Molecular layer deposition process for making organic or organic-inorganic polymers

US10092927B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10092927-B2
Application numberUS-51383107-A
CountryUS
Kind codeB2
Filing dateNov 13, 2007
Priority dateNov 13, 2006
Publication dateOct 9, 2018
Grant dateOct 9, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Ultrathin layers of organic polymers or organic-inorganic hybrid polymers are deposited onto a substrate using molecular layer deposition methods. The process uses vapor phase materials which contain a first functional group and react only monofunctionally at the surface to add a unit to the polymer chain. The vapor phase reactant in addition has a second functional group, which is different from the first functional group, or a blocked, masked or protected functional group, or else has a precursor to such a functional group.

First claim

Opening claim text (preview).

What is claimed is: 1. A molecular layer deposition process for forming, under appropriate reaction conditions, a layer of an organic polymer or organic-inorganic polymer onto a first hydroxyl-functionalized surface while preventing chain termination and cross-linking, comprising: reacting a cyclic azasilane comprising 2,2-dimethoxy-1,6-diaza-2-silacyclooctane with a surface hydroxyl on the first hydroxyl-functionalized surface; allowing a ring of the 2,2-dimethoxy-1,6-diaza-2-silacyclooctane to open and form a silicon-oxygen bond to the first hydroxyl-functionalized surface; allowing the opened ring of the 2,2-dimethoxy-1,6-diaza-2-silacyclooctane to unfold, thereby leaving a primary amine surface species; allowing ethylene carbonate to react with the primary amine surface species to generate a urethane linkage to the primary amine surface species, and unfold, thereby forming the layer of the organic polymer or organic-inorganic polymer having a second hydroxyl-functionalized surface. 2. The molecular layer deposition process of claim 1 , wherein the first hydroxyl-functionalized surface and the second hydroxyl-functionalized surface comprise silica. 3. A molecular layer deposition process for forming a layer of an organic polymer or organic-inorganic polymer onto a first hydroxyl-functionalized surface while preventing chain termination, comprising, under appropriate reaction conditions the steps of: allowing trimethylaluminum in the vapor phase to react with hydroxyl surface groups on the first hydroxyl-functionalized surface, thereby forming an Al—CH 3 surface species; allowing ethanolamine in the vapor phase to react with the Al—CH 3 surface species, thereby forming an Al—O—CH 2 CH 2 —NH 2 surface species; and allowing maleic anhydride in the vapor phase to react with the amine, —NH 2 , groups on the Al—O—CH 2 CH 2 —NH 2 surface species, thereby forming the layer of the organic polymer or organic-inorganic polymer having a second hydroxyl-functionalized surface. 4. A molecular layer deposition process for forming a layer of an organic polymer or organic-inorganic polymer onto a first hydroxyl-functionalized surface while preventing chain termination and cross-linking, comprising, under appropriate reaction conditions the steps of: contacting the first hydroxyl-functionalized surface with 3(1,3-dimethylbutylidene)aminopropyltriethoxysilane (PS) wherein a protecting group hides the —NH 2 functionality; allowing the PS to form a siloxane linkage to the hydroxylated surface; contacting the PS surface with water; allowing the water to react with the imine moiety on the PS, thereby removing the protecting group, releasing 4-methyl-2-pentanone, and forming a surface terminated with primary amine groups; exposing the surface to an acid chloride or an acid chloride precursor, which bonds to the surface with an amide linkage, the amide linkage producing a nitrobenzyl-protected surface wherein the surface nitrobenzyl-protection group hides an underlying hydroxyl group; and exposing the surface nitrobenzyl-protection group to ultra-violet light at an appropriate wavelength and for a sufficient period of time to remove the nitrobenzyl-protection group and unmask the underlying hydroxyl group, thereby forming the layer of an organic polymer or organic-inorganic polymer having a second hydroxyl-functionalized surface.

Assignees

Inventors

Classifications

  • B05D1/60Primary

    Deposition of organic layers from vapour phase (vapour phase deposition in general C23C14/00, C23C16/00) · CPC title

  • Two layers · CPC title

  • B05D7/24Primary

    for applying particular liquids or other fluent materials · CPC title

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What does patent US10092927B2 cover?
Ultrathin layers of organic polymers or organic-inorganic hybrid polymers are deposited onto a substrate using molecular layer deposition methods. The process uses vapor phase materials which contain a first functional group and react only monofunctionally at the surface to add a unit to the polymer chain. The vapor phase reactant in addition has a second functional group, which is different fr…
Who is the assignee on this patent?
George Steven M, Dameron Arrelaine Allen, Keaner Nicole Marie Adamczyk, and 2 more
What technology area does this patent fall under?
Primary CPC classification B05D1/60. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Oct 09 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).