Fluorescent sensors
US-2024019450-A1 · Jan 18, 2024 · US
US10118890B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10118890-B2 |
| Application number | US-201515516610-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 9, 2015 |
| Priority date | Oct 10, 2014 |
| Publication date | Nov 6, 2018 |
| Grant date | Nov 6, 2018 |
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The present invention provides a process of producing a trifluoromethoxylated aryl or trifluoromethoxylated heteroaryl having the structure: wherein A is an aryl or heteroaryl, each with or without subsutitution; and R 1 is —H, -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), -(alkylaryl), -(alkylheteroaryl), —NH-(alkyl), —N(alkyl) 2 , —NH-(alkenyl), —NH-(alkynyl)—NH-(aryl), —NH-(heteroaryl), —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), or —S-(heteroaryl), comprising: (a) reacting a compound having the structure: with a trifluoromethylating agent in the presence of a base in a first suitable solvent under conditions to produce a compound having the structure: and (b) maintaining the compound produced in step (a) in a second suitable solvent under conditions sufficient to produce the trifluoromethoxylated aryl or trifluormethoxylated heteroaryl having the structure:
Opening claim text (preview).
What is claimed is: 1. A process of producing a trifluoromethoxylated aryl or trifluoromethoxylated heteroaryl having the structure: wherein A is an aryl or heteroaryl, each with or without substitution; and R 1 is —H, -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), -(alkylaryl), -(alkylheteroaryl), —NH-(alkyl), —N(alkyl) 2 , —NH-(alkenyl), —NH-(alkynyl)—NH-(aryl), —NH-(heteroaryl), —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), or —S-(heteroaryl) comprising: (a) reacting a compound having the structure: with a trifluoromethylating agent in a first suitable solvent under conditions to produce a compound having the structure: and (b) maintaining the compound produced in step (a) in a second suitable solvent under conditions sufficient to produce the trifluoromethoxylated aryl or trifluormethoxylated heteroaryl having the structure: 2. A process of claim 1 comprising: (a) reacting a compound having the structure: with a trifluoromethylating agent in the presence of a base in a first suitable solvent under conditions to produce a compound having the structure: and (b) maintaining the compound produced in step (a) in a second suitable solvent under conditions sufficient to produce the trifluoromethoxylated aryl or trifluormethoxylated heteroaryl having the structure: 3. The process of claim 1 , wherein step (a) and step (b) are performed by a sequential one-pot synthesis. 4. The process of claim 1 , wherein step (a) and step (b) are performed by a sequential one-pot synthesis without purification or work-up in between step (a) and step (b). 5. The process of claim 1 , wherein trifluormethylating agent is Togni reagent I or Togni reagent II. 6. The process of claim 1 , wherein A is a phenyl, pyridine, furan, thiophene, pyrrole, thiazole, imidazole, pyrazole, isooxazole, isothiazole, naphthalene, anthracene, pyrimidine, pyrazine, pyridazine, indole, indoline, benzofuran, benzothiophene, or quinolone. 