Spherical silicon oxycarbide particle material and manufacturing method thereof

Patent metadata

Field	Value
Publication number	US-10179737-B2
Application number	US-201615185011-A
Country	US
Kind code	B2
Filing date	Jun 16, 2016
Priority date	Jun 18, 2015
Publication date	Jan 15, 2019
Grant date	Jan 15, 2019

Abstract

Spherical silicon oxycarbide particle material and manufacturing method thereof are provided as follows. Organotrialkoxysilane is hydrolyzed in a pH 3-6 acetic acid aqueous solution, thereafter an alkaline aqueous solution such as a pH 7-12 ammonia water was added to the obtained hydrolysate. The condensation reaction is performed in an alkaline range to form spherical polysilsesquioxane particles that are spherical silicon oxycarbide precursors that has no melting point or softening point. Sintering was then performed at a sintering temperature of 600-1400° C. under inert atmosphere to obtain spherical silicon oxycarbide particle material.

First claim

What is claimed is:

1. A manufacturing method of spherical silicon oxycarbide (SiOC) particle material comprising the following processes A to C:
process A: forming a hydrolysate by adding an organotrialkoxysilane compound having the molecular structure represented by the following Formula (1) drop-wise to an aqueous medium that is adjusted to be at pH 5.0-5.8, wherein the aqueous medium is an acetic acid aqueous solution;
process B: obtaining spherical silicon oxycarbide precursor particles having no melting point or softening point through a condensation reaction conducted by adding an alkaline solution to a solution containing the obtained hydrolysate under stirring, wherein the solution is adjusted to be alkaline, wherein the condensation reaction is performed while the pH is adjusted to 7.8-10.1; and
process C: performing a sintering process to the obtained spherical silicon oxycarbide precursor particles in an inert atmosphere at 600 to 1400° C.,

wherein in Formula (1), R 1 and R 2 each independently represents a group selected from a substituted or unsubstituted C 1 to C 20 alkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted arylalkyl group, and in the C 1 to C 20 alkyl group, any hydrogen may be substituted with halogen, any —CH 2 — may be substituted with —O—, —CH═CH—, cycloalkylene or cycloalkenylene, and in the alkylene of the substituted or unsubstituted arylalkyl group, any hydrogen may be substituted with halogen, and any —CH 2 — may be substituted with —O—, —CH═CH—, cycloalkylene or cycloalkenylene.

2. The manufacturing method of spherical silicon oxycarbide (SiOC) particle material according to claim 1 , wherein the spherical silicon oxycarbide precursor particles are spherical polysilsesquioxane having no melting point or softening point.

3. The manufacturing method of spherical silicon oxycarbide (SiOC) particle material according to claim 1 , wherein the alkaline solution is aqueous ammonia.

4. A spherical silicon oxycarbide (SiOC) particle material manufactured by the manufacturing method of spherical silicon oxycarbide (SiOC) particle material according to claim 1 , wherein the silicon, the carbon and the oxygen content in total accounts for more than 98% of a composition of the spherical silicon oxycarbide (SiOC) particle material by elemental analysis, wherein the silicon content is 20-50%, the carbon content is 10-50%, the oxygen content is 20-50%, and the composition basically consist of Si, O and C, wherein if elements other than Si, C and O are detected, then hydrogen is the only other element detected, the average particle size of the spherical silicon oxycarbide (SiOC) particle material is in the range of 1.75-100 μm, and wherein the sphericity is in the range of 0.95-1.0.

5. A lubricant, comprising the spherical silicon oxycarbide (SiOC) particle material according to claim 4 as a friction-reducing material.

6. An abrasive agent, comprising the spherical silicon oxycarbide (SiOC) particle material according to claim 4 as the abrasive agent or as an additive in the abrasive agent.

Assignees

• Jnc Corp

Inventors

• Kizaki Tetsuro
• Iwatani Keizo

Classifications

• C04B2235/3895

  Non-oxides with a defined oxygen content, e.g. SiOC, TiON · CPC title

• C03C3/045

  Silicon oxycarbide, oxynitride or oxycarbonitride glasses · CPC title

• C01P2004/60

  Particles characterised by their size · CPC title

• C10M103/00

  Lubricating compositions characterised by the base-material being an inorganic material (containing more than 10% water C10M173/00) · CPC title

• C08G77/06

  Preparatory processes · CPC title