Drain formulation for enhanced hair dissolution

US9487742B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9487742-B2
Application numberUS-201313950140-A
CountryUS
Kind codeB2
Filing dateJul 24, 2013
Priority dateSep 10, 2012
Publication dateNov 8, 2016
Grant dateNov 8, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The invention relates to drain cleaning compositions including relatively high concentrations of a hypochlorite oxidizing agent and a hydroxide (e.g., 4 to 12% and 2.5 to 10%, respectively. The composition further includes a surfactant (e.g., a surfactant blend, water, and exhibits a very high pH (e.g., at least 13). The composition is monophasic, even at high oxidizing and hydroxide concentrations. The surfactant may include a blend of an uncharged surfactant (e.g., an amphoteric surfactant or nonionic surfactant) and a charged surfactant (e.g., anionic, cationic, or a surfactant that becomes so under the high pH conditions of the composition). The ratio of charged to uncharged surfactant may be at least 1:10, e.g., from 1:10 to about 1:50.

First claim

Opening claim text (preview).

The invention claimed is: 1. A drain cleaning composition consisting of: (a) 4% to 12% by weight of a hypochlorite oxidizing agent; (b) 2.5% to 10% by weight of a hydroxide; (c) a charged surfactant which is coconut fatty acid; (d) an uncharged surfactant which is one or more amine oxides; (e) water; (f) optionally, one or more adjuvants selected from the group consisting of: coloring agents, dyes, pigments, fragrances, opacifiers, corrosion inhibitors and any combinations thereof; and wherein a ratio of charged surfactant to uncharged surfactant by weight is from 1:10 to 1:50; and the composition is viscoelastic and has a viscosity of at least 250 cP at 10/s, a zero-shear viscosity of at least 1000 cP at 25° C. and a critical shear rate of at least 1/sec. 2. The composition of claim 1 , wherein the hypochlorite oxidizing agent is sodium hypochlorite. 3. The composition of claim 1 , wherein the hydroxide is sodium hydroxide. 4. The composition of claim 1 , wherein the charged surfactant is a mixture of alkyl fatty acids having carbon chain lengths from 6 to 18. 5. The composition of claim 1 , wherein the ratio of charged surfactant to uncharged surfactant by weight is from 1:10 to 1:30. 6. The composition of claim 1 , wherein the uncharged surfactant is lauryl dimethylamine oxide. 7. The composition of claim 1 , wherein the uncharged surfactant is myristylamine oxide. 8. The composition of claim 1 , wherein the composition is monophasic. 9. A drain cleaning composition comprising: (a) 4% to 12% by weight of a hypochlorite oxidizing agent; (b) 2.5% to 10% by weight of a hydroxide; (c) a charged surfactant which is a mixture of alkyl fatty acids having carbon chain lengths from 6 to 18; (d) an uncharged surfactant comprising one or more amine oxides; and (e) water; wherein the composition is viscoelastic and has a viscosity of at least 250 cP at 10/s, has a zero-shear viscosity of at least 1000 cP at 25° C. and a critical shear rate of at least 1/sec; and wherein the composition is monophasic and a ratio of the charged surfactant to the uncharged surfactant by weight is from 1:10 to 1:50. 10. The composition of claim 9 , wherein the hypochlorite oxidizing agent is sodium hypochlorite. 11. The composition of claim 9 , wherein the hydroxide is sodium hydroxide. 12. The composition of claim 9 , wherein the uncharged surfactant comprises lauryl dimethylamine oxide. 13. The composition of claim 9 , wherein the charged surfactant comprises coconut fatty acid. 14. The composition of claim 9 , wherein the composition has a pH of at least 13. 15. A drain cleaning composition consisting of: (a) 4% to 12% by weight of a hypochlorite oxidizing agent; (b) 2.5% to 10% by weight of a hydroxide; (c) one or more of a charged surfactant which is a mixture of alkyl fatty acids having carbon chain lengths from 6 to 18; (d) one or more of an uncharged surfactant which is one or more amine oxides; (e) water; and (f) optionally, one or more adjuvants selected from the group consisting of: dyes, pigments, fragrances, corrosion inhibitors and opacifiers; and wherein the composition is monophasic and has a pH of at least 13 and wherein a ratio of charged surfactant to uncharged surfactant by weight is from 1:10 to about 1:50. 16. The composition of claim 15 , wherein the ratio of charged surfactant to uncharged surfactant by weight is from 1:10 to about 1:30. 17. The composition of claim 15 , wherein a zero shear viscosity of the composition at 25° C. is at least 1000 cP. 18. The composition of claim 15 , wherein a relaxation time of the composition is less than 0.1 s. 19. The composition of claim 15 , wherein a zero shear viscosity of the composition at 25° C. is at least 1000 cP and a critical shear rate is at least 1/s. 20. The composition of claim 15 , wherein a flocculation temperature of the composition is greater than 50° C.

Assignees

Inventors

Classifications

  • C11D3/044Primary

    Hydroxides or bases · CPC title

  • Structured liquid compositions, e.g. liquid crystalline phases or network containing non-Newtonian phase · CPC title

  • Inorganic bleaching agents (C11D3/3951 takes precedence) · CPC title

  • Liquid compositions · CPC title

  • Amines; Substituted amines {; Quaternized amines} · CPC title

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What does patent US9487742B2 cover?
The invention relates to drain cleaning compositions including relatively high concentrations of a hypochlorite oxidizing agent and a hydroxide (e.g., 4 to 12% and 2.5 to 10%, respectively. The composition further includes a surfactant (e.g., a surfactant blend, water, and exhibits a very high pH (e.g., at least 13). The composition is monophasic, even at high oxidizing and hydroxide concentrat…
Who is the assignee on this patent?
Clorox Co
What technology area does this patent fall under?
Primary CPC classification C11D3/044. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 08 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).