Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same
US-9349582-B2 · May 24, 2016 · US
US10090148B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10090148-B2 |
| Application number | US-201314415507-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 4, 2013 |
| Priority date | Jul 20, 2012 |
| Publication date | Oct 2, 2018 |
| Grant date | Oct 2, 2018 |
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A surface treatment was conducted by using a liquid chemical containing a water-repellent protective film forming agent represented by the following general formula [1], subsequent to a step of cleaning a metal-based wafer and prior to a step of drying the wafer. (R 1 represents a C 1 -C 18 monovalent hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s). R 2 mutually independently represents a monovalent organic group having a C 1 -C 18 hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s). “a” is an integer of from 0 to 2.)
Opening claim text (preview).
The invention claimed is: 1. A liquid chemical for forming a water-repellent protective film, the liquid chemical being for forming a water-repellent protective film on a wafer having at its surface an uneven pattern and containing at least one kind of element selected from the group consisting of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water-repellent protective film being formed at least on the surfaces of the recessed portions subsequent to a step of cleaning the wafer and prior to a step of drying the wafer, the liquid chemical for forming a water-repellent protective film comprising: a water-repellent protective film forming agent represented by the general formula [1] wherein R 1 represents a C 1 -C 18 monovalent hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s), R 2 mutually independently represents a monovalent organic group having a C 1 -C 18 hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s), and “a” is an integer of from 0 to 2; and a solvent, wherein the solvent comprises an alcohol having a carbon number of 6 or less; and water, the water-repellent protective film forming agent is present in a concentration of 0.05 to 2 mass % relative to the total amount of 100 mass % of the liquid chemical for forming a water-repellent protective film, water is present in a concentration of 1 to 75 mass % relative to the total amount of 100 mass % of the solvent, the alcohol is present in a concentration of 0.05 to 60 mass % relative to the total amount of 100 mass % of the solvent, and the total concentration of the alcohol and water is 1.05 to 100 mass % relative to the total amount of 100 mass % of the solvent. 2. A liquid chemical for forming a water-repellent protective film, as claimed in claim 1 , wherein, the water-repellent protective film forming agent is a compound represented by the following general formula wherein R 3 represents a C 1 -C 18 monovalent hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s).
Cleaning during device manufacture · CPC title
during, before or after processing of conductive materials, e.g. polysilicon or amorphous silicon layers · CPC title
Electricity · mapped topic
Phosphonates, phosphinates or phosphonites · CPC title
Synthetic film-forming substance · CPC title
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