Water-repellent protective film, and chemical solution for forming protective film

US10090148B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10090148-B2
Application numberUS-201314415507-A
CountryUS
Kind codeB2
Filing dateJul 4, 2013
Priority dateJul 20, 2012
Publication dateOct 2, 2018
Grant dateOct 2, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A surface treatment was conducted by using a liquid chemical containing a water-repellent protective film forming agent represented by the following general formula [1], subsequent to a step of cleaning a metal-based wafer and prior to a step of drying the wafer. (R 1 represents a C 1 -C 18 monovalent hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s). R 2 mutually independently represents a monovalent organic group having a C 1 -C 18 hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s). “a” is an integer of from 0 to 2.)

First claim

Opening claim text (preview).

The invention claimed is: 1. A liquid chemical for forming a water-repellent protective film, the liquid chemical being for forming a water-repellent protective film on a wafer having at its surface an uneven pattern and containing at least one kind of element selected from the group consisting of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water-repellent protective film being formed at least on the surfaces of the recessed portions subsequent to a step of cleaning the wafer and prior to a step of drying the wafer, the liquid chemical for forming a water-repellent protective film comprising: a water-repellent protective film forming agent represented by the general formula [1] wherein R 1 represents a C 1 -C 18 monovalent hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s), R 2 mutually independently represents a monovalent organic group having a C 1 -C 18 hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s), and “a” is an integer of from 0 to 2; and a solvent, wherein the solvent comprises an alcohol having a carbon number of 6 or less; and water, the water-repellent protective film forming agent is present in a concentration of 0.05 to 2 mass % relative to the total amount of 100 mass % of the liquid chemical for forming a water-repellent protective film, water is present in a concentration of 1 to 75 mass % relative to the total amount of 100 mass % of the solvent, the alcohol is present in a concentration of 0.05 to 60 mass % relative to the total amount of 100 mass % of the solvent, and the total concentration of the alcohol and water is 1.05 to 100 mass % relative to the total amount of 100 mass % of the solvent. 2. A liquid chemical for forming a water-repellent protective film, as claimed in claim 1 , wherein, the water-repellent protective film forming agent is a compound represented by the following general formula wherein R 3 represents a C 1 -C 18 monovalent hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s).

Assignees

Inventors

Classifications

  • Cleaning during device manufacture · CPC title

  • H10P70/27Primary

    during, before or after processing of conductive materials, e.g. polysilicon or amorphous silicon layers · CPC title

  • Electricity · mapped topic

  • Phosphonates, phosphinates or phosphonites · CPC title

  • Synthetic film-forming substance · CPC title

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What does patent US10090148B2 cover?
A surface treatment was conducted by using a liquid chemical containing a water-repellent protective film forming agent represented by the following general formula [1], subsequent to a step of cleaning a metal-based wafer and prior to a step of drying the wafer. (R 1 represents a C 1 -C 18 monovalent …
Who is the assignee on this patent?
Central Glass Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P70/27. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 02 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).