Process for electrochemically making at least one porous area of a micro and/or nanoelectronic structure
US-2015329986-A1 · Nov 19, 2015 · US
US10159974B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10159974-B2 |
| Application number | US-201314384764-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 11, 2013 |
| Priority date | Mar 13, 2012 |
| Publication date | Dec 25, 2018 |
| Grant date | Dec 25, 2018 |
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The invention relates to a surface treatment method for treating the inner walls of a microchannel made from a polymeric material that is at least partially photocured or thermoset. Said treatment is carried out via irradiation in the air at a wavelength of less than or equal to 300 nm. The invention also relates to a method for manufacturing a microfluidic device including such a surface treatment step.
Opening claim text (preview).
The invention claimed is: 1. A process for treating a surface of the internal walls of a microchannel, in a microfluidic device, intended to modify at least locally a surface energy of said walls, the microchannel being bounded by a profiled element made of an at least partially photo-set polymer or partially thermo-set polymer and by a cover, said process comprising, a step of irradiating under air said at least partially photo-set polymer or partially thermo-set polymer through the cover, the cover and the profiled element having been assembled beforehand, the cover being made of a material that is transparent to irradiations; the step of irradiating under air being carried out at a wavelength shorter than or equal to 300 nm, and to a determined depth of irradiation, wherein the depth of irradiation is determined so that bulk properties of the at least partially photo-set polymer or partially thermo-set polymer are preserved. 2. The process of claim 1 , wherein, the step of irradiating under air is carried out at a wavelength ranging from 150 to 260 nm. 3. The process of claim 1 , wherein the step of irradiating under air lasts less than 20 minutes. 4. The process of claim 1 , wherein said at least partially photo-set polymer or partially thermo-set polymer is irradiated only locally. 5. The process of claim 1 further comprising prior to the irradiating under air the following steps: a step of preparing the profiled element made of the at least partially photo-set polymer or partially thermo-set polymer; and a step of closing the profiled element with the cover so as to bound at least one microchannel. 6. The process of claim 1 , wherein the depth of irradiation is 100 nm or less, or is smaller than 1% of the total thickness of the microfluidic device. 7. The process of claim 1 , wherein the polymer is an at least partially photo-set polymer. 8. The process of claim 7 , wherein the polymer is obtained from a photo-setting resin by irradiation at a wavelength longer than 300 nm.
Specific details about manufacturing devices · CPC title
Method of mechanical manufacture · CPC title
Microfluidics · CPC title
Processes for functionalising a surface, e.g. provide the surface with specific mechanical, chemical or biological properties · CPC title
characterised by the manufacture of the container or its components · CPC title
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