Polyimide-based resin film cleaning liquid, method for cleaning polyimide-based resin film, method for producing polyimide coating, method for producing filter, filter medium, or filter device, and method for producing chemical solution for lithography

Patent metadata

Field	Value
Publication number	US-10155185-B2
Application number	US-201715585362-A
Country	US
Kind code	B2
Filing date	May 3, 2017
Priority date	May 9, 2016
Publication date	Dec 18, 2018
Grant date	Dec 18, 2018

Abstract

A polyimide-based resin film cleaning liquid includes at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, an alkylene glycol monoalkyl ether acetate, and an aprotic polar solvent other than these solvents.

First claim

What is claimed is:

1. A method for producing a polyimide coating, the method comprising in the following order:
forming a coated film by using a varnish comprising fine particles, a solvent, and a resin comprising polyamic acid and/or polyimide
prebaking the coated film to obtain an unbaked composite film;
firstly-baking the unbaked composite film to obtain a polyimide-fine particle composite film;
removing fine particles from the polyimide-fine particle composite film to form a porous polyimide-based resin film 1;
removing at least a part of the porous polyimide-based resin film 1 to obtain a porous polyimide-based resin film 2;
cleaning the porous polyimide-based resin film 2 with water; and
secondary-baking the porous polyimide-based resin film 2 after the water cleaning;
wherein the method for producing a polyimide coating further comprises washing the polyimide-based resin film by bringing a polyimide-based resin film cleaning liquid into contact with the polyimide-based resin film comprising the resin comprising polyamic acid and/or polyimide;
wherein the cleaning is carried out after at least one selected from the group consisting of the forming coated film, the prebaking, the firstly-baking, the removing fine particle, the water-cleaning, and the secondary-baking; and
wherein the polyimide-based resin film cleaning liquid comprises at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, and an alkylene glycol monoalkyl ether acetate, as well as an aprotic polar solvent other than these solvents.

2. A method for producing a filter comprising a polyimide coating,
wherein the polyimide coating is produced by the method according to claim 1 .

3. A method for producing a filter medium provided with a filter comprising a polyimide coating,
wherein the polyimide coating is produced by the method according to claim 1 .

4. A method for producing a filter device provided with a filter comprising a polyimide coating,
wherein the polyimide coating is produced by the method according to claim 1 .

5. A method for producing a chemical solution for lithography, the method comprising:
passing a polyimide-based resin film cleaning liquid comprising at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, an alkylene glycol monoalkyl ether acetate, and an aprotic polar solvent other than these solvents, through a filter device provided with a filter comprising a polyimide coating, and then allowing a chemical solution for lithography for treatment to pass through the filter device,
wherein the polymide coating is produced by the method according to claim 1 .

6. The method according to claim 1 , wherein the polyimide-based resin film is comprised in a filter device.

7. The method according to claim 1 , wherein the polyimide-based resin film cleaning liquid comprises:
(A) an aprotic polar solvent other than the following solvent (B), and
(B) at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, and an alkylene glycol monoalkyl ether acetate.

8. The method according to claim 7 , wherein the solvent (B) is a compound having 5 to 7 carbon atoms.

9. The method according to claim 8 , wherein the solvent (B) is at least one solvent selected from the group consisting of ethyl lactate, butyl acetate, 2-heptanone, cyclohexanone, propylene glycol monomethyl ether and propylene glycol monomethyl ether acetate.

10. The method according to claim 1 , wherein the aprotic polar solvent is at least one selected from the group consisting of a solvent having an amide structure represented by the following general formula (s) and an alkylsulfinyl alkane:

wherein R 1 and R 2 , which may be the same or different, each represents a hydrogen atom or an alkyl group; R 3 represents a hydrogen atom, an alkyl group, or a group represented by —NR 4 R 5 where R 4 and R 5 , which may be the same or different, represent a hydrogen atom or an alkyl group; and R 2 and R 3 may be combined with each other to form a ring.

11. The method according to claim 10 , wherein the aprotic polar solvent is at least one selected from the group consisting of dimethylformamide, dimethylacetamide, N-methylpyrrolidone, 1,1,3,3-tetramethylurea, and dimethylsulfoxide.

12. The method according to claim 1 , wherein the polyimide-based resin film is an unbaked composite film and/or a porous film.

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Hirano Isao

Classifications

• C11D7/3281

  Heterocyclic compounds · CPC title

• C11D7/50

  Solvents · CPC title

• C11D7/34

  containing sulfur · CPC title

• C11D7/264

  Aldehydes; Ketones; Acetals or ketals · CPC title

• G03F7/30

  Imagewise removal using liquid means · CPC title