Method for manufacturing contrast amplifying substrates

Patent metadata

Field	Value
Publication number	US-10295822-B2
Application number	US-201415030063-A
Country	US
Kind code	B2
Filing date	Oct 17, 2014
Priority date	Oct 18, 2013
Publication date	May 21, 2019
Grant date	May 21, 2019

Abstract

A method for producing a contrast-amplifying support comprising an absorbing substrate carrying at least one absorbing layer comprises a design step for the support and the following steps: i) choosing an illumination wavelength λ; ii) choosing a material constituting the substrate and exhibiting, at illumination wavelength λ, a complex refractive index N0=n0−jk0 with k0≥0.01; iii) choosing an ambient medium in contact with the layer on the side opposite to the substrate and exhibiting, at illumination wavelength λ, a complex refractive index N3=n3−jk3 with k3≥0; iv) determining a nominal complex refractive index N1=n1−jk1 and a nominal thickness e1 of the layer wherein it behaves in the guize of antireflection layer when illuminated under normal incidence at illumination wavelength λ; and v) choosing a material constituting the layer and exhibiting, at illumination wavelength λ, a complex refractive index whose real and imaginary parts coincide with the nominal complex refractive index.

First claim

The invention claimed is:

1. A method for producing a contrast-amplifying support comprising an absorbing substrate carrying at least one absorbing layer, said method comprising a design step for said support and a step of hardware production of the support in accordance with said design step, wherein said design step comprises the following steps:
i) choosing an illumination wavelength λ;
ii) choosing a material constituting said substrate and exhibiting, at said illumination wavelength λ, complex refractive index N3=n3−jk3, where k3≥0.01;
iii) choosing an ambient medium in contact with said layer on the side opposite to said substrate and exhibiting, at said illumination wavelength λ, a real refractive index n0;
iv) determining a nominal complex refractive index N1=n1−jk1 and a nominal thickness e1 of said layer which are such that it behaves in the guise of antireflection layer when it is illuminated under normal incidence at said illumination wavelength λ; and
v) choosing a material constituting said layer and exhibiting, at said illumination wavelength λ, a complex refractive index whose real and imaginary parts coincide with those of said nominal complex refractive index at least by a tolerance of less than or equal to 5%;

in which, during said step iv), said nominal complex refractive index and said nominal thickness are chosen satisfying the following conditions:

v
1
2

=

1
+

κ
1
2

+

n
0

n
3

⁢

κ
3

⁢

2
⁢

v
1

⁢

κ
1

-

n
0

n
3

⁢

κ
3

(

n
0

n
3

-
1

)

;

a
)

δ
1

=

(

n
0

n
3

-
1

)

2
⁢

v
1

⁢

κ
1

-

n
0

n
3

⁢

κ
3

;

b
)

κ
1

≤

v
1

;
and

c
)

k
1

≥
0.15

⁢

⁢

where
⁢

:

Assignees

• Centre Nat Rech Scient
• Univ Maine

Inventors

• Ausserre Dominique
• Amra Claude
• Zerrad Myriam
• Abou Khachfe Refahi

Classifications

• G02B27/0012 Primary

  Optical design, e.g. procedures, algorithms, optimisation routines · CPC title

• G02B1/02

  made of crystals, e.g. rock-salt, semi-conductors (G02B1/08 takes precedence) · CPC title

• G02B5/003

  Light absorbing elements · CPC title

• G01N2201/068

  Optics, miscellaneous · CPC title

• G06F30/17

  Mechanical parametric or variational design · CPC title