Physical vapor deposition using rotational speed selected with respect to deposition rate

US10145006B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10145006-B2
Application numberUS-201515112213-A
CountryUS
Kind codeB2
Filing dateJan 8, 2015
Priority dateJan 20, 2014
Publication dateDec 4, 2018
Grant dateDec 4, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon, and during the deposition, rotating the at least one substrate at rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for use in a physical vapor deposition coating process, the method comprising: depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon; and during the deposition, rotating the at least one substrate at a rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate, wherein the rotational speed is 12-120 revolutions per minute. 2. The method as recited in claim 1 , including rotating the at least one substrate at the rotational speed selected with respect to deposition rate and also with respect to a resulting durability of the ceramic coating material. 3. The method as recited in claim 1 , wherein the deposited ceramic coating has segmented columns extending outwardly from the at least one substrate, and including selecting the rotational speed with respect to deposition rate such that segments of the segmented columns have a thickness of 0.1-0.75 micrometers. 4. The method as recited in claim 1 , wherein the deposited ceramic coating has segmented columns extending outwardly from the at least one substrate, and including selecting the rotational speed with respect to deposition rate such that segments of the segmented columns have a thickness of 0.3-0.5 micrometers. 5. The method as recited in claim 1 , wherein the rotational speed is 30-60 revolutions per minute. 6. The method as recited in claim 1 , wherein the ceramic coating material is a zirconia-based material. 7. The method as recited in claim 1 , wherein the at least one substrate includes an alumina scale, and the depositing includes depositing the ceramic coating material onto a surface of the alumina scale. 8. The method as recited in claim 1 , wherein the deposited ceramic coating has a columnar microstructure with columns extending outwardly from the at least one substrate. 9. The method as recited in claim 1 , including depositing the ceramic coating material in a chamber at an internal pressure in the chamber of 5×10 −4 -3×10 −1 torr (0.067-40 pascals).

Assignees

Inventors

Classifications

  • C23C14/542Primary

    Controlling the film thickness or evaporation rate · CPC title

  • Zirconium oxides · CPC title

  • in gas turbines · CPC title

  • using blades (F01D5/148 takes precedence) · CPC title

  • by electron bombardment · CPC title

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Frequently asked questions

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What does patent US10145006B2 cover?
A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material from a plume onto at least one substrate to form a ceramic coating thereon, and during the deposition, rotating the at least one substrate at rotational speed selected with respect to deposition rate of the ceramic coating material onto the at least one substrate.
Who is the assignee on this patent?
United Technologies Corp
What technology area does this patent fall under?
Primary CPC classification C23C14/542. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 04 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).