Liquid deposition photolithography

Patent metadata

Field	Value
Publication number	US-10162264-B2
Application number	US-201514713748-A
Country	US
Kind code	B2
Filing date	May 15, 2015
Priority date	Mar 22, 2012
Publication date	Dec 25, 2018
Grant date	Dec 25, 2018

Abstract

Systems and methods for liquid deposition photolithography are described. In particular, some embodiments relate to systems and methods for using photolithography to control the 2D structure of a thin layer of material (e.g., photopolymer) using various masks, projection optics and materials. In one or more embodiments, this thin layer can be manipulated by micro-fluidic techniques such that it can be formed, patterned and post-processed in a liquid environment, vastly simplifying the creation of multi-layer structures. Multiple layers are rapidly built up to create thick structures of possibly multiple materials that are currently challenging to fabricate by existing methods.

First claim

What is claimed:

1. A system for liquid deposition photolithography comprising:
an exposure chamber;
an optical window into the exposure chamber;
a base platform configured to articulate a part with respect to the optical window;
a pattern generator configured to project an optical pattern onto the part through the optical window to optically expose and thereby modify properties of a layer of photo-sensitive liquid between the base platform and the optical window;
a material delivery system configured to deliver materials into the exposure chamber, including:
a first system positioned for delivering the photo-sensitive liquid; and
a second system positioned for delivering an inhibitor that maintains the photo-sensitive liquid in liquid form adjacent to the optical window; and

one or more processors configured to cause the base platform to continuously move during optical exposure closer to or farther away from the optical window.

2. The system of claim 1 , wherein the exposure chamber is closed and the material delivery system uses micro-fluidic injection to control the flow of the materials into and out of the exposure chamber.

3. The system of claim 1 , wherein the material delivery system uses fluidic injection to control the flow of the materials into and out of the exposure chamber.

4. The system of claim 1 , wherein the optical window provides a mold for the part.

5. The system of claim 4 , wherein the mold is flat, spherical, or includes a complex micro- to nano-scale profile.

6. The system of claim 4 , wherein the mold includes a diffraction grating.

7. The system of claim 1 , wherein the inhibitor is released through the optical window to maintain the photo-sensitive liquid in liquid form adjacent to the optical window.

8. The system of claim 7 , wherein the photo-sensitive liquid in liquid form adjacent to the optical window is maintained around a set thickness by adjusting the release of the inhibitor.

9. The system of claim 7 , wherein the inhibitor is carried through a solid permeable layer via channels.

10. The system of claim 1 , wherein the exposure chamber includes thermal control.

11. The system of claim 1 , further comprising an optical monitoring system to measure properties of the part.

12. The system of claim 1 , wherein the base platform can rotate and move in accordance with a planned trajectory between optical exposures by the pattern generator.

13. The system of claim 1 , wherein the optical window includes internal channels.

14. The system of claim 13 , wherein the internal channels can be used to deliver resin, inhibitor, solvent, or a mixture of resin, inhibitor and solvent.

15. The system of claim 1 , wherein the one or more processors are configured to cause the base platform to move along a desired trajectory.

16. The system of claim 15 , wherein the desired trajectory of the base platform includes a rotation.

17. The system of claim 15 , wherein the desired trajectory adjusts a height of the base platform to control flow properties across the part.

18. The system of claim 15 , wherein the sides of the exposure chamber move with the base platform.

19. The system of claim 1 , wherein the base platform becomes an integral component of the part.

20. The system of claim 1 , wherein the material delivery system can deliver the materials through one or more of the optical window, a wall of the exposure chamber, or a flow from a surrounding bath of materials.

21. The system of claim 1 , wherein the non-photosensitive layer adjacent to the optical window is delivered via laminar flow.

22. A liquid deposition system comprising:
an exposure chamber;
an optical window into the exposure chamber;
a pattern generator configured to project an optical pattern through the optical window to thereby modify properties of a layer of photo-sensitive liquid; and
a material delivery system to deliver materials into the exposure chamber, including:
a first system positioned for delivering the photo-sensitive liquid into the exposure chamber; and
a second system positioned for delivering an inhibitor through a solid permeable layer via channels formed in the optical window.

23. The system of claim 22 , wherein the material delivery system can deliver the materials through one or more of the optical window, a wall of the exposure chamber, or flow from a surrounding bath of materials.

24. The system of claim 22 , wherein the material delivery system transports a non-photosensitive layer adjacent to the optical window.

25. The system of claim 22 , wherein the materials delivered by the material delivery system include a solvent, a resin, an inhibitor, a non-photo-sensitive material, or a mixture thereof.

26. The system of claim 22 , further comprising a mold release layer that includes a non-miscible liquid or gel.

27. The system of claim 22 , further comprising one or more processors configured to cause the base platform to continuously move during optical exposures.

28. A system for liquid deposition photolithography comprising:
an exposure chamber;
an optical window adjacent the exposure chamber;
a base platform movable with respect to the optical window;
a pattern generator positioned to project an optical pattern through the optical window to optically expose and thereby modify properties of a layer of photo-sensitive liquid between the base platform and the optical window;
a material delivery system positioned to deliver materials into the exposure chamber, including:
a first system positioned for delivering the photo-sensitive liquid into the exposure chamber; and
a second system positioned for delivering an inhibitor that maintains the photo-sensitive liquid in liquid form adjacent to the optical window; and

one or more processors configured to cause the base platform to continuously move closer to or farther away from the optical window during consecutive optical exposure and material delivery cycles.

Assignees

• Univ Colorado Regents

Inventors

• Mcleod Robert R
• Urness Adam
• Cole Michael
• Moore Eric

Classifications

• G03F7/0035 Primary

  Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface · CPC title

• G03F7/70341

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title

• G03F7/2041 Primary

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title

• G03F7/2022

  Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure · CPC title

• G03F7/70

  Microphotolithographic exposure; Apparatus therefor (photo-masks G03F1/00) · CPC title