Metallization of the wafer edge for optimized electroplating performance on resistive substrates

Patent metadata

Field	Value
Publication number	US-10079207-B2
Application number	US-201715665017-A
Country	US
Kind code	B2
Filing date	Jul 31, 2017
Priority date	Jun 2, 2014
Publication date	Sep 18, 2018
Grant date	Sep 18, 2018

Abstract

A substrate having at least one device; wherein the substrate having a conductive layer disposed on a top surface of the substrate, the top surface having an edge exclusion region defined as an annular area that extends to an edge of the substrate, the top surface of the substrate further having a process region defined as a central area of the substrate that extends to about the annular area; wherein the substrate having a metallic material deposited over the conductive layer at the edge exclusion region, wherein a thickness of the metallic material reduces electrical resistance of the metallic material at the edge exclusion region; wherein the thickness of the metallic material and resulting reduced electrical resistance for an applied electrical current to the metallic material facilitates increasing a rate at which the process region is plated as a result of the applied electrical current and an applied electroplating solution.

First claim

What is claimed is:

1. A substrate, comprising:
the substrate having at least one device;
wherein the substrate having a conductive layer disposed on a top surface of the substrate, the top surface of the substrate having an edge exclusion region defined as an annular area that extends to an edge of the substrate, the top surface of the substrate further having a process region defined as a central area of the substrate that extends to about the annular area;
wherein the substrate having a metallic material deposited over the conductive layer at the edge exclusion region, wherein a thickness of the metallic material reduces electrical resistance of the metallic material at the edge exclusion region;
wherein the thickness of the metallic material and resulting reduced electrical resistance for an applied electrical current to the metallic material facilitates increasing a rate at which the process region is plated as a result of the applied electrical current and an applied electroplating solution.

2. The substrate of claim 1 ,
wherein the conductive layer defines a metallic seed layer; and
wherein the applied electrical current to the metallic material effects plating of a metallic bulk layer over the process region of the substrate.

3. The substrate of claim 1 ,
wherein the conductive layer defines a liner layer or a barrier layer; and
wherein the applied electrical current to the metallic material effects plating of a metallic seed layer or a metallic bulk layer over the process region of the substrate.

4. The substrate of claim 1 ,
wherein the metallic material is configured to accommodate electrical contacts that contact the metallic material, the electrical contacts being distributed around the annular area of the edge exclusion region when contacting the metallic material;
wherein the electrical current is applied to the metallic material via the electrical contacts while the electroplating solution is applied over the process region of the substrate.

5. The substrate of claim 4 ,
wherein the metallic material is further configured to accommodate an annular seal configured to contact the metallic material and prevent the electroplating solution from contacting the electrical contacts.

6. The substrate of claim 1 , wherein increasing the rate at which the process region is plated is defined by increasing the applied electrical current while the electroplating solution is applied over the process region of the substrate, the thickness of the metallic material and resulting reduced electrical resistance facilitating increasing the applied electrical current.

7. The substrate of claim 1 , wherein the rate at which the process region is plated increases from an initial rate to an increased rate that is approximately linearly correlated to the thickness of the metallic material.

8. A substrate, comprising:
the substrate having at least one device;
wherein the substrate having a conductive layer disposed on a top surface of the substrate, wherein the conductive layer defines a metallic seed layer, the top surface of the substrate having an edge exclusion region defined as an annular area that extends to an edge of the substrate, the top surface of the substrate further having a process region defined as a central area of the substrate that extends to about the annular area;
wherein the substrate having a metallic material deposited over the conductive layer at the edge exclusion region, wherein a thickness of the metallic material reduces electrical resistance of the metallic material at the edge exclusion region;
wherein the thickness of the metallic material and resulting reduced electrical resistance for an applied electrical current to the metallic material facilitates increasing a rate at which the process region is plated as a result of the applied electrical current and an applied electroplating solution, wherein the applied electrical current to the metallic material effects plating of a metallic bulk layer over the process region of the substrate;
wherein the metallic material is configured to accommodate electrical contacts that contact the metallic material, the electrical contacts being distributed around the annular area of the edge exclusion region when contacting the metallic material;
wherein the electrical current is applied to the metallic material via the electrical contacts while the electroplating solution is applied over the process region of the substrate.

9. The substrate of claim 8 ,
wherein the metallic material is further configured to accommodate an annular seal configured to contact the metallic material and prevent the electroplating solution from contacting the electrical contacts.

10. The substrate of claim 8 , wherein increasing the rate at which the process region is plated is defined by increasing the applied electrical current while the electroplating solution is applied over the process region of the substrate, the thickness of the metallic material and resulting reduced electrical resistance facilitating increasing the applied electrical current.

11. The substrate of claim 8 , wherein the rate at which the process region is plated increases from an initial rate to an increased rate that is approximately linearly correlated to the thickness of the metallic material.

12. A substrate, comprising:
the substrate having at least one device;
wherein the substrate having a conductive layer disposed on a top surface of the substrate, wherein the conductive layer defines a liner layer or a barrier layer, the top surface of the substrate having an edge exclusion region defined as an annular area that extends to an edge of the substrate, the top surface of the substrate further having a process region defined as a central area of the substrate that extends to about the annular area;
wherein the substrate having a metallic material deposited over the conductive layer at the edge exclusion region, wherein a thickness of the metallic material reduces electrical resistance of the metallic material at the edge exclusion region;
wherein the thickness of the metallic material and resulting reduced electrical resistance for an applied electrical current to the metallic material facilitates increasing a rate at which the process region is plated as a result of the applied electrical current and an applied electroplating solution, wherein the applied electrical current to the metallic material effects plating of a metallic seed layer or a metallic bulk layer over the process region of the substrate;
wherein the metallic material is configured to accommodate electrical contacts that contact the metallic material, the electrical contacts being distributed around the annular area of the edge exclusion region when contacting the metallic material;
wherein the electrical current is applied to the metallic material via the electrical contacts while the electroplating solution is applied over the process region of the substrate.

13. The substrate of claim 12 ,
wherein the metallic material is further configured to accommodate an annular seal configured to contact the metallic material and prevent the electroplating solution from contacting the electrical contacts.

14. The substrate of claim 12 , wherein increasing the rate at which the process region is plated is defined by increasing the applied electrical current while the electroplating solution is applied over the process region of the substrate, the thickness of the metallic material and resulting reduced electrical resistance facilitating increasing the applied electrical current.

15. The substrate of claim 12 , wherein the ra

Assignees

• Lam Res Corp

Inventors

• Kolics Artur

Classifications

• H10P72/0466

  characterised by the construction of the load-lock chamber · CPC title

• H10P72/0464

  characterised by the construction of the transfer chamber · CPC title

• H10P90/128

  by edge treatment, e.g. chamfering · CPC title

• H10P72/0476

  comprising at least one plating chamber · CPC title

• H10P52/403

  of conductive or resistive materials · CPC title