Method for producing wired circuit board

Patent metadata

Field	Value
Publication number	US-10143088-B2
Application number	US-201615386744-A
Country	US
Kind code	B2
Filing date	Dec 21, 2016
Priority date	Dec 25, 2015
Publication date	Nov 27, 2018
Grant date	Nov 27, 2018

Abstract

The method for producing a wired circuit board including an insulating layer and a conductive pattern provided on the insulating layer includes the steps of the following: a step (1), in which the insulating layer is provided; a step (2), in which a metal thin film is provided on an inclined face of the insulating layer; a step (3), in which a photoresist is provided on the metal thin film; a step (4), in which a photomask is disposed so that in the photoresist, a portion where the conductive pattern is to be provided is shielded from light, and the photoresist is exposed to light through the photomask; a step (5), in which the portion of the photoresist shielded from light by the photomask is removed to expose the metal thin film corresponding to the portion; and a step (6), in which the conductive pattern is provided on the metal thin film exposed from the photoresist. When exposing the photoresist, reflection is caused by the metal thin film positioned on the inclined face to reduce light projected to the portion.

First claim

What is claimed is:

1. A method for producing a wired circuit board including an insulating layer and a conductive pattern provided on one side face in a thickness direction of the insulating layer, the method including the steps of:
a step (1), in which the insulating layer is provided, the insulating layer having the one side face including a flat face and an inclined face, the inclined face being inclined from the flat face toward the one side in the thickness direction,
a step (2), in which a metal thin film is provided on the flat face and the inclined face of the insulating layer,
a step (3), in which a photoresist is provided on the metal thin film,
a step (4), in which a photomask is disposed so that in the photoresist, a to-be-portion where the conductive pattern is to be provided and which is provided on the flat face is shielded from light and a portion other than the to-be-portion in the photoresist is not shielded, wherein the portion other than the to-be-portion in the photoresist includes, when projected in the thickness direction, the inclined face, and the photoresist is exposed to light through the photomask,
a step (5), in which the to-be-portion of the photoresist shielded from light by the photomask is removed to expose the metal thin film corresponding to the to-be-portion, and
a step (6), in which the conductive pattern is provided on the metal thin film exposed from the photoresist,
wherein when exposing the photoresist in the step (4), reflection is caused by the metal thin film positioned above the inclined face to reduce light toward the to-be-portion on the flat face.

2. The method for producing a wired circuit board according to claim 1 , wherein
a supplementary angle y to an angle formed by the inclined face and the flat face is more than 0 degree and 20 degrees or less.

3. The method for producing a wired circuit board according to claim 1 , further including, after the step (1) and before the step (2), a step (7), in which at least the inclined face is roughened.

4. The method for producing a wired circuit board according to claim 1 , further including, after the step (2) and before the step (3), a step (8), in which the reflectance of the metal thin film for light having a wavelength of 365 nm is set to 25% or less.

5. The method for producing a wired circuit board according to claim 1 , wherein
in the step (3), the supplementary angle y (degrees) to the angle formed by the inclined face and the flat face and a thickness x (μm) of the photoresist satisfy the following formula:
y≤− 3 x+ 70.

6. The method for producing a wired circuit board according to claim 1 , wherein in the step (4), a distance between the to-be-portion and the inclined face is in a range of 1 μm to 300 μm.

Assignees

• Nitto Denko Corp

Inventors

• Sugimoto Yuu
• Tanabe Hiroyuki

Classifications

• G03F7/26

  Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence) · CPC title

• H05K2203/0562

  Details of resist · CPC title

• G03F7/2002 Primary

  with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image · CPC title

• G03F7/40

  Treatment after imagewise removal, e.g. baking · CPC title

• H05K3/064 Primary

  Photoresists · CPC title