Method for the fabrication of a thin-film solid-state battery with Ni(OH)2 electrode, battery cell, and battery

Patent metadata

Field	Value
Publication number	US-10115961-B2
Application number	US-201715448001-A
Country	US
Kind code	B2
Filing date	Mar 2, 2017
Priority date	Mar 21, 2016
Publication date	Oct 30, 2018
Grant date	Oct 30, 2018

Abstract

The disclosure relates to a method for the fabrication of a thin-film solid-state battery with Ni(OH)2 electrode, battery cell, and battery. One example embodiment is a method for fabricating a thin-film solid-state battery cell on a substrate comprising a first current collector layer. The method includes depositing above the first current collector layer a first electrode layer. The first electrode layer is a nanoporous composite layer that includes a plurality of pores having pore walls. The first electrode layer includes a mixture of a dielectric material and an active electrode material. The method also includes depositing above the first electrode layer a porous dielectric layer. The method further includes depositing directly on the porous dielectric layer a second electrode layer. Depositing the second electrode layer includes depositing a porous Ni(OH)2 layer using an electrochemical deposition process.

First claim

What is claimed is:

1. A method for fabricating a thin-film solid-state battery cell on a substrate comprising a first current collector layer, the method comprising:
depositing above the first current collector layer a first electrode layer,
wherein the first electrode layer is a nanoporous composite layer comprising a plurality of pores having pore walls, and
wherein the first electrode layer comprises a mixture of a dielectric material and an active electrode material;
depositing above the first electrode layer a porous dielectric layer; and
depositing directly on the porous dielectric layer a second electrode layer,
wherein depositing the second electrode layer comprises depositing a porous Ni(OH) 2 layer using an electrochemical deposition process.

2. The method for fabricating a thin-film solid-state battery cell according to claim 1 , further comprising hydrophilizing the pore walls of the nanoporous composite layer.

3. The method for fabricating a thin-film solid-state battery cell according to claim 2 , wherein hydrophilizing the pore walls of the nanoporous composite layer comprises performing an ultraviolet (UV) curing step.

4. The method for fabricating a thin-film solid-state battery cell according to claim 2 , wherein hydrophilizing the pore walls of the nanoporous composite layer comprises performing an annealing step in a humid atmosphere.

5. The method for fabricating a thin-film solid-state battery cell according to claim 1 , wherein the electrochemical deposition process is an electro-precipitation process.

6. The method for fabricating a thin-film solid-state battery cell according to claim 1 , wherein the electrochemical deposition process comprises:
a first phase comprising charging of the first electrode layer, thereby making the first electrode layer electrically conductive; and
a second phase comprising Ni(OH) 2 material precipitation on the porous dielectric layer.

7. The method for fabricating a thin-film solid-state battery cell according to claim 1 , further comprising depositing a second current collector layer above the second electrode layer.

8. A thin-film solid-state battery cell comprising:
a first current collector layer;
a first electrode layer above the first current collector layer,
wherein the first electrode layer is a nanoporous composite layer comprising a plurality of pores having pore walls, and
wherein the first electrode layer comprises a mixture of a dielectric material and an active electrode material;
a porous dielectric layer above the first electrode layer; and
a second electrode layer directly on the porous dielectric layer,
wherein the second electrode layer is a thin-film, porous Ni(OH) 2 layer.

9. The thin-film solid-state battery cell according to claim 8 , wherein a thickness of the thin-film, porous Ni(OH) 2 layer is between 100 nm and 10 micrometers.

10. The thin-film solid-state battery cell according to claim 8 , wherein the thin-film, porous Ni(OH) 2 layer has a porosity between 40% and 60%.

11. The thin-film solid-state battery cell according to claim 8 , wherein the first electrode layer is a silica-titania, nanoporous layer with a porosity between 20% and 60%.

12. The thin-film solid-state battery cell according to claim 8 , wherein the porous dielectric layer is a porous silica layer having a porosity between 10% and 90%.

13. The thin-film solid-state battery cell according to claim 8 , wherein the mixture of the dielectric material and the active electrode material comprises a dielectric material matrix with active electrode material nanoparticles dispersed therein.

14. The thin-film solid-state battery cell according to claim 8 , wherein the mixture of the dielectric material and the active electrode material is a mixture of dielectric material nanoparticles and active electrode material nanoparticles.

15. A thin-film solid-state battery comprising two thin-film solid-state battery cells,
wherein the two thin-film solid-state battery cells are electrically coupled via a series or parallel connection, and
wherein each thin-film solid-state battery cell comprises:
a first current collector layer;
a first electrode layer above the first current collector layer,
wherein the first electrode layer is a nanoporous composite layer comprising a plurality of pores having pore walls, and
wherein the first electrode layer comprises a mixture of a dielectric material and an active electrode material;
a porous dielectric layer above the first electrode layer; and
a second electrode layer directly on the porous dielectric layer,
wherein the second electrode layer is a thin-film, porous Ni(OH) 2 layer.

16. The thin-film solid-state battery according to claim 15 , wherein a thickness of the thin-film, porous Ni(OH) 2 layer is between 100 nm and 10 micrometers.

17. The thin-film solid-state battery according to claim 15 , wherein the thin-film, porous Ni(OH) 2 layer has a porosity between 40% and 60%.

18. The thin-film solid-state battery according to claim 15 , wherein the first electrode layer is a silica-titania, nanoporous layer with a porosity between 20% and 60%.

19. The thin-film solid-state battery according to claim 15 , wherein the porous dielectric layer is a porous silica layer having a porosity between 10% and 90%.

20. The thin-film solid-state battery according to claim 15 , wherein the mixture of the dielectric material and the active electrode material comprises a dielectric material matrix with active electrode material nanoparticles dispersed therein.

Assignees

• Imec Vzw
• Univ Leuven Kath
• Panasonic Corp

Inventors

• Vereecken Philippe
• Zankowski Stanislaw
• Hendrickx Nathalie
• Mees Maarten
• Murata Mitsuhiro
• Habuta Haruhiko

Classifications

• H01M4/48

  of inorganic oxides or hydroxides · CPC title

• H01M4/52

  of nickel, cobalt or iron · CPC title

• H01M2300/0002

  Aqueous electrolytes · CPC title

• H01M4/0452 Primary

  from solutions · CPC title

• H01M10/26

  Selection of materials as electrolytes · CPC title