Diamond single crystal and production method thereof, and single crystal diamond tool

US10280531B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10280531-B2
Application numberUS-201615228423-A
CountryUS
Kind codeB2
Filing dateAug 4, 2016
Priority dateJun 29, 2012
Publication dateMay 7, 2019
Grant dateMay 7, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A method for producing a diamond single crystal includes implanting an ion other than carbon into a surface of a diamond single crystal seed substrate and thereby decreasing the transmittance of light having a wavelength of 800 nm, the surface having an off-angle of 7 degrees or less with respect to a {100} plane, and homoepitaxially growing a diamond single crystal on the ion-implanted surface of the seed substrate using a chemical vapor synthesis under synthesis conditions where the ratio N C /N H of the number of carbon-containing molecules N C to the number of hydrogen molecules N H in a gas phase is 10% or more and 40% or less, the ratio N N /N C of the number of nitrogen molecules N N to the number of carbon-containing molecules N C in the gas phase is 0.1% or more and 10% or less, and the seed substrate temperature T is 850° C. or more and less than 1000° C.

First claim

Opening claim text (preview).

The invention claimed is: 1. A diamond single crystal synthesized using a chemical vapor synthesis method and after annealing having an absorption coefficient of 25 cm −1 or more and 80 cm −1 or less for light having a wavelength of 350 nm. 2. A single crystal diamond tool, comprising a cutting edge made of a diamond single crystal synthesized using a chemical vapor synthesis method and after annealing having an absorption coefficient of 25 cm −1 or more and 80 cm −1 or less for light having a wavelength of 350 nm.

Assignees

Inventors

Classifications

  • Diamond · CPC title

  • Diamond · CPC title

  • Self-sustaining carbon mass or layer with impregnant or other layer · CPC title

  • by ion-implantation · CPC title

  • the substrate being of the same materials as the epitaxial layer · CPC title

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What does patent US10280531B2 cover?
A method for producing a diamond single crystal includes implanting an ion other than carbon into a surface of a diamond single crystal seed substrate and thereby decreasing the transmittance of light having a wavelength of 800 nm, the surface having an off-angle of 7 degrees or less with respect to a {100} plane, and homoepitaxially growing a diamond single crystal on the ion-implanted surface…
Who is the assignee on this patent?
Sumitomo Electric Industries
What technology area does this patent fall under?
Primary CPC classification C30B25/186. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 07 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).