Composition for forming silica layer, method for manufacturing silica layer and silica layer

US10106687B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10106687-B2
Application numberUS-201615061670-A
CountryUS
Kind codeB2
Filing dateMar 4, 2016
Priority dateJul 31, 2015
Publication dateOct 23, 2018
Grant dateOct 23, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A composition for forming a silica layer includes a silicon-containing polymer and a mixed solvent including at least two solvents, wherein the mixed solvent has a surface tension of about 5 mN/m to about 35 mN/m at a temperature of about 25° C.

First claim

Opening claim text (preview).

What is claimed is: 1. A composition for forming a silica layer comprising: a silicon-containing polymer; and a mixed solvent consisting of at least two selected from benzene, toluene, ethylbenzene, diethylbenzene, trimethylbenzene, triethylbenzene, cyclohexane, cyclohexene, dipentene, pentane, hexane, heptane, octane, nonane, decane, ethyl cyclohexane, methyl cyclohexane, cyclohexane, cyclohexene, p-menthane, dipropylether, dibutylether, butyl acetate, amyl acetate, methylisobutylketone, paramethylanisole, and tetramethyl benzene, wherein the mixed solvent has a surface tension of about 29.51 mN/m to about 35 mN/m at a temperature of about 25° C. 2. The composition for forming a silica layer of claim 1 , wherein the silicon-containing polymer comprises polysilazane, polysiloxazane, or a combination thereof. 3. The composition for forming a silica layer of claim 1 , wherein the silicon-containing polymer has a weight average molecular weight of about 1,000 g/mol to about 160,000 g/mol. 4. The composition for forming a silica layer of claim 1 , wherein the silicon-containing polymer is included in an amount of about 0.1 wt % to about 30 wt % based on the total amount of the composition for forming a silica layer. 5. A method of manufacturing a silica layer, the method comprising coating a composition for forming a silica layer on a substrate, the composition comprising: a silicon-containing polymer; and a mixed solvent consisting of at least two selected from benzene, toluene, xylene, ethylbenzene, diethylbenzene, trimethylbenzene, triethylbenzene, cyclohexane, cyclohexene, dipentene, pentane, hexane, heptane, octane, nonane, decane, ethyl cyclohexane, methyl cyclohexane, cyclohexane, cyclohexene, p-menthane, dipropylether, dibutylether, anisole, butyl acetate, amyl acetate, methylisobutylketone, paramethylanisole, and tetramethyl benzene, wherein the mixed solvent has a surface tension of about 29.51 mN/m to about 35 mN/m at a temperature of about 25° C.; drying the substrate coated with the composition to produce a resultant; and curing the resultant at a temperature of about 150° C. or greater under an atmosphere including an inert gas to manufacture a silica layer. 6. The method of claim 5 , wherein the composition for forming a silica layer is coated utilizing a spin-on coating method. 7. The method of claim 5 , wherein the silicon-containing polymer comprises polysilazane, polysiloxazane, or a combination thereof. 8. The method of claim 5 , wherein the silicon-containing polymer has a weight average molecular weight of about 1,000 g/mol to about 160,000 g/mol. 9. The method of claim 5 , wherein the silicon-containing polymer is included in an amount of about 0.1 wt % to about 30 wt % based on the total amount of the composition for forming a silica layer. 10. A silica layer provided according to the method of claim 5 . 11. An electronic device comprising the silica layer of claim 10 . 12. An electronic device comprising a silica layer, the silica layer being a derivative of the composition of claim 1 .

Assignees

Inventors

Classifications

  • Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements (arrangements or circuits for control of liquid crystal elements in a matrix, not structurally associated with these elements G09G3/36) · CPC title

  • in which all the silicon atoms are connected by linkages other than oxygen atoms · CPC title

  • containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen · CPC title

  • Diluents or solvents · CPC title

  • C09D1/00Primary

    Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances · CPC title

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What does patent US10106687B2 cover?
A composition for forming a silica layer includes a silicon-containing polymer and a mixed solvent including at least two solvents, wherein the mixed solvent has a surface tension of about 5 mN/m to about 35 mN/m at a temperature of about 25° C.
Who is the assignee on this patent?
Samsung Sdi Co Ltd
What technology area does this patent fall under?
Primary CPC classification C09D1/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 23 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).