Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern

Patent metadata

Field	Value
Publication number	US-10234759-B2
Application number	US-201514751669-A
Country	US
Kind code	B2
Filing date	Jun 26, 2015
Priority date	Dec 27, 2012
Publication date	Mar 19, 2019
Grant date	Mar 19, 2019

Abstract

Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (A) and any of compounds (B) of general formula (I) below. (In general formula (I), Rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; R 1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X 1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X 1 may be bonded to R 1 to thereby form a ring; and Z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group).

First claim

The invention claimed is:

1. An actinic-ray- or radiation-sensitive resin composition comprising a resin (A) and any of compounds (B) of general formula (I) below,

in which
Rf represents a fluorine atom
R 1 represents a hydrogen atom;
X 1 represents an organic group of general formula (Ia) below, provided that X 1 may be bonded to R 1 to thereby form a ring; and
Z represents a moiety which, when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group,
-L 11 -X 11   (Ia)

in which
L 11 represents a bivalent connecting group having at least one —CH 2 — group and only one —C(═O)— group, provided that the connecting group represented by L 11 contains no fluorine atom, and
X 11 represents an alicyclic group, or a heterocyclic group,
provided that the any of organic groups of general formula (Ia) as a whole contains at least five carbon atoms.

2. The actinic-ray- or radiation-sensitive resin composition according to claim 1 , wherein Z in the general formula (I) represents the moiety which, when exposed to actinic rays or radiation, is converted to the sulfonic acid.

3. The actinic-ray- or radiation-sensitive resin composition according to claim 1 , wherein X 11 in the general formula (Ia) is a polycyclic alicyclic group.

4. The actinic-ray- or radiation-sensitive resin composition according to claim 1 , wherein L 11 in the general formula (Ia) is a bivalent connecting group comprising —CH 2 —, —CO— and —O— groups.

5. The actinic-ray- or radiation-sensitive resin composition according to claim 1 , wherein L 11 in the general formula (Ia) is a bivalent connecting group comprising at least two —CH 2 — groups.

6. The actinic-ray- or radiation-sensitive resin composition according to claim 1 , wherein L 11 in the general formula (Ia) is a bivalent connecting group selected from —C(═O)—O—CH 2 —, —CH 2 —O—C(═O)—, and —C(═O)—O—CH 2 —CH 2 —CH 2 —CH(CH 3 )— groups.

7. An actinic-ray- or radiation-sensitive resin composition comprising a resin (A) and any of compounds (B) of general formula (I) below,

in which
Rf represents a fluorine atom;
R 1 represents a hydrogen atom;
X 1 represents an organic group of general formula (Ia) below, provided that X 1 may be bonded to R 1 to thereby form a ring;
Z represents a moiety which, when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group,
-L 11 -X 11   (Ia)

in which
L 11 represents a bivalent connecting group having at least one —CH 2 — group and only one of either —C(═O)—O— or —O—C(═O)— group, provided that the connecting group represented by L 11 contains no fluorine atom, and
X 11 represents an alicyclic group, or a heterocyclic group,
provided that the any of organic groups of general formula (Ia) as a whole contains at least five carbon atoms.

8. The actinic-ray- or radiation-sensitive resin composition according to claim 7 , wherein Z in the general formula (I) represents the moiety which, when exposed to actinic rays or radiation, is converted to the sulfonic acid.

9. The actinic-ray- or radiation-sensitive resin composition according to claim 7 , wherein X 11 in the general formula (Ia) is a polycyclic alicyclic group.

10. The actinic-ray- or radiation-sensitive resin composition according to claim 7 , wherein L 11 in the general formula (Ia) is a bivalent connecting group comprising at least two —CH 2 — groups.

11. The actinic-ray- or radiation-sensitive resin composition according to claim 7 , wherein L 11 in the general formula (Ia) is a bivalent connecting group selected from —C(═O)—O—CH 2 —, —CH 2 —O—C(═O)—, and —C(═O)—O—CH 2 —CH 2 —CH 2 —CH(CH 3 )— groups.

12. An actinic-ray- or radiation-sensitive resin composition comprising a resin (A) and any of compounds (B) of general formula (I) below,

in which
Rf represents a fluorine atom;
R 1 represents —C(CH 3 ) 3 , —CN, —C(═O)CH 3 , or —CH 3 group;
X 1 represents an organic group of general formula (Ia) below, provided that X 1 may be bonded to R 1 to thereby form a ring;
Z represents a moiety which, when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group,
-L 11 -X 11   (Ia)

in which
L 11 represents a bivalent connecting group having at least one —CH 2 — group, provided that the connecting group represented by L 11 contains no fluorine atom, and
X 11 represents an alicyclic group, or a heterocyclic group,
provided that the any of organic groups of general formula (Ia) as a whole contains at least four carbon atoms.

Assignees

• Fujifilm Corp

Inventors

• Kawabata Takeshi
• Takizawa Hiroo
• Shibuya Akinori
• Goto Akiyoshi
• KOJIMA Masafumi
• Kato Keita

Classifications

• G03F7/0397

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title

• C07C309/06

  containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton · CPC title

• C07C317/04

  of an acyclic saturated carbon skeleton · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• G03F7/0045 Primary

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title