Chemical mechanical polishing pad with internal channels
US-2016101500-A1 · Apr 14, 2016 · US
Polishing pad and polishing method
US2016016292A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016016292-A1 |
| Application number | US-201414774681-A |
| Country | US |
| Kind code | A1 |
| Filing date | Feb 27, 2014 |
| Priority date | Mar 12, 2013 |
| Publication date | Jan 21, 2016 |
| Grant date | — |
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- Title
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Abstract
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The present invention provides a polishing pad including a polishing member having a polishing surface, wherein the polishing member contains a material having dilatancy characteristics.
First claim
Opening claim text (preview).
1 . A polishing pad comprising a polishing member having a polishing surface, wherein the polishing member comprises a material having dilatancy characteristics. 2 . The polishing pad according to claim 1 , wherein the material having the dilatancy characteristics comprises a resin having dilatancy characteristics, or an inorganic particle composition having dilatancy characteristics which comprises inorganic particles and medium liquid. 3 . The polishing pad according to claim 2 , wherein the material having the dilatancy characteristics which comprises the resin having the dilatancy characteristics further comprises inorganic particles. 4 . The polishing pad according to claim 2 , wherein the resin having the dilatancy characteristics comprises a silicone resin having dilatancy characteristics. 5 . The polishing pad according to claim 1 , wherein the polishing member comprises a sheet-like fiber base material, and the material having the dilatancy characteristics with which the fiber base material is impregnated. 6 . The polishing pad according to claim 1 , wherein the polishing member comprises a base material having a recess part, and the material having the dilatancy characteristics with which an interior of the recess part is filled. 7 . A polishing method comprising a step of polishing an object to be polished using the polishing pad according to claim 1 . 8 . The polishing pad according to claim 3 , wherein the resin having the dilatancy characteristics comprises a silicone resin having dilatancy characteristics. 9 . The polishing pad according to claim 2 , wherein the polishing member comprises a sheet-like fiber base material, and the material having the dilatancy characteristics with which the fiber base material is impregnated. 10 . The polishing pad according to claim 3 , wherein the polishing member comprises a sheet-like fiber base material, and the material having the dilatancy characteristics with which the fiber base material is impregnated. 11 . The polishing pad according to claim 4 , wherein the polishing member comprises a sheet-like fiber base material, and the material having the dilatancy characteristics with which the fiber base material is impregnated. 12 . The polishing pad according to claim 2 , wherein the polishing member comprises a base material having a recess part, and the material having the dilatancy characteristics with which an interior of the recess part is filled. 13 . The polishing pad according to claim 3 , wherein the polishing member comprises a base material having a recess part, and the material having the dilatancy characteristics with which an interior of the recess part is filled. 14 . The polishing pad according to claim 4 , wherein the polishing member comprises a base material having a recess part, and the material having the dilatancy characteristics with which an interior of the recess part is filled. 15 . The polishing pad according to claim 5 , wherein the polishing member comprises a base material having a recess part, and the material having the dilatancy characteristics with which an interior of the recess part is filled. 16 . A polishing method comprising a step of polishing an object to be polished using the polishing pad according to claim 2 . 17 . A polishing method comprising a step of polishing an object to be polished using the polishing pad according to claim 3 . 18 . A polishing method comprising a step of polishing an object to be polished using the polishing pad according to claim 4 . 19 . A polishing method comprising a step of polishing an object to be polished using the polishing pad according to claim 5 . 20 . A polishing method comprising a step of polishing an object to be polished using the polishing pad according to claim 6 .
Assignees
Inventors
Classifications
- B24D13/00Primary
Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor · CPC title
Constructional features of flexible abrasive materials; Special features in the manufacture of such materials · CPC title
characterised by the composition or properties of the pad materials · CPC title
characterised by a multi-layered structure · CPC title
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Frequently asked questions
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- What does patent US2016016292A1 cover?
- The present invention provides a polishing pad including a polishing member having a polishing surface, wherein the polishing member contains a material having dilatancy characteristics.
- Who is the assignee on this patent?
- Univ Kyushu Nat Univ Corp, Fujibo Holdings Inc
- What technology area does this patent fall under?
- Primary CPC classification B24D13/00. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Thu Jan 21 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).