Plasma generation for ion implanter
US-10163609-B2 · Dec 25, 2018 · US
US10283322B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10283322-B2 |
| Application number | US-201515301001-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 26, 2015 |
| Priority date | Apr 4, 2014 |
| Publication date | May 7, 2019 |
| Grant date | May 7, 2019 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
According to the process, the filiform component is continuously linearly moved through magnetic dipoles arranged opposite each other and around a tube constituting a treatment chamber, and the microwave energy is introduced between at least two magnetic dipoles.
Opening claim text (preview).
The invention claimed is: 1. A process to generate a plasma excited by microwave energy in a field of electron cyclotron resonance (ECR), to execute a surface treatment or coating around a filiform component, comprising: arranging at least two annular magnets constituting magnetic dipoles at atmospheric pressure opposite each other and mounted concentrically around a tube constituting a treatment chamber, to produce axisymmetric magnetic field lines parallel to the filiform component, continuously linearly moving the filiform component through the at least two annular magnets and the tube constituting a treatment chamber, introducing the microwave energy to the tube, between the at least two annular magnets via a microwave applicator mounted between the at least two annular magnets, and thereby generating a linear axisymmetrical plasma confined around the filiform component in the treatment chamber. 2. The process according to claim 1 , wherein the surface treatment comprises a cleaning, a pickling, a functionalisation, or a grafting. 3. The process according to claim 1 , wherein the coating is obtained by PECVD (plasma-enhanced chemical vapour deposition). 4. A device to generate a microwave excited plasma by electron cyclotron resonance (ECR), around a continuously linearly driven filiform component, comprising: at least one module composed of two annular magnets constituting magnetic dipoles arranged at atmospheric pressure opposite each other and mounted concentrically around a tube constituting a treatment chamber, and producing axisymmetric magnetic field lines parallel to the filiform component wherein the filiform component to be treated is linearly moved through the two annular magnets and through the tube constituting the treatment chamber, and wherein the device further includes a microwave applicator connected to the tube, between the two annular magnets to introduce microwave energy between the two annular magnets, thus generating a linear axisymmetrical plasma confined around the filiform component in the treatment chamber. 5. The device according to claim 4 , wherein the annular magnets comprise permanent magnets. 6. The device according to claim 4 , wherein the annular magnets comprise electromagnet coils. 7. The device according to claim 4 , wherein the microwave applicator is arranged perpendicularly to a central axis of the tube. 8. The device according to claim 4 , wherein the tube constitutes a Tee having a median branch and two other branches on either side of said median branch, the median branch receives the microwave applicator and the other two branches receive the annular magnets. 9. The device according to claim 4 , wherein the device comprises several modules mounted in series and in linear alignment and connected together by a sealing ring. 10. The device according to claim 9 , wherein each sealing ring acts as a pumping zone being connected to a gas pumping collector. 11. The device according to claim 9 , wherein the sealing ring acts alternatively as a gas pumping zone and as a gas injection zone. 12. The device according to claim 4 , wherein the filiform component is electrically polarised to allow an ion bombardment of the plasma.
Electron cyclotron resonance · CPC title
Microwave generated discharge (H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence) · CPC title
Treating multiple sides of workpieces, e.g. 3D workpieces · CPC title
Means for moving the material to be treated · CPC title
Sealing means, e.g. sealing between different parts of the vessel · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.