Metal-film forming apparatus and metal-film forming method

US10077505B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10077505-B2
Application numberUS-201514979914-A
CountryUS
Kind codeB2
Filing dateDec 28, 2015
Priority dateDec 26, 2014
Publication dateSep 18, 2018
Grant dateSep 18, 2018

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A metal-film forming apparatus includes: an anode; a resin substrate having a surface on which a conductor pattern layer that serves as a cathode is formed; a solid electrolyte membrane that contains metal ions and is between the anode and the resin substrate, the solid electrolyte membrane contacting a surface of the conductor pattern layer when a metal film is formed; a power supply; and a conductive member that is arranged contacting the conductor pattern layer when the metal film is formed, such that a negative electrode of the power supply is electrically connected to the conductor pattern layer, the conductive member being detachable from the conductor pattern layer, wherein the metal ions are reduced to deposit metal that forms the metal film on the surface of the conductor pattern layer when the voltage is applied.

First claim

Opening claim text (preview).

What is claimed is: 1. A metal-film forming apparatus comprising: an anode; a resin substrate having a surface on which a conductor pattern layer that serves as a cathode is formed; a solid electrolyte membrane that contains metal ions and is arranged between the anode and the resin substrate, the solid electrolyte membrane being arranged contacting a surface of the conductor pattern layer when a metal film is formed on the conductor pattern layer; a power supply that applies a voltage between the anode and the conductor pattern layer; and a conductive member that is arranged contacting at least an end portion of the conductor pattern layer when the metal film is formed on the conductor pattern layer, such that a negative electrode of the power supply is electrically connected to the conductor pattern layer, the conductive member being detachable from the conductor pattern layer, wherein the metal ions are reduced to deposit metal that forms the metal film on the surface of the conductor pattern layer when the voltage is applied between the anode and the conductor pattern layer, wherein the conductive member is a metal plate that covers the resin substrate, the conductive member has a through-hole corresponding to a pattern shape of the conductor pattern layer, and the conductive member is arranged such that an opening edge that forms the through-hole of the conductive member contacts the end portion of to the conductor pattern layer when the metal film is formed without covering a film-forming region of the surface of the conductor pattern layer; and wherein the resin substrate is disposed on a metal base, the conductive member includes flange portions formed on outer edges of the conductive member, the flange portions contacting the metal base such that the negative electrode of the power supply is electrically connected to the conductor pattern layer via the metal base and the conductive member. 2. The metal-film forming apparatus according to claim 1 , wherein the conductive member is attached to the solid electrolyte membrane. 3. The metal-film forming apparatus according to claim 1 , wherein the metal film is made of copper, nickel, silver, or gold, and the conductive member is made of aluminum, titanium, molybdenum, tungsten, or an alloy of at least two of aluminum, titanium, molybdenum, and tungsten. 4. A metal-film forming method, comprising: executing a forming of a metal film on a surface of a conductor pattern layer provided on a surface of a resin substrate by depositing metal on the surface of the conductor pattern layer, by applying a voltage between an anode and the conductor pattern layer that serves as a cathode and reducing metal ions in a solid electrolyte membrane, in a state where the solid electrolyte membrane is arranged between the anode and the resin substrate to contact the surface of the conductor pattern layer, wherein the forming of the metal film includes applying the voltage between the anode and the conductor pattern layer in a state where a conductive member that is detachable from the conductor pattern layer contacts at least an end portion of the conductor pattern layer, such that a negative electrode of a power supply that applies the voltage is electrically connected to the conductor pattern layer, wherein the conductive member is a metal plate that covers the resin substrate, the conductive member has a through-hole corresponding to a pattern shape of the conductor pattern layer, and the metal film is formed while the conductive member is arranged such that an opening edge that forms the through-hole of the conductive member contacts the end portion of the conductor pattern layer when the metal film is formed without covering a film-forming region of the surface of the conductor pattern layer, so that the conductive member is electrically connected to the conductor pattern layer, and wherein the resin substrate is disposed on a metal base, the conductive member includes flange portions formed on outer edges of the conductive member, the flange portions contacting the metal base such that the negative electrode of the power supply is electrically connected to the conductor pattern layer via the metal base and the conductive member. 5. The metal-film forming method according to claim 4 , wherein the forming of the metal film is performed in a state where the conductive member is attached to the solid electrolyte membrane. 6. The metal-film forming method according to claim 4 , wherein the metal film is made of copper, nickel, silver, or gold, and the conductive member is made of aluminum, titanium, molybdenum, tungsten, or an alloy of at least two of aluminum, titanium, molybdenum, and tungsten.

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10077505B2 cover?
A metal-film forming apparatus includes: an anode; a resin substrate having a surface on which a conductor pattern layer that serves as a cathode is formed; a solid electrolyte membrane that contains metal ions and is between the anode and the resin substrate, the solid electrolyte membrane contacting a surface of the conductor pattern layer when a metal film is formed; a power supply; and a co…
Who is the assignee on this patent?
Toyota Motor Co Ltd
What technology area does this patent fall under?
Primary CPC classification C25D3/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 18 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).