Method for imparting water repellency to surface of member

US10274826B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10274826-B2
Application numberUS-201615172005-A
CountryUS
Kind codeB2
Filing dateJun 2, 2016
Priority dateJun 5, 2015
Publication dateApr 30, 2019
Grant dateApr 30, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for imparting water repellency to a surface of a member includes a step in which a material including a compound containing a fluorine atom is deposited on a surface of a photosensitive resin layer in order to form a member including a material layer; a first exposure step in which the member is exposed to an amount of light with an exposure apparatus in order to form a latent image in the member; a development step in which the member including the latent image is developed; and a second exposure step in which the member is exposed to an amount of light with an exposure apparatus subsequent to the development step.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for imparting water repellency to an ejection port surface of a liquid ejection head, the ejection port surface being a surface of the liquid ejection head on which an ejection port is formed, the method comprising: a step in which a material including a compound containing a fluorine atom is deposited on a surface of a photosensitive resin layer on a substrate, the surface of the photosensitive resin layer serving as an ejection port surface, in order to form a member including the photosensitive resin layer and a material layer including the material, the material layer being disposed on a front surface of the photosensitive resin layer; a first exposure step in which a surface of the member is exposed to an amount of light with an exposure apparatus in order to form a latent image in the photosensitive resin layer and the material layer of the member; a development step in which the member including the latent image is developed, thereby removing the photosensitive resin layer and the material layer within the latent image, the ejection port being formed at a portion where the member has been removed; an initial curing step in which the member is initially cured after the development step, wherein, in the initial curing step, the member is heated at 120° C. or more and 160° C. or less for 2 minutes or more and 4 minutes or less; a second exposure step in which the surface of the member is exposed to an amount of light with an exposure apparatus subsequent to the development step and the initial curing step, wherein exposure in the second exposure step is incident from the same side as the first exposure and imparts water repellency to the member and thereby increasing a contact angle of pure water on the surface of the member by 3° or more; a supply port forming step in which a supply port is formed by etching the substrate after the second exposure step; an ultraviolet light irradiation step in which the member is irradiated with ultraviolet light after the supply port forming step; a member removal step in which a part of the member is removed after the ultraviolet light irradiation step; and a final heat curing step in which the member is cured after the member removal step, and in which the member is heated at 170° C. or more and 220° C. or less for 30 minutes or more and 120 minutes or less. 2. The method for imparting water repellency to an ejection port surface of a liquid ejection head according to claim 1 , wherein the amount of light received by the surface of the member in the first exposure step is 1.0 J/cm2 or less. 3. The method for imparting water repellency to an ejection port surface of a liquid ejection head according to claim 1 , wherein a total amount of light received by the surface of the member in the first exposure step and the second exposure step is 1.5 J/cm2 or more. 4. The method for imparting water repellency to an ejection port surface of a liquid ejection head according to claim 1 , wherein a contact angle of pure water on the surface of the member is increased by 3° or more as compared with a contact angle of pure water on a surface of a second member subjected to a method for imparting water repellency in which the second exposure step is not conducted. 5. The method for imparting water repellency to an ejection port surface of a liquid ejection head according to claim 1 , wherein, in the second exposure step, the member is exposed to light such that the amount of light received by the surface of the member reaches 1.0 J/cm2 or more within 1 hour. 6. The method for imparting water repellency to an ejection port surface of a liquid ejection head according to claim 1 , wherein the supply port is formed by dry etching. 7. The method for imparting water repellency to an ejection port surface of a liquid ejection head according to claim 1 , wherein the amount of light received by the surface of the member in the second exposure step is 0.5 J/cm2 or more. 8. The method for imparting water repellency to an ejection port surface of a liquid ejection head according to claim 1 , wherein the member is heated at 80° C. or more for 1 minute or more after the second exposure step and before the supply port forming step.

Assignees

Inventors

Classifications

  • Non-aqueous compositions · CPC title

  • Treatment after imagewise removal, e.g. baking · CPC title

  • Macromolecular compounds containing Si-O, Si-C or Si-N bonds (G03F7/0752 takes precedence) · CPC title

  • G03F7/11Primary

    having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title

  • of the front shooter type · CPC title

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What does patent US10274826B2 cover?
A method for imparting water repellency to a surface of a member includes a step in which a material including a compound containing a fluorine atom is deposited on a surface of a photosensitive resin layer in order to form a member including a material layer; a first exposure step in which the member is exposed to an amount of light with an exposure apparatus in order to form a latent image in…
Who is the assignee on this patent?
Canon Kk
What technology area does this patent fall under?
Primary CPC classification G03F7/11. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 30 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).