Method and system for determining strain distribution in a sample

Patent metadata

Field	Value
Publication number	US-10209206-B2
Application number	US-201414903629-A
Country	US
Kind code	B2
Filing date	Jul 8, 2014
Priority date	Jul 8, 2013
Publication date	Feb 19, 2019
Grant date	Feb 19, 2019

Abstract

A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.

First claim

The invention claimed is:

1. A control system for use in measuring one or more parameters of a sample, the control system comprising:
(a) an input utility for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry-related data of a sample, being either the same sample or a sample similar to said sample for which the XRD data is received;
(b) a processor utility configured and operable to utilize the second data for processing and analyzing said first data for optimizing the first data, and utilizing the optimized first data for determining said one or more parameters of the sample including a strain distribution in the sample.

2. The control system of claim 1 , wherein the second data further includes data indicative of a different X-ray measurement.

3. The control system of claim 1 , wherein the second data is further indicative of material properties of the sample.

4. The control system of claim 1 , wherein said second data comprises data indicative of optical response of the sample to incident light and includes optical measured data indicative of pattern features in the sample.

5. The control system of claim 4 , wherein said optical measured data is indicative of at least one of the following: Optical Critical Dimension (OCD) measurement, CD-AFM measurement, CD-SEM measurement.

6. The control system of claim 1 , wherein said first data includes data indicative of a profile of at least one XRD spectral peak, and the second data includes data indicative of at least one spectral response of the sample.

7. The control system of claim 3 , wherein the processor utility comprises:
a calculation engine module configured and operable for receiving the second data comprising said data indicative of the material distribution and geometry of a sample and determining a spectral profile for an XRD peak in an XRD response of the sample;
a fitting module for analyzing said first and second data and the determined profile for the XRD peak, and optimizing a best match between the determined spectral profile and the first data, and
a sample parameter calculator module for analyzing the best match data and determining the strain distribution of the sample.

8. A measurement system for measuring one or more parameters of a sample, the measurement system comprising:
first and second units for providing first and second data comprising respectively X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample and optical response data of the sample to incident light indicative of at least a geometry of the sample; and
the control system according to claim 1 , configured for communicating with the first and second units and operable for processing and analyzing the first and second data for co-optimizing the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.

9. The measurement system of claim 8 , wherein the first unit comprises a measuring device for performing X-ray Diffraction or High-Resolution X-ray Diffraction measurement on the sample and providing said first data indicative of the material distribution in the sample.

10. The measurement system of claim 8 , wherein the second unit comprises an optical measuring device for performing optical measurement on the sample and providing said second data indicative of the geometry of the sample.

11. The measurement system of claim 8 , wherein at least one of the first and second units comprises a storage device for storing the at least one of the first and second data, and the other one of the first and second units comprises a measuring unit for performing measurements on the sample and providing the other one of the first and second data.

12. The measurement system of claim 8 , wherein the first and second units are memory utilities of a storage system for storing the first and second data.

13. A method for use in measuring one or more parameters of a sample, the method comprising:
providing first and second data comprising respectively X-ray Diffraction or High-Resolution X-ray Diffraction response data of the sample indicative of a material distribution in the sample and optical response data of the sample to incident light indicative of at least a geometry-related data of a sample, being either the same sample or a sample similar to said sample for which the XRD data is received; and
utilizing the second data and processing and analyzing the first data for optimizing at least the first data, and utilizing the at least first optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.

14. The method of claim 13 , wherein said processing comprises combining the first and second data indicative of the material distribution in the sample and geometry of the sample for determining a spectral profile for an XRD peak, optimizing a best match between the determined spectral profile and the first data, and extracting optimal data for at least the strain distribution of the sample.

Assignees

• Nova Measuring Instr Ltd

Inventors

• Barak Gilad
• Wolfling Shay
• Bozdog Cornel
• Sendelbach Matthew

Classifications

• G01L1/24

  by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis {using infrared, visible light, ultraviolet} · CPC title

• G01N23/20 Primary

  by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials · CPC title

• G01N2223/607

  strain · CPC title

• G01N2223/611

  patterned objects; electronic devices · CPC title