Ultra-thin nanometer scale polymeric membranes

US10086336B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10086336-B2
Application numberUS-201615349613-A
CountryUS
Kind codeB2
Filing dateNov 11, 2016
Priority dateNov 12, 2015
Publication dateOct 2, 2018
Grant dateOct 2, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Ultra-thin nanometer-sealer freestanding polymeric membranes and methods for producing ultra-thin nanometer-scale freestanding recast membranes and ultra-thin nanometer-scale freestanding cross-linked membranes with solid internal backbone are disclosed.

First claim

Opening claim text (preview).

What is claimed: 1. A process for producing an ultra-thin nanometer-scale polymeric membrane comprising: forming a polymer film on a first side of a nanoporous substrate; swelling the polymer film on the first side of the nanoporous substrate by applying a solvent on a second side of the nanoporous substrate opposite the first side which migrates through the nanoporous substrate to the first side; and evaporating the solvent from the second side of the nanoporous substrate while limiting evaporation of the solvent from the first side of the nanoporous substrate. 2. The process of claim 1 , wherein the forming a polymer film on a first side of a nanoporous substrate comprises: dispensing a solution of resin dispersion in a solvent over the first side of the nanoporous substrate, wherein the nanoporous substrate comprises a porous region and non-porous regions surrounding the porous region; allowing the solution to spread over the porous region and non-porous regions of the first side of the nanoporous substrate; and allowing the solvent to evaporate yielding a thin film recast on the porous and non-porous regions of the first side of the nanoporous substrate. 3. The process of claim 1 , wherein the evaporating the solvent from the second side of the nanoporous substrate while limiting evaporation of the solvent from the first side of the nanoporous substrate comprises confining the polymer film formed on the first side of the nanoporous substrate in an enclosed space. 4. The process of claim 1 , wherein the swelling the polymer film on the first side of the nanoporous substrate by applying a solvent on a second side of the nanoporous substrate opposite the first side further comprises flipping the substrate over prior to applying the solvent on the second side of the substrate. 5. The process of claim 1 , wherein the formed polymer film is a recast film. 6. The process of claim 1 , wherein the nanoporous substrate comprises a porous region and non-porous regions surrounding the porous region and the porous region of the substrate is about tens of nanometers thick. 7. The process of claim 1 , wherein the nanoporous substrate comprises a porous region and non-porous regions surrounding the porous region and the nanoporous region of the substrate is up to about 1 micrometer thick. 8. The process of claim 1 , wherein the nanoporous substrate comprises a porous region and non-porous regions surrounding the porous region and the nanoporous region of the substrate has a porosity up to about 20%. 9. The process of claim 1 , wherein the nanoporous substrate comprises a porous region and non-porous regions surrounding the porous region and the nanoporous region of the substrate has a porosity up to about 50%. 10. The process of claim 1 , wherein the pore diameter of the nanoporous substrate is less than about 100 nm. 11. The process of claim 1 , wherein the pore diameter of the nanoporous substrate is less than about 50 nm. 12. The process of claim 1 , wherein the substrate is a porous nanocrystalline silicon (pnc-Si) membrane. 13. The process of claim 1 , wherein the substrate is a nanoporous silicon nitride (SiN) membrane. 14. The process of claim 1 , wherein the nanoporous substrate comprises a porous region and non-porous regions surrounding the porous region and evaporating the solvent from the second side of the nanoporous substrate while limiting evaporation of the solvent from the first side of the nanoporous substrate simultaneously shrinks the polymer film formed over the non-porous regions and stretches the film formed over the porous region on the first side of the nanoporous substrate.

Assignees

Inventors

Classifications

  • by inducing porosity into non porous precursor membranes · CPC title

  • Composite membranes; Ultra-thin membranes · CPC title

  • Nanofiltration · CPC title

  • Physical treatment with compounds, e.g. swelling, coating or impregnation · CPC title

  • Chemically bonded layers, e.g. cross-linking · CPC title

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What does patent US10086336B2 cover?
Ultra-thin nanometer-sealer freestanding polymeric membranes and methods for producing ultra-thin nanometer-scale freestanding recast membranes and ultra-thin nanometer-scale freestanding cross-linked membranes with solid internal backbone are disclosed.
Who is the assignee on this patent?
Getpreecharsawas Jirachai, Borkholder David A, Rochester Institute Tech
What technology area does this patent fall under?
Primary CPC classification B01D67/0023. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Oct 02 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).