Selective deposition process utilizing polymer structure deactivation process

Patent metadata

Field	Value
Publication number	US-10157740-B1
Application number	US-201715624648-A
Country	US
Kind code	B1
Filing date	Jun 15, 2017
Priority date	Jun 15, 2017
Publication date	Dec 18, 2018
Grant date	Dec 18, 2018

Abstract

Methods for depositing desired materials formed on different locations of a substrate with different materials using a selective deposition process for semiconductor applications are provided. In one embodiment, a method of forming a structure with desired materials on a substrate includes disposing organic materials on a surface of a substrate, performing a thermal treatment process to form polymer brush materials from the organic materials selective on a first region of the substrate, and selectively forming a material layer on a second region of the substrate uncovered by the polymer brush materials.

First claim

The invention claimed is:

1. A method of forming a structure with desired materials on a substrate comprising:
disposing organic materials on a surface of a substrate;
performing a thermal treatment process having a process temperature between about 400 degrees Celsius and about 600 degrees Celsius to form polymer brush materials from the organic materials selective on a first region of the substrate; and
selectively forming a material layer on a second region of the substrate uncovered by the polymer brush materials.

2. The method of claim 1 , wherein the organic materials are organic monomers or organic polymers.

3. The method of claim 1 , wherein the polymer brush materials comprise OH (hydroxy) terminated hydrocarbon containing material or silyl functionalized hydrocarbon containing materials with or without benzene rings.

4. The method of claim 1 , wherein the polymer brush is selected from a group consisting of polystyrene, polyacrylic acid (PAAC), Polydimethylsiloxane (PDMS), polymethyl methacrylate (PMMA) and poly(N-isopropylacrylamide).

5. The method of claim 1 , wherein the thermal treatment process provides thermal energy selectively to the organic material disposed on the first region of the substrate.

6. The method of claim 5 , wherein the organic material is activated to form the polymer brush materials selectively on the first region of the substrate, leaving the organic material on the second region of the substrate unchanged.

7. The method of claim 1 , wherein the organic material has a hydrophobic surface property when disposed on a silicon containing surface.

8. The method of claim 7 , wherein the organic material has a wetting angle greater than 60 degrees when disposed on a silicon containing surface.

9. The method of claim 1 , wherein the material layer is a metal containing material when the second region of the substrate is a metal containing material.

10. The method of claim 1 , wherein the material layer is a dielectric material when the second region of the substrate is a dielectric material.

11. The method of claim 1 , wherein the vapor polymerization process congregates monomers from the organic material into polymer compounds.

12. The method of claim 1 , wherein selectively forming the material layer by an atomic layer deposition process.

13. The method of claim 1 , wherein polymer brush materials have hydrocarbon chain greater than 10.

14. A method of forming a structure with desired materials on a substrate for semiconductor applications comprising:
spin-coating a polymer material globally on a substrate;
thermal treating the polymer material selectively disposed on a first region of the substrate at a process temperature between about 400 degrees Celsius and about 600 degrees Celsius to form a treated polymer material on the first region of the substrate;
removing the polymer material disposed on a second region of the substrate untreated by the thermal treating process; and
selectively forming a material layer on the second region of the substrate uncovered by the treated polymer material.

15. The method of claim 14 , wherein the polymer material comprises OH (hydroxy) terminated hydrocarbon containing material or silyl functionalized hydrocarbon containing materials with or without benzene rings.

Assignees

• Applied Materials Inc

Inventors

• Ouyang Christine Y
• Godet Ludovic

Classifications

• H10P14/61

  using masks · CPC title

• H10P95/00

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

• H10P76/20

  of masks comprising organic materials · CPC title

• H10P14/6342

  Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating · CPC title

• H10P14/6334

  using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition (deposition by physical ablation of a target H10P14/6329) · CPC title