Filtration filter, filtration method, production method of purified liquid chemical product for lithography, and method of forming resist pattern

Patent metadata

Field	Value
Publication number	US-10429738-B2
Application number	US-201615277528-A
Country	US
Kind code	B2
Filing date	Sep 27, 2016
Priority date	Sep 30, 2015
Publication date	Oct 1, 2019
Grant date	Oct 1, 2019

Abstract

A filtration filter used for filtering a liquid chemical for lithography, provided with a polyimide resin porous membrane; a filtration method including allowing a liquid chemical for lithography to pass through the filtration filter; and a production method of a purified liquid chemical product for lithography, including filtering a liquid chemical for lithography by the filtration method.

First claim

What is claimed is:

1. A filtration filter used for filtering a liquid chemical for lithography, the filtration filter comprising a polyimide resin porous membrane having a porous structure in which adjacent spherical cells are mutually communicating so as to form a flow path through which the liquid chemical can flow from one side of the membrane to the other side of the membrane, said membrane having a total porosity of 60 to 90% by weight, wherein the average pore diameter of all pores in the polyimide resin porous membrane is from 100 to 2000 nm.

2. A filtration method comprising: allowing a liquid chemical for lithography to pass through the filtration filter of claim 1 .

3. A method of producing a purified liquid chemical product for lithography, comprising:
filtering a liquid chemical for lithography by the filtration method of claim 2 .

4. The method according to claim 3 , wherein filtering a liquid chemical for lithography includes an operation of allowing the liquid chemical for lithography to pass through the filter by pressure difference.

5. The method according to claim 3 , wherein the liquid chemical for lithography is a resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an organic solvent (S), and having an acid generation ability.

6. The method according to claim 5 , wherein the base component (A) comprises a polymeric compound (A1) having a structural unit (ap) containing a polar group.

7. The filtration filter of claim 1 , wherein the membranes are formed by including and removing fine particles having a particle size distribution index (d25/d75) of 1.6 to 5.

8. A method of forming a resist pattern, comprising:
filtering a resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an organic solvent (S), and having an acid generation ability by a filter comprising a polyimide resin porous filter membrane having a porous structure in which adjacent spherical cells are mutually communicating so as to form a flow path through which the liquid chemical can flow from one side of the membrane to the other side of the membrane, said membrane having a total porosity of 60 to 90% by weight to obtain a purified resist composition product, wherein the average pore diameter of all pores in the polyimide resin porous membrane is from 100 to 2000 nm;
using the purified resist composition product to form a resist film on a substrate;
exposing the resist film; and
developing the exposed resist film to form a resist pattern.

9. The method of claim 8 , wherein the membranes are formed by including and removing fine particles having a particle size distribution index (d25/d75) of 1.6 to 5.

10. A filtration filter used for filtering a liquid chemical for lithography, the filtration filter having a porous structure in which adjacent spherical cells are mutually communicating so as to form a flow path through which the liquid chemical can flow from one side of the membrane to the other side of the membrane, and comprising a polyimide resin porous membrane wherein the average diameter of all of the spherical cells in the polyimide resin porous membrane is from 50 to 2,000 nm, and the filtration filter has a total porosity of 60 to 90% by weight.

11. The filtration filter according to claim 10 , which is provided with a thermosetting resin porous membrane.

12. A filtration method comprising: an operation of allowing a liquid chemical for lithography to pass through the filtration filter of claim 10 .

13. A method of producing a purified liquid chemical product for lithography, comprising: filtering a liquid chemical for lithography by the filtration method of claim 12 .

14. The method according to claim 13 , wherein the filter is provided with a thermosetting resin porous membrane.

15. The method according to claim 13 , wherein the liquid chemical for lithography is a resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an organic solvent (S), and having an acid generation ability.

16. The method according to claim 15 , wherein the base component (A) comprises a polymeric compound (A1) having a structural unit (ap) containing a polar group.

17. The filtration filter of claim 10 , wherein the membranes are formed by including and removing fine particles having a particle size distribution index (d25/d75) of 1.6 to 5.

18. A method of forming a resist pattern, comprising:
filtering a resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an organic solvent (S), and having an acid generation ability with a filter comprising a polyimide resin porous membrane having a porous structure in which adjacent spherical cells are mutually communicating so as to form a flow path through which the liquid chemical can flow from one side of the membrane to the other side of the membrane to obtain a purified resist composition product, wherein the average diameter of all of the spherical cells in the polyimide resin porous membrane is from 50 to 2,000 nm, and the filtration filter has a porous structure in which adjacent spherical cells are mutually communicating and a total porosity of 60 to 90% by weight;
forming a resist film on a substrate using the purified resist composition product;
exposing the resist film; and
developing the exposed resist film to form a resist pattern.

19. The method of claim 18 , wherein the membranes are formed by including and removing fine particles having a particle size distribution index (d25/d75) of 1.6 to 5.

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Nakata Akihiko
• Morioka Akihito
• Sugawara Tsukasa

Classifications

• G03F7/091

  characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement · CPC title

• G03F7/322 Primary

  Aqueous alkaline compositions · CPC title

• B01D2323/18

  Pore-control agents or pore formers · CPC title

• B32B5/16

  characterised by features of a layer formed of particles, e.g. chips, powder {or granules (layer formed of natural mineral particles B32B19/00; layer being formed of wood fibres, chips or particles B32B21/02)} · CPC title

• B01D61/00

  Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor (separation of gases or vapours by diffusion B01D53/22) · CPC title