Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method

Patent metadata

Field	Value
Publication number	US-10222701-B2
Application number	US-201415024815-A
Country	US
Kind code	B2
Filing date	Sep 18, 2014
Priority date	Oct 16, 2013
Publication date	Mar 5, 2019
Grant date	Mar 5, 2019

Abstract

A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.

First claim

The invention claimed is:

1. A radiation source device, the device comprising:
a source chamber having an exit aperture;
a collector configured to collect at least radiation of a desired wavelength emitted by a plasma and to direct the collected radiation beam toward the exit aperture of the source chamber;
a buffer gas unit configured to supply buffer gas to the source chamber; and
a fan unit located such that a beam path toward the exit aperture passes through at least part of the fan unit, configured to generate a flow of the buffer gas away from the collector and/or the exit aperture, and having at least one blade that, in an operation of the fan unit, moves in a loop around the beam path.

2. A device according to claim 1 , wherein the fan unit comprises a blade assembly having a plurality of blades mounted in an annular arrangement and rotatable about an optical axis of the beam path.

3. A device according to claim 2 wherein the fan unit comprises a plurality of concentric blade assemblies.

4. A device according to claim 3 wherein the fan unit comprises a drive unit arranged to rotate adjacent ones of the concentric blade assemblies with different angular velocities.

5. A device according to claim 1 wherein at least one blade is curved.

6. A device according to claim 5 , wherein the number and curvature of the at least one blade is selected such that there is no straight path from an optical axis of the beam path through the fan unit.

7. A device according to claim 5 , wherein the curvature of at least one blade is selected such that an imaginary line extending from an optical axis of the beam path and perpendicular thereto to a given point on a blade intersects the blade at an angle of greater than 45 degrees to a normal to the surface of the blade.

8. A device according to claim 1 , wherein
the collector is configured to direct the radiation to an intermediate focus near the exit aperture; and
each blade is configured such that all straight lines between a predetermined section of a distal edge of the blade, the distal edge being the edge closest to the beam path, and the intermediate focus are obstructed.

9. A device according to claim 8 , wherein the predetermined section of the distal edge includes all parts of the edge at which a particle incident thereon directly from the plasma is deflected onto a trajectory aimed at the exit aperture.

10. A device according to claim 8 , wherein the predetermined section includes the whole of the distal edge.

11. A device according to claim 1 , wherein the fan unit comprises a drive unit arranged to drive the fan unit so that a part of a blade thereof has a linear velocity greater than 100 ms −1 .

12. A device according to claim 1 , wherein the fan unit comprises a drive unit arranged to drive the fan unit so that a blade thereof has a rotational velocity in the range of from 50 to 200 Hz.

13. A device according to claim 1 , wherein the fan unit comprises a non-contact bearing arranged to rotatably support a blade thereof.

14. A device according to claim 1 , wherein the fan unit further comprises a heating unit arranged to heat the or each blade to a temperature greater than a melting point of the fuel.

15. A lithographic tool comprising:
a radiation source device according to claim 1 ; and
an optical system configured to direct radiation emitted by the radiation source onto an object.

16. A device according to claim 1 further comprising a fuel source unit configured to provide fuel to the source chamber and an excitation unit configured to excite the fuel to form the plasma.

17. A device according to claim 1 wherein the flow has a directional component perpendicular to the beam path and an entrance of the flow having the directional component perpendicular to the beam path into the at least one blade is located between the collector and the exit aperture.

18. A radiation source device, the device comprising:
a source chamber having an exit aperture;
a fuel source unit configured to provide fuel to the source chamber;
an excitation unit configured to excite the fuel to form a plasma;
a collector configured to collect at least radiation of a desired wavelength emitted by the plasma and to direct the collected radiation beam along a beam path out of the exit aperture of the source chamber; and
a particle trap located between the collector and the exit aperture, the particle trap comprising a set of vanes, wherein:
at least a part of each vane lies within the beam path,
the part of each vane is elongate and has a longitudinal axis substantially parallel to an optical axis of the beam path, and
the part of each vane extends towards but does not reach the optical axis so as to leave an open gap in a region where the part of each vane does not reach, wherein the open gap covers a majority of the cross-section, in a direction perpendicular to the axis, of the beam path.

19. A device manufacturing method comprising:
exciting a fuel to form a plasma;
collecting radiation emitted by the plasma and directing it into a beam;
directing the beam onto a patterning device;
directing the beam patterned by the patterning device onto a substrate,
supplying a buffer gas; and
operating a fan located such that a beam path toward the substrate passes through at least part of the fan unit to generate a flow of the buffer gas and such that at least one blade of the fan moves in a loop around the beam path.

20. A device manufacturing method according to claim 19 further comprising heating a blade of the fan to a temperature higher than the melting point of the fuel.

21. A device manufacturing method according to claim 20 wherein the heating is performed intermittently.

Assignees

• Asml Netherlands Bv

Inventors

• Zhao Chuangxin
• Baltussen Sander
• Broman Pär Mårten Lukas
• Bruls Richard Joseph
• Craus Cristian Bogdan
• Groenewold Jan
• Labetski Dzmitry
• Nadir Kerim
• Schimmel Hendrikus Gijsbertus
• Wählisch Christian Felix

Classifications

• G03F7/70033 Primary

  by plasma extreme ultraviolet [EUV] sources · CPC title

• G03F7/70916

  Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps · CPC title

• G03F7/70058

  Mask illumination systems · CPC title

• G03F7/70175

  Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source · CPC title

• H05G2/005

  Electricity · mapped topic