Fine particle production apparatus and fine particle production method

Patent metadata

Field	Value
Publication number	US-10252339-B2
Application number	US-201615251840-A
Country	US
Kind code	B2
Filing date	Aug 30, 2016
Priority date	Nov 12, 2015
Publication date	Apr 9, 2019
Grant date	Apr 9, 2019

Abstract

To provide an apparatus and a method of producing fine particles capable of increasing evaporation efficiency of a material, increasing the production of fine particles and reducing costs by heating the inputted material by a gas heated by thermal plasma. A fine particle production apparatus includes a vacuum chamber, a material feeding device connected to the vacuum chamber and feeding material particles from a material feeding port into the vacuum chamber, electrodes arranged in the vacuum chamber for generating plasma and a collection device connected to the vacuum chamber and collecting fine particles, which produces the fine particles from the material by generating electric discharge inside the vacuum chamber, in which the collection device and the material feeding device are connected by piping, and a material heating and circulation device which heats the material by heat of a gas inside the chamber heated by the plasma through the piping is provided.

First claim

What is claimed is:

1. A fine particle production apparatus comprising:
a vacuum chamber;
a material feeding device connected to the vacuum chamber, the material feeding device configured to feed material particles from a material feeding port into the vacuum chamber;
electrodes arranged in the vacuum chamber for generating plasma; and
a collection device connected to the vacuum chamber, the collection device configured to collect fine particles discharged from the vacuum chamber, the fine particles produced from the material supplied from the material feeding device by the plasma generated inside the vacuum chamber,
wherein the collection device and the material feeding device are connected by piping, and
a material heating and circulation device having a circulation pump provided in the piping that feeds gas discharged from the vacuum chamber to the material feeding device and the fine particles to the collection device.

2. The fine particle production apparatus according to claim 1 , further comprising:
a temperature regulator arranged in the piping connecting the collection device and the material feeding device, the temperature regulator configured to regulate the temperature of the gas flowing in the piping.

3. The fine particle production apparatus according to claim 1 ,
wherein the electrodes for generating the plasma are a plurality of electrodes arranged in the vacuum chamber, tip ends of which protrude inside the vacuum chamber to generate plasma.

4. The fine particle production apparatus according to claim 3 , further comprising:
AC power sources respectively connected to the plural electrodes and supplying power in different phases,
wherein the power in different phases is supplied to respective plural electrodes from the AC power sources to generate arc discharge and to generate the plasma.

5. A fine particle production apparatus comprising:
a vacuum chamber;
a material feeding device connected to the vacuum chamber, the material feeding device configured to feed material particles from a material feeding port into the vacuum chamber;
electrodes arranged in the vacuum chamber for generating plasma; and
a collection device connected to the vacuum chamber, the collection device configured to collect fine particles discharged from the vacuum chamber, the fine particles produced from the material supplied from the material feeding device by the plasma generated inside the vacuum chamber, wherein the collection device and the material feeding device are connected by piping,
a material heating and circulation device configured to heat the material by heat of a gas inside the vacuum chamber heated by the plasma, the gas provided through the piping; and
lower-side gas supply pipes separated to be connected to plural positions of the vacuum chamber through flow-rate regulators in the piping connecting the collection device and the material feeding device,
wherein the lower-side gas supply pipes supply the gas inside the vacuum chamber heated by the plasma from the lower side of the material feeding port in a vertical direction into the vacuum chamber through the piping and the lower-side gas supply pipes.

6. A fine particle production apparatus comprising:
a vacuum chamber;
a material feeding device connected to the vacuum chamber, the material feeding device configured to feed material particles from a material feeding port into the vacuum chamber;
electrodes arranged in the vacuum chamber for generating plasma; and
a collection device connected to the vacuum chamber, the collection device configured to collect fine particles discharged from the vacuum chamber, the fine particles produced from the material supplied from the material feeding device by the plasma generated inside the vacuum chamber, wherein the collection device and the material feeding device are connected by piping,
a material heating and circulation device configured to heat the material by heat of a gas inside the vacuum chamber heated by the plasma, the gas provided through the piping;
a gas analyzer arranged in the piping connecting the collection device and the material feeding device, the gas analyzer configured to analyze partial pressures or a ratio of respective kinds of gases; and
a gas partial pressure regulator arranged in the piping, the gas partial pressure regulator configured to regulate gas partial pressures by exhausting the gas or introducing the gas with respect to the piping based on the analysis result by the gas analyzer.

Assignees

• Panasonic Ip Man Co Ltd

Inventors

• Nagai Hisao
• Koiwasaki Takeshi
• Suetsugu Daisuke
• Okuma Takafumi

Classifications

• B22F2999/00

  Aspects linked to processes or compositions used in powder metallurgy · CPC title

• B01J2219/0875

  Gas · CPC title

• B01J2219/083

  cylindrical · CPC title

• C01B21/068

  with silicon · CPC title

• B01J2219/0898

  Hot plasma · CPC title