High flow gas diffuser assemblies, systems, and methods

US10119191B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10119191-B2
Application numberUS-201615177183-A
CountryUS
Kind codeB2
Filing dateJun 8, 2016
Priority dateJun 8, 2016
Publication dateNov 6, 2018
Grant dateNov 6, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Porous diffuser assemblies including multiple diffuser elements. The porous diffuser assemblies include a diffuser body, a diffuser base coupled to the diffuser body and forming a plenum there between, the diffuser base including a plurality of openings formed therein, and a porous diffuser element disposed in each of the plurality of openings wherein surfaces of the porous diffuser elements are exposed to the plenum. Gas purged chambers and methods of purging a chamber are disclosed, as are numerous other aspects.

First claim

Opening claim text (preview).

What is claimed is: 1. A gas purged chamber, comprising: a chamber configured to contain a substrate therein; and a gas diffuser assembly coupled to the chamber, the gas diffuser assembly including: a diffuser body, a diffuser base coupled to the diffuser body and forming a gas plenum there between, the diffuser base including a plurality of openings formed therein, and a porous diffuser element disposed in each of the plurality of openings. 2. The gas purged chamber of claim 1 , wherein the gas diffuser assembly is coupled to a load lock chamber lid. 3. The gas purged chamber of claim 1 , wherein the gas diffuser assembly is coupled to a transfer chamber lid. 4. The gas purged chamber of claim 1 , comprising a plurality of the gas diffuser assembly coupled to a transfer chamber lid. 5. The gas purged chamber of claim 1 , wherein a thickness of the porous diffuser elements is less than a thickness of the diffuser base. 6. The gas purged chamber of claim 1 , a wherein the diffuser base includes transition elements. 7. The gas purge chamber of claim 1 , wherein each of the porous diffuser elements are clamped to the diffuser base by a securing member. 8. The gas purge chamber of claim 1 , wherein the plenum includes a frustoconical surface. 9. The gas purge chamber of claim 1 , wherein the plurality of openings are circular openings configured to receive the porous diffuser elements that are configured to have a disc shape. 10. The gas purge chamber of claim 1 , wherein each of the porous diffuser elements comprises a sintered porous metal welded to the diffuser base.

Assignees

Inventors

Classifications

  • using a load-lock chamber · CPC title

  • Gas supply means · CPC title

  • by purging residual gases from the reaction chamber or gas lines · CPC title

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What does patent US10119191B2 cover?
Porous diffuser assemblies including multiple diffuser elements. The porous diffuser assemblies include a diffuser body, a diffuser base coupled to the diffuser body and forming a plenum there between, the diffuser base including a plurality of openings formed therein, and a porous diffuser element disposed in each of the plurality of openings wherein surfaces of the porous diffuser elements ar…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification C23C16/4408. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 06 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).