Metal plating compositions

US10106512B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10106512-B2
Application numberUS-201515559542-A
CountryUS
Kind codeB2
Filing dateApr 28, 2015
Priority dateApr 28, 2015
Publication dateOct 23, 2018
Grant dateOct 23, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Reaction products of primary and secondary diamines and bisanhydrides are included as additives in metal electroplating baths. The metal electroplating baths have good throwing power and deposit metal layers having substantially planar surfaces. The metal plating baths may be used to deposit metal on substrates with surface features such as through-holes and vias.

First claim

Opening claim text (preview).

What is claimed is: 1. A composition comprising one or more sources of metal ions chosen from copper salts and tin salts, an electrolyte, and a reaction product of one or more diamines and one or more compounds having formula: wherein the one or more diamines have a formula: R 13 and R 14 may be the same or different and comprise hydrogen, linear or branched (C 1 -C 12 )alkyl, alkyleneoxy or substituted or unsubstituted (C 6 -C 18 )aryl, and R′ comprises the following moieties: a substituted or unsubstituted (C 6 -C 18 )aryl, R 15 -R 22 may be the same or different and comprise hydrogen, linear or branched (C 1 -C 5 )alkyl, linear or branched hydroxy(C 1 -C 5 )alkyl or linear or branched (C 1 -C 5 )alkoxy, and Z is a carbon atom or nitrogen atom, and p and s may be the same or different and are independently integers of one or greater, e is an integer of 0 to 3, and a, b, c and d may be the same or different and are numbers from 1 or greater, R 23 and R 24 may be the same or different and are hydrogen or amino(C 1 -C 10 )alkyl, and R comprises moieties having the following formula: R 1 , R 2 , R 3 and R 4 may be the same or different and comprise hydrogen, linear or branched (C 1 -C 4 )alkyl, hydroxyl, hydroxy(C 1 -C 3 )alkyl, carboxyl, carboxy(C 1 -C 3 )alkyl or (C 1 -C 3 )alkoxy, R 5 and R 6 may be the same or different and comprise hydrogen, carboxyl and carboxy(C 1 -C 3 )alkyl, R 7 , R 8 , R 9 and R 10 may be the same or different and comprise hydrogen, linear or branched (C 1 -C 5 )alkyl, linear or branched hydroxy(C 1 -C 5 )alkyl, carboxy(C 1 -C 3 )alkyl, linear or branched (C 1 -C 5 )alkoxy, R 11 and R 12 may be the same or different and comprise hydrogen or linear or branched (C 1 -C 5 )alkyl, Ar is an aryl group having 5 to 6 carbon atoms, n and m may be the same or different and are integers of 1 to 15, and q, r and t may be the same or different and are integers of 1 to 10. 2. The composition of claim 1 , wherein the diamine has a formula: wherein R 13 and R 14 may be the same or different and comprise hydrogen, linear or branched (C 1 -C 12 )alkyl, alkyleneoxy or substituted or unsubstituted (C 6 -C 18 )aryl, and R′ comprises the following moieties: R 15 -R 22 may be the same or different and comprise hydrogen, linear or branched (C 1 -C 5 )alkyl, linear or branched hydroxy(C 1 -C 5 )alkyl or linear or branched (C 1 -C 5 )alkoxy, and p and s may be the same or different and are independently integers of one or greater, e is an integer of 0 to 3, and a, b, c and d may be the same or different and are numbers from 1 or greater. 3. The composition of claim 1 , wherein R is the moiety: R 1 and R 2 may be the same or different and comprise hydrogen, linear or branched (C 1 -C 4 )alkyl, hydroxyl, hydroxy(C 1 -C 3 )alkyl, carboxyl, carboxy(C 1 -C 3 )alkyl or (C 1 -C 3 )alkoxy, and m is an integer of 1 to 15. 4. The composition of claim 1 , wherein the one or more sources of metal ions are chosen from copper salts. 5. The composition of claim 1 , further comprising one or more of acids, sources of halide ions, accelerators and suppressors.

Assignees

Inventors

Classifications

  • of copper · CPC title

  • having no double bonds between ring members or between ring members and non-ring members · CPC title

  • Semiconductors first coated with a seed layer or a conductive layer · CPC title

  • Quaternisation of polyamidoamines · CPC title

  • C07D265/33Primary

    Two oxygen atoms, in positions 3 and 5 · CPC title

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What does patent US10106512B2 cover?
Reaction products of primary and secondary diamines and bisanhydrides are included as additives in metal electroplating baths. The metal electroplating baths have good throwing power and deposit metal layers having substantially planar surfaces. The metal plating baths may be used to deposit metal on substrates with surface features such as through-holes and vias.
Who is the assignee on this patent?
Dow Global Technologies Llc, Rohm & Haas Elect Mat
What technology area does this patent fall under?
Primary CPC classification C07D265/33. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 23 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).