Lithographic patterning

Patent metadata

Field	Value
Publication number	US-10126652-B2
Application number	US-201615269202-A
Country	US
Kind code	B2
Filing date	Sep 19, 2016
Priority date	Sep 18, 2015
Publication date	Nov 13, 2018
Grant date	Nov 13, 2018

Abstract

This disclosure provides embodiments of an approach that enforces coexistence of multiple, aligned block copolymer morphologies within a single patterning layer.

First claim

The invention claimed is:

1. A method for creating patterns on a surface of a substrate, comprising depositing a polymer brush onto the surface of the substrate;
depositing a resist layer;
forming grating patterns onto the resists;
developing the grating patterns;
etching to transfer the grating pattern to the polymer brush;
depositing a block copolymer film onto to the substrate; and
forming a pattern on the surface of the substrate, said pattern comprising multiple morphologies on a single patterning layer.

2. The method of claim 1 , wherein the block copolymer film comprises PS-PMMA (polystyrene-poly(methylmethacrylate)), PS-P2VP (polystyrene-b-2-vinylpyridine), PS-P4VP (polystyrene-b-4-vinylpyridine), PS-PEO (polystyrene-b-polyethylene oxide), or PS-PDMS (polystyrene-b-polydimethylsiloxane).

3. The method of claim 1 , wherein the block copolymer has an average molecular weight ranging approximately from about 5 kg/mol to about 500 kg/mol.

4. The method of claim 2 , wherein the block copolymer comprises more than 2 copolymers.

5. The method of claim 1 , wherein forming grating patterns onto the resists is achieved by electron beam lithography photolithography, ion beam lithography, laser lithography, interference lithography, or imprint lithography.

6. The method of claim 1 , further comprising:
plasma cleaning the substrate before depositing the polymer brush.

7. The method of claim 1 , further comprising:
annealing the block copolymer film.

8. The method of claim 1 , wherein the block copolymer film has a predetermined pattern.

9. The method of claim 8 , wherein the predetermined pattern comprises lines.

10. The method of claim 8 , wherein the predetermined pattern comprises ordered dots.

11. The method of claim 10 , wherein the dots are structured into hexagonal dot arrays.

12. The method of claim 8 , wherein the predetermined pattern comprises lines and ordered dots.

13. The method of claim 1 , wherein the grating patterns have a pitch between about 40 nm and about 60 nm.

14. The method of claim 13 , wherein the pitch is from 42 nm to 54 nm.

15. The method of claim 1 , wherein the method further comprises varying a prepattern linewidth, varying a duty cycle, or varying a prepattern pitch within two regions of a prepattern.

16. The method of claim 1 , wherein the multiple morphologies comprise dots and lines.

17. The method of claim 1 , wherein the multiple morphologies comprise alternating dot array and line array regions.

Assignees

• Brookhaven Science Ass Llc

Inventors

• Black Charles Thomas
• Stein Aaron
• Wright Gwen
• Yager Kevin G

Classifications

• G03F7/40

  Treatment after imagewise removal, e.g. baking · CPC title

• G03F7/168

  Finishing the coated layer, e.g. drying, baking, soaking · CPC title

• G03F7/325

  Non-aqueous compositions · CPC title

• G03F7/2037 Primary

  Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation · CPC title

• G03F7/162

  Coating on a rotating support, e.g. using a whirler or a spinner · CPC title