Composition for forming silica layer, method for manufacturing silica layer and silica layer
US-10106687-B2 · Oct 23, 2018 · US
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Patent family 57886516
This patent family groups 2 related publications across US. Members often share priority claims or equivalent filings in different countries.
| Field | Value |
|---|---|
| Family ID | 57886516 |
| Family type | — |
| Earliest priority | Jul 31, 2015 |
| First filing country | US |
| Member publications | 2 |
| Countries | US |
| Representative publication | US10106687B2 — Composition for forming silica layer, method for manufacturing silica layer and silica layer |
Representative publication
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US10106687B2 — Composition for forming silica layer, method for manufacturing silica layer and silica layer (published Oct 23, 2018)
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