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of the exposed bottom surface of the final lens element and being constructed and configured such that, when liquid is in the immersion space, it is filled with liquid from the immersion space by capillary action; and
a second opening in liquid communication with the passageway at an end of the passageway opposite to the first opening, wherein the second opening is configured to receive liquid from the passageway and wherein the second opening is mated to tubing or sealed onto a support of the passageway-former.

13. The immersion lithographic apparatus of claim 12 , wherein the passageway extends radially outwardly, with respect to an optical axis of the projection system, of an edge of an exposed bottom surface of the final lens element.

14. The immersion lithographic apparatus of claim 12 , wherein liquid in the immersion space has a contact angle of greater than 90° on a facing surface of the passage-way former which faces the liquid confinement structure.

15. The immersion lithographic apparatus of claim 12 , wherein liquid in the immersion space has a contact angle of less than 90° on at least a part of a surface forming the passageway.

16. An immersion lithographic apparatus comprising:
a projection system configured to project a patterned radiation beam through an optically active bottom surface of a final lens element of the projection system and towards a substrate supported by a substrate table;
a liquid confinement structure between the projection system and the substrate and/or the substrate table, the liquid confinement structure configured to supply and confine immersion liquid to an immersion space between the final lens element of the projection system and a surface of the substrate and/or the substrate table; and
a liquid supply opening radially outward of the optically active bottom surface of the final lens element adapted for the flow therethrough of a liquid over an exposed bottom surface of the final lens element towards the optically active bottom surface of the final lens element and into the immersion space; and
a liquid supply system configured to supply the liquid through the liquid supply opening such that liquid flows along the bottom surface with an open gap between the liquid flow and a surface of the liquid confinement structure.

17. The immersion lithographic apparatus of claim 16 , wherein at least part of the exposed bottom surface is lyophilic with the supplied liquid.

18. An immersion lithographic apparatus comprising:
a projection system configured to project a patterned radiation beam through a final lens element of the projection system towards a substrate supported by a substrate table;
a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between the final lens element of the projection system and a surface of the substrate and/or the substrate table;
a passageway-former between the projection system and the liquid confinement structure and a passageway between the passageway-former and the final lens element, the passageway being in liquid communication with the immersion space to allow a flow of liquid through the passageway to the immersion space; and
an opening in liquid communication with the passageway at an end of the passageway, the end of the passageway sealed off except for the opening and the opening configured to supply the flow of liquid into the pa

Assignees

• Asml Netherlands Bv

Inventors

• Pieterse Gerben
• Polet Theodorus Wilhelmus
• Baselmans Johannes Jacobus Matheus
• Bouman Willem Jan
• Modderman Theodorus Marinus
• Rops Cornelius Maria
• Smeets Bart
• Steffens Koen
• Van Der Ham Ronald

Classifications

• G03F7/70891 Primary

  Temperature · CPC title

• G03F7/70316

  Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements · CPC title

• G03F7/70341

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title