SiC wafer producing method

Patent metadata

Field	Value
Publication number	US-10112256-B2
Application number	US-201715663189-A
Country	US
Kind code	B2
Filing date	Jul 28, 2017
Priority date	Aug 10, 2016
Publication date	Oct 30, 2018
Grant date	Oct 30, 2018

Abstract

An SiC wafer is produced from a single crystal SiC ingot by a method that includes forming a plurality of breakable layers constituting a separation surface in the SiC ingot, each breakable layer including a modified layer and cracks extending from the modified layer along a c-plane, and separating part of the SiC ingot along the separation surface as an interface to thereby produce the SiC wafer. In forming the separation surface, the energy density of a pulsed laser beam is set to an energy density not causing the formation of an upper damage layer above the breakable layer previously formed due to the reflection of the pulsed laser beam from the breakable layer and not causing the formation of a lower damage layer below the breakable layer previously formed due to the transmission of the pulsed laser beam through the breakable layer.

First claim

What is claimed is:

1. An SiC wafer producing method for producing an SiC wafer from a single crystal SiC ingot having a first surface, a second surface opposite to said first surface, a c-axis extending from said first surface to said second surface, and a c-plane perpendicular to said c-axis, said c-axis being inclined by an off angle with respect to a normal to said first surface, said off angle being formed between said c-plane and said first surface, said SiC wafer producing method comprising:
a breakable layer forming step of setting a focal point of a pulsed laser beam having a transmission wavelength to SiC inside said SiC ingot at a predetermined depth from said first surface, said predetermined depth corresponding to the thickness of said SiC wafer to be produced, and next applying said pulsed laser beam to said SiC ingot as relatively moving said SiC ingot and said focal point in a first direction perpendicular to a second direction where said off angle is formed, thereby forming a breakable layer inside said SiC ingot at said predetermined depth, said breakable layer including a modified layer extending in said first direction and cracks extending from said modified layer in opposite directions along said c-plane, said modified layer being formed in such a manner that SiC is decomposed into Si and C by said pulsed laser beam first applied, and said pulsed laser beam next applied is absorbed by C previously produced to continue the decomposition of SiC into Si and C in a chain reaction manner with the relative movement of said SiC ingot and said focal point in said first direction;
a separation surface forming step of relatively indexing said SiC ingot and said focal point in said second direction and performing said breakable layer forming step plural times to thereby form a plurality of breakable layers constituting a separation surface; and
a wafer producing step of separating a part of said SiC ingot along said separation surface as an interface to thereby produce said SiC wafer;
said separation surface forming step including the step of setting the energy density of said pulsed laser beam to an energy density not causing the formation of an upper damage layer above said breakable layer previously formed due to the reflection of said pulsed laser beam from said breakable layer or not causing the formation of a lower damage layer below said breakable layer previously formed due to the transmission of said pulsed laser beam through said breakable layer.

2. The SiC wafer producing method according to claim 1 , wherein the energy density per pulse E (J/cm 2 ) of said pulsed laser beam and the feed speed V (mm/second) of said SiC ingot satisfy the conditions of 0<V≤600 and 0.184≤E and the energy density per pulse E is set to −0.35+0.0042×(V−100)≤E≤0.737+0.0024×(V−100).

Assignees

• Disco Corp

Inventors

• Hirata Kazuya

Classifications

• B23K26/0823 Primary

  Devices involving rotation of the workpiece · CPC title

• B23K26/0622

  by shaping pulses · CPC title

• B23K2103/56

  being semiconducting · CPC title

• B28D5/04

  by tools other than rotary type, e.g. reciprocating tools {(B28D5/0005 takes precedence)} · CPC title

• B23K2101/40

  Semiconductor devices · CPC title