Heater substrate, alkali metal cell unit and atomic oscillator
US-2015054591-A1 · Feb 26, 2015 · US
US10097191B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10097191-B2 |
| Application number | US-201615332185-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 24, 2016 |
| Priority date | Oct 27, 2015 |
| Publication date | Oct 9, 2018 |
| Grant date | Oct 9, 2018 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
An atomic oscillator includes a gas cell having alkali metal atoms sealed therein; alight source that irradiates the gas cell with light; and a light detecting unit that detects the quantity of light transmitted through the gas cell. The light source includes an optical oscillation layer having a first reflective layer, an active layer, and a second reflective layer laminated therein in this order, an electrical field absorption layer having a first semiconductor layer, a quantum well layer, and a second semiconductor layer laminated therein in this order, and a heat diffusion layer that is disposed between the optical oscillation layer and the electrical field absorption layer and has a higher thermal conductivity than that of the second reflective layer.
Opening claim text (preview).
What is claimed is: 1. An atomic oscillator comprising: a gas cell having alkali metal atoms sealed therein; a light source that irradiates the gas cell with light; and a light detecting unit that detects the quantity of light transmitted through the gas cell, wherein the light source includes an optical oscillation layer having a first reflective layer, an active layer, and a second reflective layer laminated therein in this order, an electrical field absorption layer having a first semiconductor layer, a quantum well layer, and a second semiconductor layer laminated therein in this order, and a heat diffusion layer that is disposed between the optical oscillation layer and the electrical field absorption layer and has a higher thermal conductivity than that of the second reflective layer. 2. The atomic oscillator according to claim 1 , wherein the heat diffusion layer is an i-type AlAs layer. 3. The atomic oscillator according to claim 1 , wherein the heat diffusion layer is an i-type GaAs layer. 4. The atomic oscillator according to claim 1 , further comprising: a contact layer provided between the heat diffusion layer and the first semiconductor layer, wherein a surface of the contact layer where the first semiconductor layer is disposed is provided with an electrode for applying a voltage to the electrical field absorption layer.
characterised by the configuration · CPC title
characterised by the material · CPC title
using selective oxidation · CPC title
comprising an integrated optical modulator · CPC title
Structure or details of the laser chip to manipulate the heat flow, e.g. passive layers in the chip with a low heat conductivity · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.