Trifluoromethoxylation of arenes via intramolecular trifluoromethoxy group migration

US10118890B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10118890-B2
Application numberUS-201515516610-A
CountryUS
Kind codeB2
Filing dateOct 9, 2015
Priority dateOct 10, 2014
Publication dateNov 6, 2018
Grant dateNov 6, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides a process of producing a trifluoromethoxylated aryl or trifluoromethoxylated heteroaryl having the structure: wherein A is an aryl or heteroaryl, each with or without subsutitution; and R 1 is —H, -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), -(alkylaryl), -(alkylheteroaryl), —NH-(alkyl), —N(alkyl) 2 , —NH-(alkenyl), —NH-(alkynyl)—NH-(aryl), —NH-(heteroaryl), —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), or —S-(heteroaryl), comprising: (a) reacting a compound having the structure: with a trifluoromethylating agent in the presence of a base in a first suitable solvent under conditions to produce a compound having the structure: and (b) maintaining the compound produced in step (a) in a second suitable solvent under conditions sufficient to produce the trifluoromethoxylated aryl or trifluormethoxylated heteroaryl having the structure:

First claim

Opening claim text (preview).

What is claimed is: 1. A process of producing a trifluoromethoxylated aryl or trifluoromethoxylated heteroaryl having the structure: wherein A is an aryl or heteroaryl, each with or without substitution; and R 1 is —H, -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), -(alkylaryl), -(alkylheteroaryl), —NH-(alkyl), —N(alkyl) 2 , —NH-(alkenyl), —NH-(alkynyl)—NH-(aryl), —NH-(heteroaryl), —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), or —S-(heteroaryl) comprising: (a) reacting a compound having the structure: with a trifluoromethylating agent in a first suitable solvent under conditions to produce a compound having the structure: and (b) maintaining the compound produced in step (a) in a second suitable solvent under conditions sufficient to produce the trifluoromethoxylated aryl or trifluormethoxylated heteroaryl having the structure: 2. A process of claim 1 comprising: (a) reacting a compound having the structure: with a trifluoromethylating agent in the presence of a base in a first suitable solvent under conditions to produce a compound having the structure: and (b) maintaining the compound produced in step (a) in a second suitable solvent under conditions sufficient to produce the trifluoromethoxylated aryl or trifluormethoxylated heteroaryl having the structure: 3. The process of claim 1 , wherein step (a) and step (b) are performed by a sequential one-pot synthesis. 4. The process of claim 1 , wherein step (a) and step (b) are performed by a sequential one-pot synthesis without purification or work-up in between step (a) and step (b). 5. The process of claim 1 , wherein trifluormethylating agent is Togni reagent I or Togni reagent II. 6. The process of claim 1 , wherein A is a phenyl, pyridine, furan, thiophene, pyrrole, thiazole, imidazole, pyrazole, isooxazole, isothiazole, naphthalene, anthracene, pyrimidine, pyrazine, pyridazine, indole, indoline, benzofuran, benzothiophene, or quinolone. 7. The process of claim 1 , wherein the compound produced has the structure: wherein R 1 is —H, -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), -(alkylaryl), -(alkylheteroaryl), —NH-(alkyl), —N(alkyl) 2 , —NH-(alkenyl), —NH-(alkynyl), —NH-(aryl), —NH-(heteroaryl), —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), or —S-(heteroaryl); and R 2 , R 3 , R 4 and R 5 is each independently —H, halogen, —CN, —CF 3 , —OCF 3 , -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), —NH 2 , —NH-(alkyl), —NH-(alkenyl), —NH-(alkynyl), —NH-(aryl), —NH-(heteroaryl), —CO 2 -(alkyl), —CO 2 -(alkenyl), —CO 2 -(alkynyl)—CO 2 -(aryl), —CO 2 -(heteroaryl), —C(O)NH-(alkyl), —C(O)NH-(alkenyl), —C(O)NH-(alkynyl)—C(O)NH-(aryl), —C(O)NH-(heteroaryl), —C(O)N(alkyl) 2 , —OH, —OAc, —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), —S-(heteroaryl), pyridinyl, furanyl, thiophenyl, pyrrolyl, thiazolyl, imidazolyl, pyrazolyl, isoxazolyl, isothiazolyl, naphthalenyl, anthracenyl, pyrimidinyl, pyrazinyl, pyridazinyl, indolyl, indolinyl, benzofuranyl, benzothiophenyl, or quinolinyl. 