Thermal processing apparatus

US10181409B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10181409-B2
Application numberUS-201414163309-A
CountryUS
Kind codeB2
Filing dateJan 24, 2014
Priority dateJun 24, 2011
Publication dateJan 15, 2019
Grant dateJan 15, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. An energy source for the optical system is typically a plurality of lasers, which are combined to form the energy field.

First claim

Opening claim text (preview).

The invention claimed is: 1. An apparatus for thermally processing a substrate, comprising: a source of electromagnetic energy having a plurality of pulsed energy sources; a substrate support; and an optical system disposed between the source of electromagnetic energy and the substrate support, the optical system comprising a pulse combiner, a pulse shaper, a homogenizer, and an aperture member having an energy blocking member embedded therein, wherein the energy blocking member is disposed at a focal plane of the electromagnetic energy delivered from a lens that is positioned at the output of the homogenizer. 2. The apparatus of claim 1 , wherein the pulse combiner comprises a combining optic with a selecting surface and two rotatable polarizing filters. 3. The apparatus of claim 1 , wherein the aperture member further comprises a first member and a second member with the energy blocking member positioned between the first member and the second member and a covering that is disposed over a portion of the first member and a portion of the second member. 4. The apparatus of claim 2 , wherein the homogenizer comprises two microlens arrays. 5. The apparatus of claim 3 , wherein the pulse shaper comprises a plurality of mirror pairs and a plurality of splitters, wherein two mirror pairs are at a different distance from a datum of the pulse shaper. 6. The apparatus of claim 4 , wherein each of the two microlens arrays has a square shape. 7. The apparatus of claim 6 , wherein the pulse combiner comprises a diagnostic module with a detector that detects the temporal shape of a pulse and a detector that detects the energy content of the pulse. 8. The apparatus of claim 5 , further comprising an imaging system with a sampling optic optically coupled to the substrate support and to a detecting optic. 9. The apparatus of claim 1 , wherein the aperture member further comprises a first member and a second member positioned to define a region in which an opening in the energy blocking member is enclosed. 10. The apparatus of claim 1 , wherein the energy blocking member has a first surface, a second surface that is opposite to the first surface, and an opening that extends from the first surface to the second surface, and the aperture member further comprises: a first member disposed over the first surface and the opening; and a second member disposed over the second surface and the opening. 11. The apparatus of claim 10 , wherein the aperture member further comprises: a covering that is disposed over a portion of the first member and a portion of the second member. 12. An apparatus for thermally processing a substrate, comprising: a source of electromagnetic energy having a plurality of pulsed energy sources; a substrate support; and an optical system disposed between the source of electromagnetic energy and the substrate support, the optical system comprising a pulse combiner, a pulse shaper, a homogenizer, an imaging optic, and an aperture member positioned between the homogenizer and the imaging optic and having an energy blocking member embedded therein, wherein the energy blocking member is disposed at a focal plane of the electromagnetic energy delivered from a lens that is positioned at the output of the homogenizer. 13. The apparatus of claim 1 , wherein the aperture member further comprises a first member and a second member with the energy blocking member positioned between the first member and the second member such that the first member and the second member enclose an opening in the energy blocking member.

Assignees

Inventors

Classifications

  • H10P34/42Primary

    with electromagnetic radiation, e.g. laser annealing (laser cutting H10P54/20) · CPC title

  • H10P95/90Primary

    Thermal treatments, e.g. annealing or sintering · CPC title

  • by shaping pulses · CPC title

  • B23K26/03Primary

    Observing, e.g. monitoring, the workpiece · CPC title

  • being semiconducting · CPC title

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What does patent US10181409B2 cover?
An optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. An energy source for the optical system is typically a plurality of lasers, which a…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10P34/42. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 15 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).