Method for manufacturing a power semiconductor device

Patent metadata

Field	Value
Publication number	US-10103227-B2
Application number	US-201715669537-A
Country	US
Kind code	B2
Filing date	Aug 4, 2017
Priority date	Oct 17, 2011
Publication date	Oct 16, 2018
Grant date	Oct 16, 2018

Abstract

A method for manufacturing a power semiconductor device includes: forming a drift region of a first conductivity type, a second emitter region of a second conductivity type, a pn-junction between the second emitter region and drift region, and a first emitter region having a first doping region of the first conductivity type and a second doping region of the first conductivity type; forming a first emitter metallization in contact with the first emitter region to form an ohmic contact between the first emitter metallization and the first doping region, and to form a non-ohmic contact between the first emitter metallization and the second doping region; and forming a second emitter metallization in contact with the second emitter region. The first emitter region is formed using a mask that is aligned with respect to the second emitter region, so that the first and second doping regions are formed in aligned relation.

First claim

What is claimed is:

1. A method for manufacturing a power semiconductor device, the method comprising:
forming a drift region of a first conductivity type, a second emitter region of a second conductivity type, a pn-junction between the second emitter region and the drift region, and a first emitter region comprising a first doping region of the first conductivity type and a second doping region of the first conductivity type;
forming a first emitter metallization in contact with the first emitter region to form an ohmic contact between the first emitter metallization and the first doping region of the first emitter region, and to form a non-ohmic contact between the first emitter metallization and the second doping region of the first emitter region; and
forming a second emitter metallization in contact with the second emitter region,
wherein the first emitter region is formed using a mask that is aligned with respect to the second emitter region, so that the first doping region is formed in aligned relation with the second emitter region.

2. A method according to claim 1 , further comprising:
implanting first dopants of a first doping type into the first doping region; and
implanting second dopants of the first doping type into the second doping region, the second dopants being different than the first dopants.

3. A method according to claim 1 , further comprising implanting dopants into the first doping region with a higher dose than into the second doping region.

4. A method according to claim 1 , wherein forming the first emitter metallization comprises:
forming a first metal region comprised of a first metal in contact with the first doping region of the first emitter region; and
forming a second metal region comprised of a second metal different than the first metal in contact with the second doping region of the first emitter region.

5. A method according to claim 1 , further comprising implanting protons to form a field stop region adjacent the first emitter region.

6. A method according to claim 1 , further comprising modifying a surface of the first emitter region by at least one of implanting non-doping elements, and locally or globally porosifying the surface of the first emitter region.

7. A method according to claim 1 , wherein the non-ohmic contact is a Schottky contact.

8. A method according to claim 1 , wherein the first doping region has a higher surface doping concentration than the second doping region.

9. A method according to claim 8 , wherein the first doping region has a surface doping concentration of at least 10 19 /cm 3 .

10. A method according to claim 8 , wherein the second doping region has a surface doping concentration of less than 10 19 /cm 3 .

11. A method according to claim 2 , wherein the second dopants are selected from the group consisting of selenium, sulphur, titanium, and bismuth.

12. A method according to claim 1 , wherein the drift region has a doping concentration lower than the doping concentration of the first doping region of the emitter region and is at least in direct contact with the first doping region of the emitter region.

13. A method according to claim 5 , wherein the field stop region has a doping concentration higher than the doping concentration of the drift region and lower than the doping concentration of the first doping region of the emitter region.

14. A method according to claim 1 , wherein the second doping region is formed by portions of the drift region.

15. A method according to claim 1 , wherein the second emitter region is formed using a mask.

16. A method according to claim 1 , wherein the first and the second emitter metallizations are formed on opposite sides of the power semiconductor.

Assignees

• Infineon Technologies Austria Ag

Inventors

• Huesken Holger
• Mauder Anton
• Schulze Hans-Joachim
• Roesner Wolfgang

Classifications

• H01L29/7393

  Electricity · mapped topic

• H01L29/36

  Electricity · mapped topic

• H01L29/66143

  Electricity · mapped topic

• H01L29/08

  Electricity · mapped topic

• H01L29/861

  Electricity · mapped topic