Inspection device

Patent metadata

Field	Value
Publication number	US-10157722-B2
Application number	US-201615195665-A
Country	US
Kind code	B2
Filing date	Jun 28, 2016
Priority date	Mar 15, 2011
Publication date	Dec 18, 2018
Grant date	Dec 18, 2018

Abstract

An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

First claim

What is claimed is:

1. A photoelectron generation device comprising:
a photoelectron surface generating photoelectrons by being irradiated with a light from a light source;
a lens extracting the photoelectrons generated from the photoelectron surface, and the lens accelerating the extracted photoelectrons;
a numerical aperture being passed through by the accelerated photoelectrons;
a first tube set to a potential different from a second potential of the photoelectron surface, and the photoelectrons passing through the first tube; wherein the potential of the first tube is a high voltage; and
a second tube covering the first tube and set to the potential as ground;
wherein the accelerated photoelectrons passing through the numerical aperture are irradiated to an inspection object as a primary beam; and
wherein the numerical aperture has a hole formed therein which is passed through by the accelerated photoelectrons, and the first tube is arranged inside of the hole.

2. The photoelectron generation device according to claim 1 wherein
the lens extracts the photoelectrons generated from the photoelectron surface in the opposite direction from the light source.

3. The photoelectron generation device according to claim 2 further comprising:
a field aperture arranged between the light source and the photoelectron surface, and the field aperture being passed through by the light.

4. The photoelectron generation device according to claim 1 wherein
the light is irradiated to the photoelectron surface from the lens side.

5. The photoelectron generation device according to claim 4 further comprising:
a masking material including a hole part, and coated onto the lens side of the photoelectron surface.

6. The photoelectron generation device according to claim 5 further comprising:
a reflection surface structure reflecting the light passing through the hole part and the photoelectron surface, and arranged so that the reflected light passes through the hole part and the photoelectron surface.

7. The photoelectron generation device according to claim 4 further comprising:
a mirror arranged between the light source and the photoelectron surface, reflecting the light, and including a hole, the photoelectrons passing through the hole.

8. The photoelectron generation device according to claim 1 further comprising:
an aligner arranged between the lens and the numerical aperture.

9. The photoelectron generation device according to claim 1 wherein
the second tube is set to the potential as a potential of the inspection object.

10. The photoelectron generation device according to claim 1 wherein
the light source is arranged on an atmosphere side, and
the photoelectron surface, the lens and the numerical aperture are arranged on a vacuum side.

11. The photoelectron generation device according to claim 1 wherein
the light is a laser.

12. A primary optical system comprising:
the photoelectron generation device according to claim 1 ; and
a lens controlling a size of the primary beam.

13. An inspection device comprising:
a primary optical system including the photoelectron generation device according to claim 1 ;
a secondary optical system including a detector detecting a secondary beam generated from the inspection object irradiated with the primary beam; and
an image processing system forming an image based on the secondary beam detected by the detector.

14. A photoelectron generation device comprising:
a photoelectron surface generating photoelectrons by being irradiated with a light from a light source;
a lens extracting the photoelectrons generated from the photoelectron surface, and the lens accelerating the extracted photoelectrons;
a numerical aperture being passed through by the accelerated photoelectrons;
a first tube set to a potential different from a second potential of the photoelectron surface, and the photoelectrons passing through the first tube; wherein the potential of the first tube is a high voltage; and
a second tube covering the first tube and set to the potential as ground;
wherein the accelerated photoelectrons passing through the numerical aperture are irradiated to an inspection object as a primary beam;
wherein the lens has a hole formed therein which is passed through by the accelerated photoelectrons, and the first tube is arranged inside of the hole.

15. A photoelectron generation device comprising:
a photoelectron surface generating photoelectrons by being irradiated with a light from a light source;
a lens extracting the photoelectrons generated from the photoelectron surface, and the lens accelerating the extracted photoelectrons;
a numerical aperture being passed through by the accelerated photoelectrons;
a first tube set to a potential different from a second potential of the photoelectron surface, and the photoelectrons passing through the first tube; wherein the potential of the first tube is a high voltage;
a second tube covering the first tube and set to the potential as ground;
wherein the accelerated photoelectrons passing through the numerical aperture are irradiated to an inspection object as a primary beam; and
a cathode lens arranged between the numerical aperture and the inspection object, wherein the cathode lens is arranged inside of the first tube.

Assignees

• Ebara Corp

Inventors

• Hatakeyama Masahiro
• Yoshikawa Shoji
• Murakami Takeshi
• Watanabe Kenji
• Naito Yoshihiko
• Toma Yasushi
• Karimata Tsutomu
• Hayashi Takehide
• Tsukamoto Kiwamu
• Kohama Tatsuya
• Kobayashi Noboru

Classifications

• H01J2237/0048

  Charging arrangements · CPC title

• H01J2237/0492

  Lens systems · CPC title

• H01J2237/2007

  Holding mechanisms · CPC title

• H01J2237/061

  Construction · CPC title

• H01J37/29

  Reflection microscopes · CPC title