Thermoplastic poromeric polishing pad

Patent metadata

Field	Value
Publication number	US-10106662-B2
Application number	US-201615229017-A
Country	US
Kind code	B2
Filing date	Aug 4, 2016
Priority date	Aug 4, 2016
Publication date	Oct 23, 2018
Grant date	Oct 23, 2018

Abstract

The porous polyurethane polishing pad includes a porous matrix having large pores that extend upward from a base surface and open to an upper surface. The large pores are interconnected with small pores. The porous matrix is a blend of two thermoplastic polymers. The first thermoplastic polyurethane has by molecular percent, 45 to 60 adipic acid, 10 to 30 MDI-ethylene glycol and 15 to 35 MDI and an Mn of 40,000 to 60,000 and a Mw of 125,000 to 175,000 and an Mw to Mn ratio of 2.5 to 4 The second thermoplastic polyurethane has by molecular percent, 40 to 50 adipic acid, 20 to 40 adipic acid butane diol, 5 to 20 MDI-ethylene glycol and 5 to 25 MDI and an Mn of 60,000 to 80,000 and a Mw of 125,000 to 175,000 and an Mw to Mn ratio of 1.5 to 3.

First claim

We claim:

1. A porous polyurethane polishing pad comprising:
a porous matrix having large pores extending upward from a base surface and open to an upper surface, the large pores being interconnected with small pores, a portion of the large pores being open to a top polishing surface, the large pores extending to the top polishing surface having a substantially vertical orientation, the porous matrix being a blend that includes two thermoplastic polymers;
a first thermoplastic polyurethane having by molecular percent, 45 to 60 adipic acid, 10 to 30 MDI-ethylene glycol and 15 to 35 MDI, the first thermoplastic polyurethane having an Mn of 40,000 to 60,000 and a Mw of 125,000 to 175,000 and an Mw to Mn ratio of 2.5 to 4; and
a second thermoplastic polyurethane having by molecular percent, 40 to 50 adipic acid, 20 to 40 adipic acid butane diol, 5 to 20 MDI-ethylene glycol and 5 to 25 MDI, the second thermoplastic polyurethane having an Mn of 60,000 to 80,000 and a Mw of 125,000 to 175,000 and an Mw to Mn ratio of 1.5 to 3 and the second thermoplastic having a tensile modulus as measured a tensile elongation of 100% (ASTM D886) of at least twenty percent less than the first thermoplastic polyurethane and the blend of the first and second thermoplastic polyurethane having a tensile modulus as measured a tensile elongation of 100% (ASTM D886) of at least thirty percent greater than the second thermoplastic polymer.

2. The polishing pad of claim 1 wherein the porous matrix is coagulated on a water impermeable top layer and the water impermeable top layer coats a non-woven felt substrate and the non-woven felt substrate includes polymeric fibers.

3. The polishing pad of claim 1 wherein the first thermoplastic polyurethane has a tensile modulus of 8.5 to 14.5 MPa at a tensile elongation of 100% (ASTM D886).

4. The polishing pad of claim 1 wherein the second thermoplastic polyurethane has a tensile modulus of 4 to 8 MPa at a tensile elongation of 100% (ASTM D886).

5. The polishing pad of claim 1 wherein the first and second thermoplastic polymers have a distilled water contact angle of 65 degrees±5 degrees.

6. A porous polyurethane polishing pad comprising:
a porous matrix having large pores extending upward from a base surface and open to an upper surface, the large pores being interconnected with small pores, a portion of the large pores being open to a top polishing surface, the large pores extending to the top polishing surface having a substantially vertical orientation, the porous matrix being a blend that includes two thermoplastic polymers;
a first thermoplastic polyurethane having by molecular percent, 45 to 60 adipic acid, 10 to 30 MDI-ethylene glycol and 15 to 35 MDI, the first thermoplastic polyurethane having an Mn of 45,000 to 55,000 and a Mw of 140,000 to 160,000 and an Mw to Mn ratio of 2.8 to 3.3; and
a second thermoplastic polyurethane having by molecular percent, 40 to 50 adipic acid, 20 to 40 adipic acid butane diol, 5 to 20 MDI-ethylene glycol and 5 to 25 MDI, the second thermoplastic polyurethane having an Mn of 65,000 to 75,000 and a Mw of 140,000 to 160,000 and an Mw to Mn ratio of 1.8 to 2.4 and the second thermoplastic having a tensile modulus as measured at a tensile elongation of 100% (ASTM D886) of at least thirty percent less than the first thermoplastic polyurethane and the blend of the first and second thermoplastic polyurethane having a tensile modulus as measured at a tensile elongation of 100% (ASTM D886) of 8.5 to 14.5 MPa and the blend of the first and second thermoplastic polyurethane having a tensile modulus at a tensile elongation of 100% (ASTM D886) at least fifty percent greater than the second thermoplastic polymer.

7. The polishing pad of claim 6 wherein the porous matrix is coagulated on a water impermeable top layer and the water impermeable top layer coats a non-woven felt substrate and the non-woven felt substrate includes polymeric fibers.

8. The polishing pad of claim 6 wherein the first thermoplastic polyurethane has a tensile modulus of 9.5 to 13.5 MPa at a tensile elongation of 100% (ASTM D886).

9. The polishing pad of claim 6 wherein the second thermoplastic polyurethane has a tensile modulus of 4.5 to 7.5 MPa at a tensile elongation of 100% (ASTM D886).

10. The polishing pad of claim 6 wherein the first and second thermoplastic polymers have a distilled water contact angle of 65 degrees±3 degrees.

Assignees

• Rohm & Haas Elect Materials Cmp Holdings Inc

Inventors

• Luo Shuiyuan
• Jacob George C
• Sanford-Crane Henry
• Yoshida Koichi
• Kawabata Katsumasa
• Kitawaki Shusuke
• Takahashi Shogo
• Takei Yosuke

Classifications

• C08J2475/04

  Polyurethanes · CPC title

• C08J9/0061 Primary

  characterized by the use of several polymeric components · CPC title

• B24B37/24 Primary

  characterised by the composition or properties of the pad materials · CPC title

• C08J2207/00

  Foams characterised by their intended use · CPC title

• C08J2375/04

  Polyurethanes · CPC title