Vacuum pump with abatement function

Patent metadata

Field	Value
Publication number	US-10143964-B2
Application number	US-201414284305-A
Country	US
Kind code	B2
Filing date	May 21, 2014
Priority date	May 24, 2013
Publication date	Dec 4, 2018
Grant date	Dec 4, 2018

Abstract

A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which at least one abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The abatement part is selected from a plurality of abatement parts having different treatment types of exhaust gas and/or different treatment amounts of exhaust gas and/or different treatment performances of exhaust gas.

First claim

What is claimed is:

1. A vacuum pump system with abatement function comprising:
a vacuum pump having a discharge port to which at least one abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is directly attached, the at least one abatement part comprising a container attached to the discharge port of the vacuum pump and configured to treat the exhaust gas therein;
wherein the at least one abatement part is selected from a plurality of abatement parts having different treatment types of exhaust gas and/or different treatment amounts of exhaust gas and/or different treatment performances of exhaust gas for lowering the concentration of the exhaust gas, the selected abatement part being integrated with the vacuum pump;
a controller configured to collectively control the vacuum pump and the at least one abatement part is provided in the vacuum pump;
the vacuum pump comprises a dry vacuum pump configured to heat the exhaust gas by compression heat, the heated exhaust gas discharged from the discharge port of the vacuum pump being introduced into the at least one abatement part wherein heat of the heated exhaust gas is utilized to treat the exhaust gas;
wherein the container of the at least one abatement part comprises a cylindrical member which forms a combustion chamber therein for combusting the exhaust gas, an outer cylinder provided so as to surround the cylindrical member, and a heating chamber formed between the cylindrical member and the outer cylinder and configured to hold and heat an inert gas, whereby heat generated by combustion of the exhaust gas in the combustion chamber is utilized to heat the inert gas held in the heating chamber, and the heated inert gas is supplied to the dry vacuum pump.

2. The vacuum pump system with abatement function according to claim 1 , wherein the at least one abatement part attached to the discharge port of the vacuum pump comprises a plurality of abatement parts which are arranged in series and/or in parallel.

3. The vacuum pump system with abatement function according to claim 2 , wherein the plurality of abatement parts are arranged in parallel.

4. The vacuum pump system with abatement function according to claim 3 , wherein the plurality of abatement parts arranged in parallel comprise abatement parts having the same treatment type and/or abatement parts having different treatment types.

5. The vacuum pump system with abatement function according to claim 1 , wherein the at least one abatement part is removably attached to the discharge port of the vacuum pump or an outlet pipe of another abatement part so as to be replaceable.

6. The vacuum pump system with abatement function according to claim 1 , wherein the vacuum pump comprises a single vacuum pump or a plurality of vacuum pumps connected in series and/or in parallel.

7. The vacuum pump system with abatement function according to claim 3 , wherein at least one of the plurality of abatement parts provides a back-up function to another one of the plurality of abatement parts.

Assignees

• Ebara Corp

Inventors

• Kawamura Kohtaro
• Shinohara Toyoji
• Sugiura Tetsuro
• Arai Hideo
• Kyotani Takashi
• Nakazawa Toshiharu
• Ishikawa Keiichi
• Kashiwagi Seiji
• Suzuki Yasuhiko

Classifications

• B01D2258/0216

  from CVD treatment or semi-conductor manufacturing · CPC title

• B01D2257/553

  Compounds comprising hydrogen, e.g. silanes · CPC title

• B01D2252/103

  Water · CPC title

• B01D2257/2042

  Hydrobromic acid · CPC title

• B01D2255/10

  Noble metals or compounds thereof · CPC title