Prevent and remove organics from reservoir wells

Patent metadata

Field	Value
Publication number	US-10087546-B2
Application number	US-201414523061-A
Country	US
Kind code	B2
Filing date	Oct 24, 2014
Priority date	Oct 24, 2014
Publication date	Oct 2, 2018
Grant date	Oct 2, 2018

Abstract

Plating bath and well structures and methods are described to stop the organic compounds present in plating reservoir wells or bath solution from rising, i.e., climbing up the reservoir wall. An electroplating apparatus includes a vessel holding a liquid solution including metal plating material and an organic species, and a method of operating an electroplating apparatus. The apparatus is designed with plating bath and structures and methods to stop the organic compounds present in plating reservoir wells or bath solution from rising, i.e., climbing or wicking up the inner surfaces of reservoir walls, and to wash them back down on a continuous or cyclical basis in order to maintain a concentration of organic compounds in the plating solution within upper and lower specification limits.

First claim

What is claimed is:

1. An electroplating apparatus comprising:
a vessel having walls configured to hold a liquid solution of a metal plating material and including an organic species, said liquid solution contained within said vessel at a first level below a top rim of said vessel; and
a conveyance apparatus configured to provide a flow of added liquid solution down each inner sidewall of said vessel, wherein the flow of added liquid solution down each inner sidewall of said vessel prevents organic species from climbing said inner sidewalls of said vessel during electroplating,
wherein said vessel top rim defines a vessel perimeter, and said conveyance apparatus comprises:
a conveyance portion configured along the vessel perimeter and aligned with said rim of said vessel, and
an opening formed in said conveyance portion and aligned directly over a portion of a topmost surface of said rim of said vessel.

2. The electroplating apparatus of claim 1 , wherein said opening formed in said conveyance portion is continuous along said perimeter.

3. The electroplating apparatus of claim 2 , wherein said opening is a slit or orifice.

4. The electroplating apparatus of claim 1 , wherein said conveyance apparatus further comprises:
a pipe including said conveyance portion; and
a pump connected to said pipe for pumping liquid solution in said pipe through said opening.

5. The electroplating apparatus of claim 1 , wherein said conveyance apparatus is configured to provide a continuous flow of said added liquid solution to said vessel.

6. The electroplating apparatus of claim 1 , wherein said vessel includes a holding fixture configured to hold a workpiece within a portion of said liquid solution in said vessel.

7. The electroplating apparatus of claim 1 , wherein a source tank containing said added liquid solution and a pump are connected to an end portion of said conveyance apparatus, and said pump is configured to pump said added liquid solution from said source tank to said conveyance apparatus and into said vessel in a continuous manner.

8. The electroplating apparatus of claim 7 , wherein said pump is controlled by a logic controller circuit.

Assignees

• IBM

Inventors

• Arvin Charles L
• Biggs Glen N
• Palmatier Phillip W
• Sorbello Joseph C
• Tong Tracy A
• Torres Freddie

Classifications

• C25D21/08

  Rinsing · CPC title

• C25D21/18 Primary

  of electrolytes (C25D21/22 takes precedence) · CPC title

• C25D17/02

  Tanks; Installations therefor · CPC title

• C25D21/10

  Agitating of electrolytes; Moving of racks · CPC title