Process for treating a magnetic structure

Patent metadata

Field	Value
Publication number	US-10276302-B2
Application number	US-201414769760-A
Country	US
Kind code	B2
Filing date	Feb 21, 2014
Priority date	Feb 27, 2013
Publication date	Apr 30, 2019
Grant date	Apr 30, 2019

Abstract

Process for treating a magnetic structure, wherein it comprises the following steps: providing a magnetic structure comprising one first layer of magnetic material comprising a CoFeB alloy; irradiating the magnetic structure with light low-energy ions; and simultaneously holding the magnetic structure with a preset temperature profile and for a preset time.

First claim

The invention claimed is:

1. A process for treating a magnetic structure, wherein it comprises the following steps:
providing a magnetic structure comprising a stack of magnetic layers, at least one first layer of magnetic material comprising a CoFeB alloy being deposited on a substrate to form part of the stack;
irradiating the magnetic structure with He+, H+, Ar+, Xe+, or Ga+ ions, which are emitted ions passing through the magnetic layers of the stack where they locally alter the structure by creating inter-atomic displacements, and are implanted deep in the substrate on which the stack was deposited, at a depth in the substrate between 100 nm and 300 nm; and
simultaneously holding the magnetic structure at a preset temperature profile and for a preset time.

2. The process according to claim 1 , wherein the preset temperature is between 20° C. and 200° C.

3. The process according to claim 1 , wherein the preset temperature is between 15° C. and 40° C.

4. The process according to claim 1 , wherein the preset dine is less than or equal to 1 hour.

5. The process according to claim 1 , wherein the magnetic material is initially amorphous.

6. The process according to claim 1 , wherein the magnetic material is initially crystalline.

7. The process according to claim 1 wherein the ions have an energy of between 0.1 keV and 150 keV.

8. The process according to claim 1 , wherein, during the irradiation step, the ions are emitted at a dose of between 1×10 13 ions/cm 2 and 5×10 16 ions/cm 2 .

9. The process according to claim 1 , wherein, during the irradiation step, the ions bombard the magnetic structure via through-openings in a mask.

10. The process according to claim 1 , wherein the magnetic structure comprises at least one second layer of insulation in contact with the first layer of magnetic material.

11. The process according to claim 10 , wherein the magnetic structure comprises a stack of alternating first layers of magnetic material and second layers of insulation.

Assignees

• Centre National De La Rech Scientifique—Cnrs
• Univ Paris Sud 11
• Centre Nat Rech Scient
• Univ Paris Sud Paris Ii

Inventors

• Ravelosona Dafine

Classifications

• H01F41/308 Primary

  lift-off processes, e.g. ion milling, for trimming or patterning · CPC title

• H01F1/047

  Alloys characterised by their composition · CPC title

• H01F7/02

  Permanent magnets {[PM]} · CPC title

• H01F41/0253 Primary

  for manufacturing permanent magnets · CPC title

• H01L43/12

  Electricity · mapped topic