Drain formulation for enhanced hair dissolution

US10208273B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10208273-B2
Application numberUS-201615289490-A
CountryUS
Kind codeB2
Filing dateOct 10, 2016
Priority dateSep 10, 2012
Publication dateFeb 19, 2019
Grant dateFeb 19, 2019

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The invention relates to drain cleaning compositions including relatively high concentrations of a hypochlorite oxidizing agent and a hydroxide (e.g., 4 to 12% and 2.5 to 10%, respectively. The composition further includes a surfactant (e.g., a surfactant blend, water, and exhibits a very high pH (e.g., at least 13). The composition is monophasic, even at high oxidizing and hydroxide concentrations. The surfactant may include a blend of an uncharged surfactant (e.g., an amphoteric surfactant or nonionic surfactant) and a charged surfactant (e.g., anionic, cationic, or a surfactant that becomes so under the high pH conditions of the composition). The ratio of charged to uncharged surfactant may be at least 1:10, e.g., from 1:10 to about 1:50.

First claim

Opening claim text (preview).

The invention claimed is: 1. A drain cleaning composition consisting of: (a) 4% to 12% by weight of a hypochlorite oxidizing agent; (b) greater than 3% to 10% by weight of a hydroxide; (c) a charged surfactant which is an anionic surfactant selected from the group consisting of coconut fatty acid, sodium lauryl sulfate, alkyl benzene sulfonate, and mixtures thereof; and (d) an uncharged surfactant which is one or more amine oxides; (e) water; (f) optionally, one or more adjuvants selected from the group consisting of: coloring agents, dyes, pigments, fragrances, opacifiers, corrosion inhibitors and any combinations thereof; wherein a ratio by weight of charged surfactant to uncharged surfactant is from 1:12 to 1:50; and the composition is monophasic and viscoelastic and has a viscosity of at least 250 cP at 10/s, a zero-shear viscosity of at least 1000 cP at 25° C. and a critical shear rate of at least 1/sec. 2. The composition of claim 1 , wherein the hypochlorite oxidizing agent is sodium hypochlorite. 3. The composition of claim 1 , wherein the hydroxide is sodium hydroxide. 4. The composition of claim 1 , wherein the ratio by weight of charged surfactant to uncharged surfactant is from 1:12 to 1:30. 5. The composition of claim 1 , wherein the uncharged surfactant is two or more an amine oxides. 6. A drain cleaning composition comprising: (a) 4% to 12% by weight of a hypochlorite oxidizing agent; (b) greater than 3% to 10% by weight of a hydroxide; (c) a charged surfactant selected from the group consisting of: coconut fatty acid, sodium lauryl sulfate, and alkyl benzene sulfonate and mixtures thereof; (d) an uncharged surfactant insert which is one or more amine oxides; and (e) water; wherein the composition is monophasic and the ratio by weight of the charged surfactant to the uncharged surfactant is from 1:12 to 1:50. 7. The composition of claim 6 , wherein the hypochlorite oxidizing agent is sodium hypochlorite. 8. The composition of claim 6 , wherein the hydroxide is sodium hydroxide. 9. The composition of claim 6 , wherein the charged surfactant comprises a sodium lauryl sulfate. 10. The composition of claim 6 , wherein the charged surfactant comprises a linear alkyl benzene sulfonate. 11. The composition of claim 6 , wherein the composition has a pH of greater than 13. 12. A drain cleaning composition consisting essentially of: (a) 4% to 12% by weight of sodium hypochlorite; (b) greater than 3% to 10% by weight of sodium hydroxide; (c) a charged surfactant which is an anionic surfactant selected from the group consisting of coconut fatty acid, sodium lauryl sulfate, alkyl benzene sulfonate, and mixtures thereof; (d) an uncharged surfactant which is one or more amine oxides; and (e) water; wherein the composition is monophasic and the ratio by weight of the charged surfactant to the uncharged surfactant is from 1:12 to 1:30 and has a pH of greater than 13. 13. The composition of claim 12 , wherein a relaxation time of the composition is less than 0.1 s. 14. The composition of claim 12 , wherein a zero shear viscosity of the composition is at least 1000 cP and a critical shear rate is at least 1/s. 15. The composition of claim 12 , wherein a flocculation temperature of the composition is greater than 50° C.

Assignees

Inventors

Classifications

  • based on non-ionic surface-active compounds and soap · CPC title

  • based on anionic surface-active compounds and soap · CPC title

  • Liquid compositions · CPC title

  • Amines; Substituted amines {; Quaternized amines} · CPC title

  • C11D3/044Primary

    Hydroxides or bases · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10208273B2 cover?
The invention relates to drain cleaning compositions including relatively high concentrations of a hypochlorite oxidizing agent and a hydroxide (e.g., 4 to 12% and 2.5 to 10%, respectively. The composition further includes a surfactant (e.g., a surfactant blend, water, and exhibits a very high pH (e.g., at least 13). The composition is monophasic, even at high oxidizing and hydroxide concentrat…
Who is the assignee on this patent?
Clorox Co
What technology area does this patent fall under?
Primary CPC classification C11D3/044. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 19 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).