7. The process of claim 1 , wherein the compound produced has the structure: wherein R 1 is —H, -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), -(alkylaryl), -(alkylheteroaryl), —NH-(alkyl), —N(alkyl) 2 , —NH-(alkenyl), —NH-(alkynyl), —NH-(aryl), —NH-(heteroaryl), —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), or —S-(heteroaryl); and R 2 , R 3 , R 4 and R 5 is each independently —H, halogen, —CN, —CF 3 , —OCF 3 , -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), —NH 2 , —NH-(alkyl), —NH-(alkenyl), —NH-(alkynyl), —NH-(aryl), —NH-(heteroaryl), —CO 2 -(alkyl), —CO 2 -(alkenyl), —CO 2 -(alkynyl)—CO 2 -(aryl), —CO 2 -(heteroaryl), —C(O)NH-(alkyl), —C(O)NH-(alkenyl), —C(O)NH-(alkynyl)—C(O)NH-(aryl), —C(O)NH-(heteroaryl), —C(O)N(alkyl) 2 , —OH, —OAc, —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), —S-(heteroaryl), pyridinyl, furanyl, thiophenyl, pyrrolyl, thiazolyl, imidazolyl, pyrazolyl, isoxazolyl, isothiazolyl, naphthalenyl, anthracenyl, pyrimidinyl, pyrazinyl, pyridazinyl, indolyl, indolinyl, benzofuranyl, benzothiophenyl, or quinolinyl. 8. The process of claim 1 , wherein the compound produced has the structure: wherein R 1 is —H, -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), -(alkylaryl), -(alkylheteroaryl), —NH-(alkyl), —N(alkyl) 2 , —NH-(alkenyl), —NH-(alkynyl), —NH-(aryl), —NH-(heteroaryl), —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), or —S-(heteroaryl); and R 2 , R 3 and R 5 is each independently —H, halogen, —CN, —CF 3 , —OCF 3 , -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), —NH 2 , —NH-(alkyl), —NH-(alkenyl), —NH-(alkynyl), —NH-(aryl), —NH-(heteroaryl), —CO 2 -(alkyl), —CO 2 -(alkenyl), —CO 2 -(alkynyl)—CO 2 -(aryl), —CO 2 -(heteroaryl), —C(O)NH-(alkyl), —C(O)NH-(alkenyl), —C(O)NH-(alkynyl)—C(O)NH-(aryl), —C(O)NH-(heteroaryl), —C(O)N(alkyl) 2 , —OH, —OAc, —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), —S-(heteroaryl), pyridinyl, furanyl, thiophenyl, pyrrolyl, thiazolyl, imidazolyl, pyrazolyl, isoxazolyl, isothiazolyl, naphthalenyl, anthracenyl, pyrimidinyl, pyrazinyl, pyridazinyl, indolyl, indolinyl, benzofuranyl, benzothiophenyl, or quinolinyl; or the structure: wherein R 1 is —H, -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), -(alkylaryl), -(alkylheteroaryl), —NH-(alkyl), —N(alkyl) 2 , —NH-(alkenyl), —NH-(alkynyl), —NH-(aryl), —NH-(heteroaryl), —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), or —S-(heteroaryl); and R 3 , R 4 and R 5 is each independently —H, halogen, —CN, —CF 3 , —OCF 3 , -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), —NH 2 , —NH-(alkyl), —NH-(alkenyl), —NH-(alkynyl), —NH-(aryl), —NH-(heteroaryl), —CO 2 -(alkyl), —CO 2 -(alkenyl), —CO 2 -(alkynyl)—CO 2 -(aryl), —CO 2 -(heteroaryl), —C(O)NH-(alkyl), —C(O)NH-(alkenyl), —C(O)NH-(alkynyl)—C(O)NH-(aryl), —C(O)NH-(heteroaryl), —C(O)N(alkyl) 2 , —OH, —OAc, —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), —S-(heteroaryl), pyridinyl, furanyl, thiophenyl, pyrrolyl, thiazolyl, imidazolyl, pyrazolyl, isoxazolyl, isothiazolyl, naphthalenyl, anthracenyl, pyrimidinyl, pyrazinyl, pyridazinyl, indolyl, indolinyl, benzofuranyl, benzothiophenyl, quinolinyl, pyrazolinyl, triazolyl, benzimidazolyl, benzotriazolyl, azaindolyl or purinyl. 9. The process of claim 1 comprising: (a) reacting a compound having the structure: with Togni reagent II in the presence of a base in a first suitable solvent under conditions sufficient to produce a compound having the structure: and (b) maintaining the compound produced in step (a) in a second suitable solvent under conditions sufficient to produce the trifluoromethoxylated aryl or trifluormethoxylated heteroaryl having the structure: 10. The process of claim 1 comprising: (a) reacting a compound having the structure:
with halogen atoms or perhalogeno-alkyl radicals directly attached in position 2 or 6 · CPC title
at least one of the singly-bound nitrogen atoms being acylated · CPC title
with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to carbon atoms of the hetero ring · CPC title
with aryl or aralkyl radicals attached in position 2 or 3 · CPC title
by reactions not involving the formation of cyano groups · CPC title
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