Optical waveguide forming method and apparatus

Patent metadata

Field	Value
Publication number	US-10104753-B2
Application number	US-201715853968-A
Country	US
Kind code	B2
Filing date	Dec 26, 2017
Priority date	Dec 28, 2016
Publication date	Oct 16, 2018
Grant date	Oct 16, 2018

Abstract

An optical waveguide is formed using a gas-enclosed vessel that has an internal space in which a polyvalent ionizable gas is enclosed, a laser beam irradiation unit, and a discharge circuit that causes a pulse current to flow in the gas-enclosed vessel at an initial current value. The pulse current is increased from the initial current value to a subsequent current value greater than the initial current value, and a polyvalent ionization channel is formed in the internal space, while increasing the pulse current, by irradiating the internal space in the plasma state with a trigger laser beam generated by the pulse laser beam irradiation device. The polyvalent ionization channel expands by an inverse pinch effect after the internal space is irradiated with the trigger laser beam due to a concentration of the pulse current in the internal space.

First claim

The invention claimed is:

1. An optical waveguide forming method of forming an optical waveguide using a gas-enclosed vessel that has an internal space in which a polyvalent ionizable gas is enclosed, a laser beam irradiation device that irradiates the internal space with a pulse laser beam, and a discharge circuit that causes a pulse current to flow in the gas-enclosed vessel, the optical waveguide forming method comprising:
a first step of causing the pulse current to flow in the gas-enclosed vessel using the discharge circuit such that the internal space enters a plasma state;
a second step of forming a polyvalent ionization channel in the internal space and causing the polyvalent ionization channel to expand by an inverse pinch effect by irradiating the internal space in the plasma state with the pulse laser beam as a trigger laser beam from the laser beam irradiation device; and
a third step of increasing a current value of the pulse current flowing in the gas-enclosed vessel before or during the irradiation with the trigger laser beam.

2. The optical waveguide forming method according to claim 1 , wherein the third step includes transiently forming the optical waveguide in the internal space after the irradiation with the trigger laser beam.

3. The optical waveguide forming method according to claim 1 , wherein the second step includes forming the polyvalent ionization channel which is filament-shaped fully ionized plasma by the irradiation with the trigger laser beam.

4. The optical waveguide forming method according to claim 1 , wherein the third step includes causing the expanded polyvalent ionization channel expanded by the inverse pinch effect in the second step to contract using a pinch effect after the irradiation with the trigger laser beam by increasing the current value of the pulse current flowing in the gas-enclosed vessel before or during the irradiation with the trigger laser beam and transiently forming the optical waveguide in the internal space at a predetermined time after the irradiation with the trigger laser beam.

5. The optical waveguide forming method according to claim 4 , wherein the predetermined time is determined based on a rising peak time in a monitored voltage waveform which is applied to the gas-enclosed vessel when the optical waveguide is transiently formed in the internal space.

6. The optical waveguide forming method according to claim 4 , wherein the predetermined time is determined based on a type and a density of the gas enclosed in the internal space and the current value of the pulse current flowing in the gas-enclosed vessel.

7. An optical waveguide forming apparatus comprising:
a gas-enclosed vessel that has an internal space in which a polyvalent ionizable gas is enclosed;
a laser beam irradiation device that irradiates the internal space with a pulse laser beam;
a discharge circuit that causes a pulse current to flow in the gas-enclosed vessel; and
a controller that controls the pulse laser beam emitted from the laser beam irradiation device and the pulse current flowing in the gas-enclosed vessel by the discharge circuit,
wherein the controller includes
a first pulse current control unit that causes the pulse current to flow in the gas-enclosed vessel using the discharge circuit such that the internal space enters a plasma state,
a first irradiation control unit that forms a polyvalent ionization channel in the internal space and causes the polyvalent ionization channel to expand by an inverse pinch effect by irradiating the internal space in the plasma state with the pulse laser beam as a trigger laser beam from the laser beam irradiation device, and
a second pulse current control unit that increases a current value of the pulse current flowing in the gas-enclosed vessel from before or during the irradiation with the trigger laser beam.

8. The optical waveguide forming apparatus according to claim 7 , wherein the second pulse current control unit transiently forms the optical waveguide in the internal space after the irradiation with the trigger laser beam.

9. The optical waveguide forming apparatus according to claim 7 , wherein the first irradiation control unit forms the polyvalent ionization channel which is filament-shaped fully ionized plasma by the irradiation with the trigger laser beam.

10. The optical waveguide forming apparatus according to claim 7 , wherein the second pulse current control unit causes the expanded polyvalent ionization channel to contract using a pinch effect and transiently forms the optical waveguide in the internal space at a predetermined time after the irradiation with the trigger laser beam.

11. An electron accelerator comprising the optical waveguide forming apparatus according to claim 7 ,
wherein the controller further includes a second irradiation control unit that guides a main laser beam to the optical waveguide transiently formed in the internal space and generates a laser wake field for accelerating an electron beam in the internal space by irradiating the internal space with the pulse laser beam as the main laser beam from the laser beam irradiation device after the irradiation with the trigger laser beam.

12. An X-ray laser irradiation apparatus comprising the optical waveguide forming apparatus according to claim 7 ,
wherein the controller further includes a third irradiation control unit that guides a main laser beam to the optical waveguide transiently formed in the internal space and forms an inversely distributed state in which an X-ray laser beam is oscillated in the internal space by irradiating the internal space with the pulse laser beam as the main laser beam from the laser beam irradiation device after the irradiation with the trigger laser beam.

13. A scattered X-ray generator comprising:
the optical waveguide forming apparatus according to claim 7 ; and
an electron beam source that irradiates the internal space with an electron beam to collide with the pulse laser beam from the laser beam irradiation device,
wherein the controller further includes a fourth irradiation control unit that generates scattered X-rays in the optical waveguide transiently formed in the internal space by Compton scattering by irradiating the internal space with the pulse laser beam as the main laser beam from the laser beam irradiation device after the irradiation with the trigger laser beam and irradiating the internal space with the electron beam from the electron beam source.

Assignees

• Univ Osaka

Inventors

• Hosokai Tomonao
• Zhidkov Alexey
• Kodama Ryousuke

Classifications

• H05H15/00

  Methods or devices for acceleration of charged particles not otherwise provided for {, e.g. wakefield accelerators} · CPC title

• H05H1/24

  Generating plasma {(nuclear fusion reactors G21B1/00; gas-filled discharge reactors H01J37/32)} · CPC title

• H05H1/06 Primary

  Longitudinal pinch devices · CPC title

• H01S4/00

  Devices using stimulated emission of electromagnetic radiation in wave ranges other than those covered by groups H01S1/00, H01S3/00 or H01S5/00, e.g. phonon masers, X-ray lasers or gamma-ray lasers · CPC title

• H05H1/0037

  by spectrometry · CPC title