Method of producing glass substrate and glass substrate

Patent metadata

Field	Value
Publication number	US-10239783-B2
Application number	US-201715730448-A
Country	US
Kind code	B2
Filing date	Oct 11, 2017
Priority date	May 24, 2012
Publication date	Mar 26, 2019
Grant date	Mar 26, 2019

Abstract

A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD includes preparing the glass substrate and forming the first layer on the glass substrate by the low-temperature CVD. In the glass substrate after forming the first layer, an integrated value after a baseline correction in a wavenumber range of 2600 cm −1 to 3800 cm −1 in a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and the C content of the first layer is 1.64 at % or less.

First claim

What is claimed is:

1. A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD, the method comprising:
preparing the glass substrate; and
forming the first layer on the glass substrate by the low-temperature CVD,
wherein the first layer is formed on a surface of the glass substrate at a plasma power of 20 kW/m or higher, and
wherein, in the glass substrate after said forming the first layer, an integrated value after a baseline correction in a wavenumber range of 2600 cm −1 to 3800 cm −1 in a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and a C content of the first layer is 1.64 at % or less.

2. The method as claimed in claim 1 , wherein said forming the first layer includes supplying the glass substrate with an organic metal precursor.

3. The method as claimed in claim 2 , wherein the organic metal precursor includes at least one component selected from the group consisting of Si, Ti, Zn, Sn and Al.

4. The method as claimed in claim 2 , wherein the organic metal precursor includes at least one component selected from the group consisting of a —CH 3 group, a —OH group and a —H group.

5. The method as claimed in claim 1 , wherein the first layer is at least one of oxide, nitride, and oxynitride.

6. The method as claimed in claim 1 , wherein said forming the first layer is performed at a deposition rate in a range of 50 nm·m/min to 400 nm·m/min.

7. The method as claimed in claim 1 , wherein the low-temperature CVD is PECVD.

8. The method as claimed in claim 1 , further comprising: forming a second layer over the glass substrate by a method other than the low-temperature CVD.

9. The method as claimed in claim 8 , wherein said forming the second layer is performed before or after said forming the first layer.

10. The method as claimed in claim 8 , further comprising: forming a third layer over the glass substrate by the low-temperature CVD after said forming the first layer.

11. The method as claimed in claim 10 , wherein, in the glass substrate after said forming the third layer, an integrated value after the baseline correction in the wavenumber range of 2600 cm −1 to 3800 cm −1 in a peak due to OH groups obtained by an FTIR measurement on the first through third layers is 9.0 or less.

12. The method as claimed in claim 8 , wherein the method other than the low-temperature CVD is sputtering or thermal CVD.

Assignees

• Asahi Glass Co Ltd
• Agc Inc

Inventors

• Hanekawa Hiroshi
• Aomine Nobutaka
• Aoshima Yuki
• Kawahara Hirotomo
• Maeshige Kazunobu

Classifications

• C03C2217/73

  Anti-reflective coatings with specific characteristics · CPC title

• C03C17/36

  at least one coating being a metal · CPC title

• C03C17/3411

  with at least two coatings of inorganic materials (C03C17/36, C03C17/42 take precedence) · CPC title

• C03C2218/152

  by cvd · CPC title

• G02B1/11

  Anti-reflection coatings · CPC title