Device structure and method of producing the same

US10276827B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10276827-B2
Application numberUS-201414896572-A
CountryUS
Kind codeB2
Filing dateMay 21, 2014
Priority dateJun 7, 2013
Publication dateApr 30, 2019
Grant dateApr 30, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A device structure 10 according to an embodiment of the present invention includes a substrate (base) 2, a device layer 3, a first inorganic material layer (convex portion) 41, and a first resin material 51. The substrate 2 has a first surface 2a and a second surface 2c opposite to the first surface 2a. The device layer 3 is arranged on at least the first surface 2a out of the first and second surfaces 2a and 2c. The first inorganic material layer 41 is formed on the first surface 2a. The first resin material 51 is unevenly arranged around the first inorganic material layer 41.

First claim

Opening claim text (preview).

The invention claimed is: 1. A device structure, comprising: a substrate having a first surface and a second surface opposite to the first surface; a device layer arranged on the first surface of the substrate; a first convex portion formed on the first surface, the first convex portion being made of a first inorganic material layer covering the device layer; a first resin material selectively arranged around the first convex portion to fill a gap between the first convex portion and the first surface; and a second convex portion made of a second inorganic material layer fully covering the first resin material and an upper surface and a side surface of the first inorganic material layer, wherein the second inorganic material layer is in direct contact with the substrate, the first resin material, and the first inorganic material layer. 2. The device structure according to claim 1 , further comprising: a second resin material that is interposed between the first inorganic material layer and the second inorganic material layer and is unevenly arranged on a surface of the first convex portion apart from the first resin material. 3. The device structure according to claim 1 , further comprising: a second resin material filled in boundaries between a surface of the first convex portion and a particle attached to the surface of the first convex portion. 4. The device structure according to claim 1 , wherein the first resin material is continuously provided along boundaries between a side surface of the first convex portion and the first surface. 5. The device structure according to claim 4 , wherein an angle between the side surface of the first convex portion and the first surface on the boundaries is less than 90°; and the boundaries are filled with the first resin material. 6. The device structure according to claim 1 , wherein the first inorganic material layer includes a silicon compound. 7. The device structure according to claim 1 , wherein the first resin material includes any one of acrylic resin and polyurea resin. 8. The device structure according to claim 1 , wherein the device layer includes an organic luminescent layer. 9. A method of producing a device structure, comprising: forming a convex portion made of first inorganic material layer covering a device layer provided on a surface of a substrate; forming a resin layer selectively arranged around the convex portion to fill a gap between the convex portion and the surface of the substrate by supplying an organic material in the form of liquid to the surface of the substrate and selectively flocculating the organic material on boundaries between a side surface of the convex portion and the surface of the substrate; and forming a second inorganic material layer fully covering the side surface of the convex portion and the material, so that the second inorganic material layer is in direct contact with the substrate, the resin material, and the first inorganic material layer, by deposition of an inorganic material on the surface of the substrate.

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What does patent US10276827B2 cover?
A device structure 10 according to an embodiment of the present invention includes a substrate (base) 2, a device layer 3, a first inorganic material layer (convex portion) 41, and a first resin material 51. The substrate 2 has a first surface 2a and a second surface 2c opposite to the first surface 2a. The device layer 3 is arranged on at least the first surface 2a out of the first and second …
Who is the assignee on this patent?
Ulvac Inc
What technology area does this patent fall under?
Primary CPC classification H01L51/5253. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 30 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).