Vibration element manufacturing method, vibration element, electronic device, electronic apparatus, and moving object

US10128430B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10128430-B2
Application numberUS-201614992265-A
CountryUS
Kind codeB2
Filing dateJan 11, 2016
Priority dateJan 13, 2015
Publication dateNov 13, 2018
Grant dateNov 13, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of manufacturing a gyro element as a vibration element is a manufacturing method of processing a quartz crystal substrate to form an outward shape of a gyro element including a vibrating arm and form recessed portions in a vibrating arm. The method includes forming the outward shape of a gyro element from one surface of the quartz crystal substrate using dry etching and forming the recessed portions using wet etching.

First claim

Opening claim text (preview).

What is claimed is: 1. A vibration element manufacturing method for manufacturing a vibration element including: a base; a vibrating arm extending from one side of the base in a first direction; and a recess provided in the vibrating arm, the method comprising: providing a substrate; providing a first patterned mask on the substrate; dry etching the substrate by using the first pattered mask as a first etching mask so as to form the base and the vibrating arm; providing a second patterned mask on an outer surface of the vibrating arm; and wet etching part of the vibrating arm by using the second patterned mask as a second etching mask so as to form the recess in the vibrating arm, wherein the recess has an opening, a bottom, and inner side walls in a cross sectional view in the first direction, and the inner side walls are inclined so that the opening is wider than the bottom in the cross sectional view in the first direction. 2. The vibration element manufacturing method according to claim 1 , wherein the first patterned mask is configured with a first metal underlying layer and a metal plating layer stacked on the first metal underlying layer, and the second patterned mask is configured with a second metal underlying layer and a resist layer stacked on the second underlying layer. 3. The vibration element manufacturing method according to claim 1 , wherein the vibrating arm has top and bottom surfaces opposite to each other, and the recess further comprises a first recess formed in the top surface and a second recess formed in the bottom surface. 4. The vibration element manufacturing method according to claim 2 , wherein the vibrating arm has top and bottom surfaces opposite to each other, and the recess further comprises a first recess formed in the top surface and a second recess formed in the bottom surface. 5. A vibration element which is manufactured by the manufacturing method according to claim 1 , the vibration element comprising: the base; the vibrating arm extending from one side of the base in the first direction; and the recess provided in the vibrating arm. 6. A vibration element which is manufactured by the manufacturing method according to claim 2 , the vibration element comprising: the base; the vibrating arm extending from one side of the base in the first direction; and the recess provided in the vibrating arm. 7. A vibration element which is manufactured by the manufacturing method according to claim 3 , the vibration element comprising: the base; the vibrating arm extending from one side of the base in the first direction; and the recess provided in the vibrating arm. 8. A vibration element which is manufactured by the manufacturing method according to claim 4 , the vibration element comprising: the base; the vibrating arm extending from one side of the base in the first direction; and the recess provided in the vibrating arm.

Assignees

Inventors

Classifications

  • H10W76/15Primary

    Containers comprising an insulating or insulated base · CPC title

  • Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces · CPC title

  • the resonators or networks being of the microelectro-mechanical [MEMS] type · CPC title

  • Manufacturing; Trimming; Mounting; Housings · CPC title

  • the resonators or networks being of the tuning fork type · CPC title

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What does patent US10128430B2 cover?
A method of manufacturing a gyro element as a vibration element is a manufacturing method of processing a quartz crystal substrate to form an outward shape of a gyro element including a vibrating arm and form recessed portions in a vibrating arm. The method includes forming the outward shape of a gyro element from one surface of the quartz crystal substrate using dry etching and forming the rec…
Who is the assignee on this patent?
Seiko Epson Corp
What technology area does this patent fall under?
Primary CPC classification H10W76/15. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 13 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).