Polymer and composition containing same

Patent metadata

Field	Value
Publication number	US-10214610-B2
Application number	US-201414913194-A
Country	US
Kind code	B2
Filing date	Aug 22, 2014
Priority date	Aug 23, 2013
Publication date	Feb 26, 2019
Grant date	Feb 26, 2019

Abstract

The present invention relates to a novel multipurpose polymer and a composition containing the same. The polymer and the composition of the present invention are very useful for preparing a semiconductor device having very good mechanical and optical properties.

First claim

What is claimed is:

1. A polymer represented by Chemical Formula 1 or 2 below:

wherein
A and B are each independently selected from (C6-C20)arylene and (C3-C20)heteroarylene;
C is

wherein R 11 , R 12 , and R 13 are independently selected from hydrogen, halogen, hydroxy and (C1-C20)alkyl;
A and B may be further be independently substituted with hydroxy, halogen, (C1-C20)alkyl, (C1-C20)alkoxy, (C3-C20)cycloalkyl, (C6-C20)aryl and (C3-C20)heteroaryl;
p and q are independently selected integers from 0 to 5, wherein p+q>0;
r is an integer from 1 to 5; and
m and n are each an independent integer from 1 to 1000.

2. The polymer of claim 1 , wherein the Chemical Formula 1 is represented by Chemical Formulas 3 or 4 below:

3. The polymer of claim 2 , wherein A and B are each independently selected from the following Structural Formulas 6-16:

wherein, R 1 to R 4 are independently selected from hydrogen, halogen, hydroxy, (C1-C20)alkyl and (C6-C20)aryl.

4. The polymer of claim 1 , wherein A and B are each independently selected from the following Structural Formulas 6-16:

wherein,
R 1 to R 4 are independently selected from hydrogen, halogen, hydroxy, (C1-C20)alkyl and (C6-C20)aryl.

5. The polymer of claim 1 , wherein
A is

 ,and
B is

6. A composition comprising a polymer represented by Chemical Formula 1 or 2 below:

wherein
A and B are each independently selected from (C6-C20)arylene and (C3-C20)heteroarylene;
C is

wherein R 11 , R 12 , and R 13 are independently selected from hydrogen, halogen, hydroxy and (C1-C20)alkyl;
A and B may be further be independently substituted with hydroxy, halogen, (C1-C20)alkyl, (C1-C20)alkoxy, (C3-C20)cycloalkyl, (C6-C20)aryl and (C3-C20)heteroaryl;
p and q are independently selected integers from 0 to 5, wherein p+q>0;
r is an integer from 1 to 5; and
m and n are each an independent integer from 1 to 1000.

7. The composition of claim 6 , further comprising: a crosslinking agent and an acid catalyst.

8. The composition of claim 7 , wherein the composition includes 1 to 40 wt % of the polymer, 0.1 to 40 wt % of the crosslinking agent, 0.001 to 10 wt % of the acid catalyst, and residual amount of a solvent.

9. The composition of claim 7 , wherein the crosslinking agent is at least one selected from the group consisting of a melamine resin, an amino resin, a glycoluril compound and a bisepoxy compound.

10. The composition of claim 7 , wherein the acid catalyst is at least one selected from the group consisting of p-toluenesulfonic acid mono hydrate, pyridinium p-toluenesulfonic acid, p-toluenesulfonic acid amine salts including p-toluenesulfonic acid triethylamine salt, 2,4,4,6-tetrabromocyclohexadienone, benzoin tosylate, and 2-nitrobenzyl tosylate.

11. The composition of claim 6 , wherein the composition is used for a gap-fill process, a double patterning process, or a hard mask.

Assignees

• Dnf Co Ltd
• Skc Co Ltd
• Park Joo Hyeon

Inventors

• Park Joo Hyeon
• Kim Myong Woon
• Lee Sang Ick
• Byun Tae Seok
• Son Seung
• Kwone Yong Hee
• Jung In Kyung
• Ryou Joon Sung

Classifications

• H10P76/20

  of masks comprising organic materials · CPC title

• C08G8/04 Primary

  of aldehydes · CPC title

• C08G61/12

  Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule · CPC title

• C08G2261/135

  Cross-linked structures · CPC title

• G03F7/11

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title