Polybenzoxazine precursor and method for preparing same

US10144716B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10144716-B2
Application numberUS-201515532576-A
CountryUS
Kind codeB2
Filing dateDec 7, 2015
Priority dateDec 5, 2014
Publication dateDec 4, 2018
Grant dateDec 4, 2018

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

This invention relates to a polybenzoxazine precursor and a method of preparing the same, and more particularly, to a polybenzoxazine precursor which includes benzoxazine obtained by reacting a phenol novolak resin with an aldehyde compound and allylamine and diaminodiphenylmethane as an amine compound, and to a method of preparing the same. The polybenzoxazine precursor may serve to prepare a hardened material having excellent thermal and electrical characteristics and dimensional stability. Accordingly, the polybenzoxazine precursor may be available for use in a copper clad laminate, a semiconductor encapsulant, a printed circuit board, an adhesive, a paint, and a mold.

First claim

Opening claim text (preview).

The invention claimed is: 1. A polybenzoxazine precursor comprising: a benzoxazine compound represented by the following Chemical Formula 1 so that a content of the benzoxazine compound of the following Chemical Formula 1 where n1 is 0, n2 is 0, and m is 1 is 5 to 50%: wherein n1 and n2 are identical or different and are each an integer of 0 to 2, and m is an integer of 1 to 6. 2. The polybenzoxazine precursor of claim 1 , wherein the precursor has a weight-average molecular weight of 1500 to 8000 g/mol and a glass transition temperature of 210° C. or higher. 3. A method of preparing a polybenzoxazine precursor of claim 1 , the method comprising: reacting a phenol novolak resin with an aldehyde compound and allylamine and diaminodiphenylmethane as an amine compound, wherein the phenol novolak resin is represented by the following Chemical Formula 2 and a component of Chemical Formula 2 where n is 0 is included in a content of 65% or more; wherein n is an integer of 0 to 2. 4. The method of claim 3 , wherein the method further comprises reacting a phenol-based compound and the aldehyde compound in a presence of an acid catalyst to obtain the phenol novolak resin. 5. The method of claim 4 , wherein the phenol novolak resin includes the aldehyde compound in a content of 0.05 to 0.3 mol based on 1 mol of the phenol-based compound, and the aldehyde compound is used in a content of 2 to 6 mol, the allylamine is used in a content of 0.5 to 1.5 mol, and the diaminodiphenylmethane is used in a content of 0.1 to 0.9 mol based on 1 mol of the phenol novolak resin. 6. A hardened material prepared from the polybenzoxazine precursor of claim 1 . 7. A polybenzoxazine, obtained by opening an oxazine ring of a polybenzoxazine precursor according to claim 1 , to perform polymerization. 8. A method of preparing a polybenzoxazine, the method comprising: hardening a polybenzoxazine precursor according to claim 1 at a temperature of 150 to 250° C. 9. The method of claim 4 , wherein the phenol novolak resin is represented by the following Chemical Formula 2 and a component of Chemical Formula 2 where n is 0 is included in a content of 65% or more: wherein n is an integer of 0 to 2.

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Classifications

  • containing heteroatoms · CPC title

  • against heat · CPC title

  • Electrical insulator · CPC title

  • derived from five- or six-membered heterocyclic compounds, other than imides · CPC title

  • with aromatically bound amino groups · CPC title

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What does patent US10144716B2 cover?
This invention relates to a polybenzoxazine precursor and a method of preparing the same, and more particularly, to a polybenzoxazine precursor which includes benzoxazine obtained by reacting a phenol novolak resin with an aldehyde compound and allylamine and diaminodiphenylmethane as an amine compound, and to a method of preparing the same. The polybenzoxazine precursor may serve to prepare a …
Who is the assignee on this patent?
Kolon Inc
What technology area does this patent fall under?
Primary CPC classification C07D265/14. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 04 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).