Substrate and manufacturing method thereof, and display device

Patent metadata

Field	Value
Publication number	US-10197817-B2
Application number	US-201615507122-A
Country	US
Kind code	B2
Filing date	Sep 7, 2016
Priority date	Oct 30, 2015
Publication date	Feb 5, 2019
Grant date	Feb 5, 2019

Abstract

A substrate and a manufacturing method thereof, and a display device are provided. The substrate comprises a base substrate ( 101 ), a metal black matrix ( 111 ) and an anti-reflection pattern ( 112 A, 112 B) for reducing optical reflectivity of the metal black matrix ( 111 ), which are arranged on the base substrate ( 101 ), and the anti-reflection pattern ( 112 A, 112 B) is arranged on a side of the metal black matrix ( 111 ) close to a light emission side of the substrate. The anti-reflection pattern ( 112 A, 112 B) reduces reflectivity of the metal black matrix ( 111 ) on outside ambient light, increases a display contrast of a display device that includes the substrate, and thus improves display quality of the pictures.

First claim

The invention claimed is:

1. A substrate, comprising a base substrate, a metal black matrix and an anti-reflection pattern for reducing optical reflectivity of the metal black matrix, which are arranged on the base substrate, and the anti-reflection pattern being arranged on a side of the metal black matrix close to a light emission side of the substrate, wherein the anti-reflection pattern is a translucent anti-reflection pattern, and the translucent anti-reflection pattern is formed by a mixture of indium tin oxide, elemental indium, and elemental tin.

2. The substrate according to claim 1 , wherein an orthographic projection of the metal black matrix on the base substrate falls into a region of an orthographic projection of the translucent anti-reflection pattern on the base substrate.

3. The substrate according to claim 2 , wherein the orthographic projection of the metal black matrix on the base substrate overlaps with the orthographic projection of the translucent anti-reflection pattern on the base substrate.

4. The substrate according to claim 2 , wherein a thickness range of the translucent anti-reflection pattern is 50 to 200 nm.

5. The substrate according to claim 1 , wherein a thickness range of the metal black matrix is 50 to 200 nm.

6. The substrate according to claim 1 , further comprising: a common electrode and a common electrode line connected to the common electrode, the common electrode line being arranged on a same layer with the metal black matrix and formed by a same material with the metal black matrix.

7. The substrate according to claim 1 , wherein the substrate is an array substrate or a color filter substrate.

8. A display device, comprising the substrate according to claim 1 .

9. A manufacturing method of a substrate, comprising:
providing a base substrate;
forming on the base substrate a metal black matrix and an anti-reflection pattern for reducing optical reflectivity of the metal black matrix, the anti-reflection pattern being arranged on a side of the metal black matrix close to a light emission side of the substrate, wherein the anti-reflection pattern is a translucent anti-reflection pattern, and the translucent anti-reflection pattern is formed by a mixture of indium tin oxide, elemental indium, and elemental tin.

10. The manufacturing method of the substrate according to claim 9 , wherein the metal black matrix and the translucent anti-reflection pattern are formed by a single patterning process.

11. The manufacturing method of the substrate according to claim 10 , wherein the substrate is an array substrate, and the forming the metal black matrix and the translucent anti-reflection pattern includes:
depositing a metal film and an indium tin oxide film;
patterning the metal film and the indium tin oxide film by a single patterning process to form the metal black matrix and the indium tin oxide pattern;
treating the indium tin oxide pattern by using a hydrogen plasma, converting indium tin oxide in the indium tin oxide pattern partially to elemental indium and elemental tin to form the translucent anti-reflection pattern formed by the mixture of indium tin oxide, elemental indium and elemental tin.

12. The manufacturing method of the substrate according to claim 11 , wherein a duration of treating the indium tin oxide pattern by using the hydrogen plasma is 0.5 to 2 minutes.

13. The manufacturing method of the substrate according to claim 10 , wherein the substrate is a color filter substrate, and the forming the metal black matrix and the translucent anti-reflection pattern include:
depositing an indium tin oxide film;
treating the indium tin oxide film by using a hydrogen plasma, converting indium tin oxide in the indium tin oxide film partially to elemental indium and elemental tin to form a translucent anti-reflection film formed by the mixture of indium tin oxide, elemental indium and elemental tin;
depositing a metal film;
patterning the translucent anti-reflection film and the metal film by a single patterning process to form the translucent anti-reflection pattern and the metal black matrix.

14. The manufacturing method of the substrate according to claim 13 , wherein a duration of treating the indium tin oxide film by using the hydrogen plasma is 0.5 to 2 minutes.

Assignees

• Boe Technology Group Co Ltd
• Beijing Boe Display Tech Co

Inventors

• Bai Jinchao
• Liu Yao
• Guo Huibin

Classifications

• G09G2310/02

  Addressing, scanning or driving the display screen or processing steps related thereto · CPC title

• G02F1/0102 Primary

  Constructional details, not otherwise provided for in this subclass · CPC title

• H01L27/32

  Electricity · mapped topic

• H01L51/5284

  Electricity · mapped topic

• G09G3/3473

  based on light coupled out of a light guide, e.g. due to scattering, by contracting the light guide with external means · CPC title