8. The process of claim 1 , wherein the compound produced has the structure: wherein R 1 is —H, -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), -(alkylaryl), -(alkylheteroaryl), —NH-(alkyl), —N(alkyl) 2 , —NH-(alkenyl), —NH-(alkynyl), —NH-(aryl), —NH-(heteroaryl), —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), or —S-(heteroaryl); and R 2 , R 3 and R 5 is each independently —H, halogen, —CN, —CF 3 , —OCF 3 , -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), —NH 2 , —NH-(alkyl), —NH-(alkenyl), —NH-(alkynyl), —NH-(aryl), —NH-(heteroaryl), —CO 2 -(alkyl), —CO 2 -(alkenyl), —CO 2 -(alkynyl)—CO 2 -(aryl), —CO 2 -(heteroaryl), —C(O)NH-(alkyl), —C(O)NH-(alkenyl), —C(O)NH-(alkynyl)—C(O)NH-(aryl), —C(O)NH-(heteroaryl), —C(O)N(alkyl) 2 , —OH, —OAc, —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), —S-(heteroaryl), pyridinyl, furanyl, thiophenyl, pyrrolyl, thiazolyl, imidazolyl, pyrazolyl, isoxazolyl, isothiazolyl, naphthalenyl, anthracenyl, pyrimidinyl, pyrazinyl, pyridazinyl, indolyl, indolinyl, benzofuranyl, benzothiophenyl, or quinolinyl; or the structure: wherein R 1 is —H, -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), -(alkylaryl), -(alkylheteroaryl), —NH-(alkyl), —N(alkyl) 2 , —NH-(alkenyl), —NH-(alkynyl), —NH-(aryl), —NH-(heteroaryl), —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), or —S-(heteroaryl); and R 3 , R 4 and R 5 is each independently —H, halogen, —CN, —CF 3 , —OCF 3 , -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), —NH 2 , —NH-(alkyl), —NH-(alkenyl), —NH-(alkynyl), —NH-(aryl), —NH-(heteroaryl), —CO 2 -(alkyl), —CO 2 -(alkenyl), —CO 2 -(alkynyl)—CO 2 -(aryl), —CO 2 -(heteroaryl), —C(O)NH-(alkyl), —C(O)NH-(alkenyl), —C(O)NH-(alkynyl)—C(O)NH-(aryl), —C(O)NH-(heteroaryl), —C(O)N(alkyl) 2 , —OH, —OAc, —O-(alkyl), —O-(alkenyl), —O-(alkynyl), —O-(aryl), —O-(heteroaryl), —S-(alkyl), —S-(alkenyl), —S-(alkynyl), —S-(aryl), —S-(heteroaryl), pyridinyl, furanyl, thiophenyl, pyrrolyl, thiazolyl, imidazolyl, pyrazolyl, isoxazolyl, isothiazolyl, naphthalenyl, anthracenyl, pyrimidinyl, pyrazinyl, pyridazinyl, indolyl, indolinyl, benzofuranyl, benzothiophenyl, quinolinyl, pyrazolinyl, triazolyl, benzimidazolyl, benzotriazolyl, azaindolyl or purinyl. 9. The process of claim 1 comprising: (a) reacting a compound having the structure: with Togni reagent II in the presence of a base in a first suitable solvent under conditions sufficient to produce a compound having the structure: and (b) maintaining the compound produced in step (a) in a second suitable solvent under conditions sufficient to produce the trifluoromethoxylated aryl or trifluormethoxylated heteroaryl having the structure: 10. The process of claim 1 comprising: (a) reacting a compound having the structure:

Assignees

Inventors

Classifications

  • with halogen atoms or perhalogeno-alkyl radicals directly attached in position 2 or 6 · CPC title

  • at least one of the singly-bound nitrogen atoms being acylated · CPC title

  • with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to carbon atoms of the hetero ring · CPC title

  • with aryl or aralkyl radicals attached in position 2 or 3 · CPC title

  • by reactions not involving the formation of cyano groups · CPC title

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What does patent US10118890B2 cover?
The present invention provides a process of producing a trifluoromethoxylated aryl or trifluoromethoxylated heteroaryl having the structure: wherein A is an aryl or heteroaryl, each with or without subsutitution; and R 1 is —H, -(alkyl), -(alkenyl), -(alkynyl), -(aryl), -(heteroaryl), -(alkylaryl), -(alkylheteroaryl), —NH-(alkyl), —N(alkyl) 2 , —NH-(alkenyl), —NH…
Who is the assignee on this patent?
Ngai Ming Yu, Hojczyk Katarzyna N, Univ New York State Res Found
What technology area does this patent fall under?
Primary CPC classification C07D215/40. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 06 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).