Transistor with fluorinated graphene spacer

US10263080B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10263080-B2
Application numberUS-201715672017-A
CountryUS
Kind codeB2
Filing dateAug 8, 2017
Priority dateMay 24, 2017
Publication dateApr 16, 2019
Grant dateApr 16, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An integrated circuit (IC) device may include a semiconductor structure. The semiconductor structure may include a source contact, a drain contact, and a gate. A first fluorocarbon spacer may be between the gate and the source contact. A second fluorocarbon spacer may be between the gate and the drain contact.

First claim

Opening claim text (preview).

What is claimed is: 1. An integrated circuit (IC) device, comprising: a semiconductor structure; a source contact on the semiconductor structure; a drain contact on the semiconductor structure; a gate on the semiconductor structure; a first fluorocarbon spacer between the gate and the source contact; and a second fluorocarbon spacer between the gate and the drain contact, the first fluorocarbon spacer and the second fluorocarbon spacer contacting sidewalls of the gate. 2. The IC device of claim 1 , in which the semiconductor structure is a fin. 3. The IC device of claim 1 , further comprising low-K spacer material between the first fluorocarbon spacer and the source contact, and between the second fluorocarbon spacer and the drain contact. 4. The IC device of claim 3 , in which the low-K spacer material comprises silicon boron carbon nitride (SiBCN). 5. The IC device of claim 1 , in which the first fluorocarbon spacer and the second fluorocarbon spacer comprise fluorographene spacers. 6. The IC device of claim 1 , in which a thickness of the first fluorocarbon spacer is at least 0.3 nanometers. 7. The IC device of claim 1 , in which the semiconductor structure comprises a planar transistor structure or a gate all around (GAA) transistor structure. 8. The IC device of claim 1 , integrated into a mobile phone, a set top box, a music player, a video player, an entertainment unit, a navigation device, a computer, a hand-held personal communication systems (PCS) unit, a portable data unit, and/or a fixed location data unit.

Assignees

Inventors

Classifications

  • the material containing hafnium, e.g. HfO2 · CPC title

  • composed of carbon, e.g. alpha-C, diamond or hydrogen doped carbon · CPC title

  • using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition (deposition by physical ablation of a target H10P14/6329) · CPC title

  • Electricity · mapped topic

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US10263080B2 cover?
An integrated circuit (IC) device may include a semiconductor structure. The semiconductor structure may include a source contact, a drain contact, and a gate. A first fluorocarbon spacer may be between the gate and the source contact. A second fluorocarbon spacer may be between the gate and the drain contact.
Who is the assignee on this patent?
Qualcomm Inc
What technology area does this patent fall under?
Primary CPC classification H01L29/1606. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 16 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).