Integrated circuit structure incorporating multiple gate-all-around field effect transistors having different drive currents and method

Patent metadata

Field	Value
Publication number	US-10170484-B1
Application number	US-201715787009-A
Country	US
Kind code	B1
Filing date	Oct 18, 2017
Priority date	Oct 18, 2017
Publication date	Jan 1, 2019
Grant date	Jan 1, 2019

Abstract

In a method of forming a structure with field effect transistors (FETs) having different drive currents, a stack is formed on a substrate. The substrate is a first semiconductor material and the stack includes alternating layers of a second and the first semiconductor material. Recess(es) filled with sacrificial material are formed in certain area(s) of the stack. The stack is patterned into fins and gate-all-around (GAA) FET processing is performed. GAAFET processing includes removing sacrificial gates to form gate openings for GAAFETs and removing the second semiconductor material and any sacrificial material (if present) from the gate openings such that, within each gate opening, nanoshape(s) that extend laterally between source/drain regions remain. Gate openings for GAAFETs where sacrificial material was removed will have fewer nanoshapes than other gate openings. Thus, in the structure, some GAAFETs will have fewer channel regions and, thereby lower drive currents than others.

First claim

What is claimed is:

1. A method comprising:
forming, on a substrate that comprises a first semiconductor material, a multi-layer stack comprising alternating layers of a second semiconductor material and the first semiconductor material;
forming a recess in the multi-layer stack such that a first area of the multi-layer stack has more layers of the first semiconductor material than a second area of the multi-layer stack;
filling the recess with a sacrificial material;
after the filling of the recess with the sacrificial material, patterning the multi-layer stack into multi-layer fins comprising at least a first fin in the first area and a second fin in the second area, wherein the first fin comprises the alternating layers and wherein the second fin comprises the sacrificial material above at least one layer of the first semiconductor material; and
forming transistors comprising: a first transistor comprising multiple first nanoshapes for multiple first channel regions formed using multiple layers of the first semiconductor material in the first fin; and a second transistor comprising at least one second nanoshape for at least one second channel region formed using the at least one layer of the first semiconductor material in the second fin,
wherein the first transistor is formed so as to have a first number of the first nanoshapes and the second transistor is formed so as to have a second number of the second nanoshapes that is less than the first number, and
wherein each second nanoshape is essentially co-planar with one of the first nanoshapes.

2. The method of claim 1 , wherein the first transistor has a first drive current and the second transistor has a second drive current that is lower than the first drive current.

3. The method of claim 1 , the first semiconductor material comprising silicon and the second semiconductor material comprising silicon germanium.

4. The method of claim 1 , the second semiconductor material and the sacrificial material comprising monocrystalline silicon germanium.

5. The method of claim 1 , the second semiconductor material comprising monocrystalline silicon germanium and the sacrificial material comprising polycrystalline silicon germanium.

6. The method of claim 1 , the forming of the transistors comprising:
forming sacrificial gates with sidewall spacers on a first portion of the first fin and on a first portion of the second fin;
removing second portions of the first fin and second portions of the second fin that extend laterally beyond the sacrificial gates and the sidewall spacers to expose, on both the first portion of the first fin and the first portion of the second fin, vertical surfaces of the first semiconductor material and vertical surfaces of the second semiconductor material;
laterally etching the exposed vertical surfaces of the second semiconductor material on both the first portion of the first fin and the first portion of the second fin;
depositing isolation material on the exposed vertical surfaces of the second semiconductor material on both the first portion of the first fin and the first portion of the second fin;
epitaxially growing first source/drain regions for the first transistor adjacent to the exposed vertical surfaces of the first semiconductor material on the first fin and epitaxially growing second source/drain regions for the second transistor adjacent to the exposed vertical surfaces of the first semiconductor material on the second fin;
selectively removing the sacrificial gates to form gate openings, the gate openings comprising a first gate opening that exposes the first portion of the first fin and a second gate opening that exposes the first portion of the second fin;
selectively etching away the second semiconductor material from the first portion of the first fin exposed in the first gate opening and selectively etching away the second semiconductor material and the sacrificial material from the first portion of the second fin exposed in the second gate opening; and
forming replacement metal gates in the gate openings.

7. The method of claim 1 , wherein the first transistor is a pull-down transistor of a static random access memory cell and the second transistor is a pass-gate transistor of the static random access memory cell.

8. A method comprising:
forming, on a substrate that comprises a first semiconductor material, a multi-layer stack comprising alternating layers of a second semiconductor material and the first semiconductor material;
forming recesses in the multi-layer stack, wherein at least two of the recesses extend to different depths within the multi-layer stack such that a first area of the multi-layer stack has more layers of the first semiconductor material than a second area of the multi-layer stack and further such that the second area of the multi-layer stack has more layers of the first semiconductor material than a third area of the multi-layer stack;
filling the recesses with a sacrificial material;
after the filling of the recesses with the sacrificial material, patterning the multi-layer stack into multi-layer fins comprising at least a first fin in the first area, a second fin in the second area, and a third fin in the third area,
wherein the first fin comprises the alternating layers,
wherein the second fin comprises the sacrificial material above at least two layers of the first semiconductor material and has fewer layers of the first semiconductor material than the first fin,
wherein the third fin comprises the sacrificial material above at least one layer of the first semiconductor material and has fewer layers of the first semiconductor material than the second fin, and
wherein the sacrificial material in the third fin is thicker than the sacrificial material in the second fin;

forming transistors comprising: a first transistor comprising multiple first nanoshapes for multiple first channel regions formed using multiple layers of the first semiconductor material in the first fin; a second transistor comprising at least two second nanoshapes for at least two second channel regions formed using the at least two layers of the first semiconductor material in the second fin; and a third transistor comprising at least one third nanoshape for at least one third channel region formed using the at least one layer of the first semiconductor material in the third fin,
wherein the first transistor is formed so as to have a first number of the first nanoshapes, the second transistor is formed so as to have a second number of the second nanoshapes that is less than the first number, and the third transistor is formed so as to have a third number of third nanoshapes that is less than the second number, and
wherein each second nanoshape is essentially co-planar with one of the first nanoshapes and each third nanoshape is essentially co-planar with both one of the first nanoshapes and one of the second nanoshapes.

9. The method of claim 8 , wherein the first transistor has a first drive current, the second transistor has a second drive current that is lower than the first drive current, and the third transistor has a third drive current that is lower than the second drive current.

10. The method of claim 8 , the first semiconductor material comprising silicon and the second semiconductor material comprising silicon germanium.

11. The method of claim 8 , the second semiconductor material and the sacrificial material comprising monocrystalline silicon germanium.

12. The method of claim 8 , the second semiconductor material comprising monocrystalline silicon germanium and the sacrificial material comprising polycrystalline silicon germanium.

13.

Assignees

• Globalfoundries Inc

Inventors

• Sung Min Gyu
• Xie Ruilong
• Paul Bipul C

Classifications

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• H01L29/785

  Electricity · mapped topic

• H01L27/1104 Primary

  Electricity · mapped topic

• H01L29/1033

  Electricity · mapped topic